Alan R Hayes

US Patent:

6464891, Oct 15, 2002

Filed:

Mar 17, 1999

Appl. No.:

09/270998

Inventors:

Boris L. Druz - Brooklyn NY
Kurt E. Williams - Flushing NY
Alan V. Hayes - Centerport NY

Assignee:

Veeco Instruments, Inc. - Plainview NY

International Classification:

B44C 122

US Classification:

216 67, 134 1, 134 11, 134 221, 216 66, 20419211, 20419234

Abstract:

A method is provided for a repetitive deposition and etch of a substrate using a carbon containing ion beam in a gridded ion source. The method includes the actual ion beam processing step combined with the thermal and chemical conditioning of the ion source and a special cleaning step(s). The special cleaning step(s) effect robust removal of the precipitates accumulated in the operating source due to the decomposition of carbon containing gases such as hydrocarbons and halocarbons Precipitate removal is achieved by employing ions and radicals formed in an inert gas plasma or a mixture of inert gas and oxygen to reactively etch or bombard the precipitates.

US Patent:

6545580, Apr 8, 2003

Filed:

Sep 9, 1998

Appl. No.:

09/150274

Inventors:

Hari S. Hegde - Flushing NY
Mihai S. Risca - Port Washington NY
Alan V. Hayes - Centerport NY
Abraham J. Navy - Bellerose NY
Roger P. Fremgen - E. Northport NY

Assignee:

VEECO Instruments, Inc. - Plainview NY

International Classification:

C23C 1400

US Classification:

335296, 335297, 335299, 335210, 335213, 20429816

Abstract:

An electromagnetic field generator and method of operation for ion beam deposition of magnetic thin-film materials is presented. A combination of open frame electromagnetic field generator elements provides precise control of magnetic field directionality. This control enables deposition of oriented magnetic films with minimal directionality error. The magnetic field direction may be oriented to enable the deposition of alternating layers of directionally oriented magnetic films. An open frame element reduces the weight of the electromagnetic field generator while truncated corners reduce diagonal clearance that may be required in a vacuum chamber. An open frame design also enables the electromagnetic field generator to surround and thus remain clear of the active deposition area; the electromagnetic field generator can thus be shielded from accumulation of sputtered material. Shielding from accumulation of sputter material reduces maintenance requirements.

US Patent:

6590324, Jul 8, 2003

Filed:

Sep 7, 1999

Appl. No.:

09/390841

Inventors:

Viktor Kanarov - Bellmore NY
Alan V. Hayes - Centerport NY
Rustam Yevtukhov - Briarwood NY
Daniel Yakovlevitch - Mineola NY

Assignee:

Veeco Instruments, Inc. - Plainview NY

International Classification:

H01J 2700

US Classification:

3133601, 313299, 313306, 313348

Abstract:

A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

US Patent:

6716322, Apr 6, 2004

Filed:

Apr 19, 2002

Appl. No.:

10/126928

Inventors:

Hari Hedge - Little Neck NY
Alan V. Hayes - Centerport NY
Boris Druz - Brooklyn NY
Viktor Kanarov - Bellmore NY
Adrian J. Devasahayam - Woodmere NY
Emmanuel Lakios - Mt. Sinai NY

Assignee:

Veeco Instruments Inc. - Woodbury NY

International Classification:

C23C 1434

US Classification:

20419211, 20419212, 20429804, 20429811, 118504, 427569, 4272481

Abstract:

A deposition system includes a substrate holder supporting a substrate defining at least one topographical feature. In addition, the system includes a deposition plume that is directed toward the substrate. A first profiler mask is positioned between the deposition plume and the substrate, and is shaped so as to reduce inboard/outboard asymmetry in a deposition profile associated with the feature.

US Patent:

6774550, Aug 10, 2004

Filed:

Apr 14, 2003

Appl. No.:

10/413176

Inventors:

Viktor Kanarov - Bellmore NY
Alan V. Hayes - Centerport NY
Rustam Yevtukhov - Briarwood NY
Daniel Yakovlevitch - Mineola NY

Assignee:

Veeco Instruments, Inc. - Plainview NY

International Classification:

H01J 1900

US Classification:

3133601, 313299, 313306, 313348, 313352

Abstract:

A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

US Patent:

7005782, Feb 28, 2006

Filed:

May 27, 2004

Appl. No.:

10/855245

Inventors:

Viktor Kanarov - Bellmore NY, US
Alan V. Hayes - Centerport NY, US
Rustam Yevtukhov - Briarwood NY, US
Daniel Yakovlevitch - Mineola NY, US

Assignee:

VEECO Instruments, Inc. - Plain View NY

International Classification:

H01J 17/04

US Classification:

31323141, 3133601, 3133611, 313308, 313326, 313491, 313300, 313348, 31511131

Abstract:

A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

US Patent:

7183716, Feb 27, 2007

Filed:

Feb 4, 2004

Appl. No.:

10/772132

Inventors:

Viktor Kanarov - Bellmore NY, US
Alan V. Hayes - Centerport NY, US
Rustam Yevtukhov - Briarwood NY, US
Ira Reiss - New City NY, US
Adrian Celaru - Massapequa NY, US
Kurt E. Williams - Seaford NY, US
Carlos Fernando de Mello Borges - Central Islip NY, US
Boris L. Druz - Brooklyn NY, US
Renga Rajan - Dix Hills NY, US
Hari Hegde - Little Neck NY, US

Assignee:

Veeco Instruments, Inc. - Woodbury NY

International Classification:

H01J 7/24

US Classification:

31511151, 15634549, 118723 I

Abstract:

A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.

US Patent:

7414355, Aug 19, 2008

Filed:

Aug 18, 2005

Appl. No.:

11/207656

Inventors:

Viktor Kanarov - Bellmore NY, US
Alan V. Hayes - Centerport NY, US
Rustam Yevtukhov - Briarwood NY, US
Daniel Yakovlevitch - Mineola NY, US

Assignee:

Veeco Instruments, Inc. - Plainview NY

International Classification:

H01J 3/14
H01J 37/09
H01J 40/04

US Classification:

313238, 313240, 313243, 313292, 315 541, 25044011, 250396 R

Abstract:

A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.