Alan J Carbonaro

US Patent:

60996501, Aug 8, 2000

Filed:

Mar 3, 1998

Appl. No.:

9/034545

Inventors:

Alan Carbonaro - Livermore CA
Glenn Pfefferkorn - Fremont CA
Gary L. Evans - Pleasanton CA

Assignee:

Concept Systems Design, Inc. - Fremont CA

International Classification:

C23C 1600

US Classification:

118715

Abstract:

A semiconductor chemical vapor deposition reactor includes a susceptor and a cover above the susceptor to reflect and radiate heat from the susceptor back onto the top surfaces of the wafers held on the susceptor, thereby minimizing temperature gradients on the wafers and reducing slip. The cover has an opening in the center through which process gases are injected, creating a Bernouli effect to draw the process gases between the cover and susceptor, where the process gases then deposit on the wafers secured thereon.