Alexander C Kremer

US Patent:

6801299, Oct 5, 2004

Filed:

Jul 31, 2002

Appl. No.:

10/208046

Inventors:

Alexander Kremer - Stamford CT
Stanley W. Drazkiewicz - Norwalk CT

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 2754

US Classification:

355 67, 355 71

Abstract:

An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.

US Patent:

7027129, Apr 11, 2006

Filed:

Sep 23, 2004

Appl. No.:

10/947347

Inventors:

Alexander Kremer - Stamford CT, US
Stanley W. Drazkiewicz - Norwalk CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/54
G03B 27/72

US Classification:

355 67, 355 71

Abstract:

An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.

US Patent:

7173688, Feb 6, 2007

Filed:

Dec 28, 2004

Appl. No.:

11/022888

Inventors:

Roberto B. Wiener - Bethel CT, US
Alexander Kremer - Stamford CT, US
Elizabeth Stone - Stamford CT, US
Richard Zimmerman - Brookfield CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/72
G03B 27/42

US Classification:

355 69, 355 53

Abstract:

A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center.

US Patent:

7333176, Feb 19, 2008

Filed:

Dec 29, 2006

Appl. No.:

11/647419

Inventors:

Roberto B. Wiener - Bethel CT, US
Alexander Kremer - Stamford CT, US
Elizabeth Stone - Stamford CT, US
Richard Zimmerman - Brookfield CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/52
G03B 27/42
G03B 27/72

US Classification:

355 55, 355 53, 355 69

Abstract:

A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. “pupils” are then superimposed onto the grid. Multiple second grids are also defined. Each ““pupil”” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center.

US Patent:

7525641, Apr 28, 2009

Filed:

Dec 7, 2005

Appl. No.:

11/295517

Inventors:

Richard C. Zimmerman - Brookfield CT, US
Eric B. Catey - Danbury CT, US
David A. Hult - Danbury CT, US
Alexander C. Kremer - Stamford CT, US
Heine Melle Mulder - Veldhoven, NL
Hendrikus Robertus Marie Van Greevenbroek - Eindhoven, NL
Roberto B. Wiener - Eindhoven, NL

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/72
G03B 27/42

US Classification:

355 69, 355 53

Abstract:

A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.

US Patent:

7843549, Nov 30, 2010

Filed:

May 23, 2007

Appl. No.:

11/752710

Inventors:

Alexander Kremer - Stamford CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/68
G03B 27/54
G03B 27/72

US Classification:

355 52, 355 67, 355 71

Abstract:

Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus position of the illumination beam, wherein the light attenuating filter has a two-dimensional pattern that compensates for ellipticity variations in the illumination beam. The light attenuating filter may stand alone, or the filter may be combined with a uniformity correction system, such that it corrects both uniformity and ellipticity. In one embodiment, the light attenuating filter is printed with an assembly of microscopic dots according to the two-dimensional pattern.

US Patent:

7362413, Apr 22, 2008

Filed:

Dec 9, 2004

Appl. No.:

11/007580

Inventors:

Alexander Kremer - Stamford CT, US
Marcel Mathijs Theodore Marie Dierichs - Venlo, NL
Erik Roelof Loopstra - Heeze, NL

Assignee:

ASML Netherlands B.V. - Veldhoven
ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/52
G03B 27/54
G21F 1/00

US Classification:

355 30, 355 67, 2505151

Abstract:

A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.

US Patent:

55791069, Nov 26, 1996

Filed:

Feb 21, 1995

Appl. No.:

8/391235

Inventors:

Alexander Kremer - Stamford CT

Assignee:

Oriel Corporation - Stratford CT

International Classification:

G01J 328

US Classification:

356528

Abstract:

An apparatus for providing an astigmatically-reduced image with a spectroscopic instrument is disclosed which comprises a collimator which collimates electromagnetic radiation; a cylindrical mirror which receives and reflects the collimated electromagnetic radiation; a diffractor having a surface with a plurality of diffraction rulings inscribed thereon for diffracting electromagnetic radiation directed from the collimator; and a focuser which collects, focuses and directs diffracted electromagnetic radiation and directs it towards an exit aperture. In the preferred embodiment, the cylindrical mirror comprises a concave cylindrical mirror positioned such that the cylindrical axis is substantially normal to rulings on the diffractor. In another preferred embodiment, the cylindrical mirror is convex and is positioned such that the cylindrical axis is substantially parallel to rulings on the diffractor.