Binh Q Tran

Address:

12010 Fairpoint Dr, Houston, TX 77099

VIN:

1GCGG29V871169174

Make:

CHEVROLET

Model:

EXPRESS CARGO

Year:

2007

US Patent:

20100294199, Nov 25, 2010

Filed:

Apr 20, 2010

Appl. No.:

12/763522

Inventors:

BINH TRAN - Houston TX, US
ANQING CUI - Palo Alto CA, US
BERNARD L. HWANG - Santa Clara CA, US
SON T. NGUYEN - San Jose CA, US
ANH N. NGUYEN - Milpitas CA, US
SEAN M. SEUTTER - San Jose CA, US
XIANZHI TAO - San Jose CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

H01L 21/02
C23C 16/00
C23C 16/513
C23C 16/455

US Classification:

118723 R, 118715, 118722, 257E21002

Abstract:

Embodiments of the invention provide improved apparatus for depositing layers on substrates, such as by chemical vapor deposition (CVD). The inventive apparatus disclosed herein may advantageously facilitate one or more of depositing films having reduced film thickness non-uniformity within a given process chamber, improved particle performance (e.g., reduced particles on films formed in the process chamber), chamber-to-chamber performance matching amongst a plurality of process chambers, and improved process chamber serviceability.

US Patent:

20120291709, Nov 22, 2012

Filed:

Jul 26, 2012

Appl. No.:

13/559511

Inventors:

Jacob Smith - Santa Clara CA, US
ALEXANDER TAM - Union City CA, US
R. SURYANARAYANAN IYER - Edina MN, US
SEAN SEUTTER - San Jose CA, US
BINH TRAN - Houston TX, US
NIR MERRY - Mountain View CA, US
ADAM BRAILOVE - San Jose CA, US
ROBERT SHYDO, JR. - Pelham NH, US
ROBERT ANDREWS - Kensington NH, US
FRANK ROBERTS - North Reading MA, US
THEODORE SMICK - Essex MA, US
GEOFFREY RYDING - Manchester MA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 14/50

US Classification:

118725

Abstract:

A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.