Adriana Patricia Sanchez

US Patent:

6623333, Sep 23, 2003

Filed:

Nov 9, 2000

Appl. No.:

09/711004

Inventors:

Nital S. Patel - Plano TX
Gregory A. Miller - Richardson TX
Christopher D. Guinn - Allen TX
Adriana Sanchez - Carrollton TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

B24B 100

US Classification:

451 9, 451 10, 451 41, 451285, 451287

Abstract:

A method is provided for controlling a wafer polishing process. The method includes determining a polishing characteristic for a particular type of device from a set of measurements obtained from a wafer having a device of the particular type, and updating the polishing characteristic in response to polishing and measuring a wafer having a device of the particular type. The method further includes determining the polish rate of a polisher using a set of measurements obtained from a wafer polished on the polisher; and updating the polish rate of the polisher in response to polishing a wafer on the polisher and measuring the wafer. The method also includes determining a desired polishing time on the polisher for a wafer having a device of the particular type using the updated polishing characteristic of the device and the updated polish rate of the polisher.

Address:

1327 Williams Cir, Desoto, TX 75115

VIN:

2B3KA53H37H856825

Make:

DODGE

Model:

CHARGER

Year:

2007