Andrew C Cowe

US Patent:

6872909, Mar 29, 2005

Filed:

Apr 16, 2003

Appl. No.:

10/417408

Inventors:

William M. Holber - Winchester MA, US
Xing Chen - Lexington MA, US
Andrew B. Cowe - Andover MA, US
Matthew M. Besen - Andover MA, US
Susan C. Trulli - Lexington MA, US
Shouqian Shao - Winchester MA, US

Assignee:

Applied Science and Technology, Inc. - Wilmington MA

International Classification:

B23K010/00

US Classification:

21912152, 21912155

Abstract:

Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.

US Patent:

7166816, Jan 23, 2007

Filed:

May 3, 2004

Appl. No.:

10/837912

Inventors:

Xing Chen - Lexington MA, US
William M. Holber - Winchester MA, US
Andrew Barnett Cowe - Andover MA, US
Eric Georgelis - Canton MA, US
Andrzej Bortkiewicz - Hamilton MA, US

Assignee:

MKS Instruments, Inc. - Wilmington MA

International Classification:

B23K 10/00

US Classification:

21912141, 21912143, 15634548, 118723 R, 31511151

Abstract:

Apparatus for dissociating gases includes a plasma chamber comprising a gas. A first transformer having a first magnetic core surrounds a first portion of the plasma chamber and has a first primary winding. A second transformer having a second magnetic core surrounds a second portion of the plasma chamber and has a second primary winding. A first solid state AC switching power supply including one or more switching semiconductor devices is coupled to a first voltage supply and has a first output that is coupled to the first primary winding. A second solid state AC switching power supply including one or more switching semiconductor devices is coupled to a second voltage supply and has a second output that is coupled to the second primary winding. The first solid state AC switching power supply drives a first AC current in the first primary winding. The second solid state AC switching power supply drives a second AC current in the second primary winding.

US Patent:

7501600, Mar 10, 2009

Filed:

Feb 15, 2005

Appl. No.:

11/058620

Inventors:

William M. Holber - Winchester MA, US
Xing Chen - Lexington MA, US
Andrew B. Cowe - Andover MA, US
Matthew M. Besen - Andover MA, US
Susan C. Trulli - Lexington MA, US
Shouqian Shao - Winchester MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

B23K 10/00

US Classification:

21912152, 21912143, 21912148, 118723 I, 118723 MW, 31511151

Abstract:

Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.

US Patent:

7659489, Feb 9, 2010

Filed:

Mar 12, 2007

Appl. No.:

11/684916

Inventors:

William M. Holber - Winchester MA, US
Xing Chen - Lexington MA, US
Andrew B. Cowe - Andover MA, US
Matthew M. Besen - Andover MA, US
Susan C. Trulli - Lexington MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

B23K 10/00

US Classification:

21912152, 21912143, 21912148, 118723 I, 118723 MW, 31511151

Abstract:

Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.

US Patent:

7914603, Mar 29, 2011

Filed:

Jun 26, 2008

Appl. No.:

12/147078

Inventors:

Ali Shajii - Canton MA, US
Xing Chen - Lexington MA, US
Andrew Cowe - Andover MA, US
David Burtner - Belmont MA, US
William Robert Entley - Wakefield MA, US
ShouQian Shao - Boston MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

B01D 46/46

US Classification:

95 17, 55288, 55434, 554343, 55462, 55DIG 15, 553851, 95267, 95 25, 95272, 96221, 118723 R, 118723 ER, 20429807

Abstract:

A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel.

US Patent:

20080302652, Dec 11, 2008

Filed:

Jun 3, 2008

Appl. No.:

12/132294

Inventors:

William Robert Entley - Wakefield MA, US
Xing Chen - Lexington MA, US
Ali Shajii - Canton MA, US
Kaveh Bakhtari - Watertown MA, US
Andrew Cowe - Andover MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

H05H 1/24

US Classification:

20415715, 42218605

Abstract:

A system for producing excited gases for introduction to a semiconductor processing chamber. The system includes a plasma source for generating a plasma. The plasma source includes a plasma chamber and a gas inlet for receiving process gases from a gas source. A gas flow rate controller is coupled to the gas inlet for controlling an inlet flow rate of the process gases from the gas source to the plasma chamber via the gas inlet. The system includes a control loop for detecting a transition from a first process gas to a second process gas and for adjusting the inlet flow rate of the second process gas from about 0 sccm to about 10,000 sccm over a period of time greater than about 300 milliseconds to maintain transient heat flux loads applied by the plasma to an inner surface of the plasma chamber below a vaporization temperature of the plasma chamber.

US Patent:

20100206847, Aug 19, 2010

Filed:

Oct 19, 2007

Appl. No.:

12/738314

Inventors:

Xing Chen - Lexington MA, US
Andrew Cowe - Andover MA, US

International Classification:

C23F 1/00
C23F 1/08
C23C 16/00
C23C 16/455

US Classification:

216 67, 1563451, 15634533, 118723 R, 427569, 134 11

Abstract:

A plasma chamber for activating a process gas, including at least four legs forming a toroidal plasma channel, each leg having a cross-sectional area, and an outlet formed on one leg, the outlet having a greater cross-sectional area than the cross-sectional area of the other legs. The plasma chamber further includes an inlet for receiving the process gas and a plenum for introducing the process gas over a broad area of the leg opposing the outlet to reduce localized high plasma impedance and gas flow instability, wherein the leg opposing the outlet defines a plurality of holes for providing a helical gas rotation in the plasma channel.

US Patent:

20100219757, Sep 2, 2010

Filed:

Feb 27, 2009

Appl. No.:

12/394904

Inventors:

Souheil Benzerrouk - Lowell MA, US
Siddharth P. Nagarkatti - Acton MA, US
Andrew Cowe - Andover MA, US
Ali Shajii - Canton MA, US
Jesse E. Ambrosina - Topsfield MA, US
Ken Tran - North Chelmsford MA, US
Xing Chen - Lexington MA, US

International Classification:

H05H 1/24

US Classification:

31511151

Abstract:

Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.