Brian C Mattson

US Patent:

49676458, Nov 6, 1990

Filed:

Nov 27, 1989

Appl. No.:

7/441610

Inventors:

Brian Mattson - Boise ID

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

F24F 900

US Classification:

98 315

Abstract:

A cleanroom facility is provided with an air shower in which gasper jets are used to direct air in a preferred manner against persons entering the cleanroom facility. The gasper jets are combined with a downward air flow and with air curtains which limit the escape of dust particles from the air shower to remaining portions of the cleanroom facility. Primary and secondary air showers are provided to first remove excess particles from the person's street clothes, and then remove any loose particles which may be on the person's cleanroom clothing. A third air shower is provided as a separate secondary air shower for a second cleanroom facility area.

US Patent:

50691139, Dec 3, 1991

Filed:

Jun 4, 1990

Appl. No.:

7/533195

Inventors:

Brian J. Mattson - Boise ID
Chester N. Edwards - Boise ID

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

F24F 1300
F04B 1700

US Classification:

454252

Abstract:

A pair of recirculating fans for semiconductor cleanroom use are stacked to allow each fan to service a smaller zone in the cleanroom than if the fans were placed side by side. Each fan controls the temperature, humidity, and particulate count for its own zone of the cleanroom, thereby allowing strict control of these parameters. The ductwork of the two fans are cross connected so that either fan can be maintained or repaired while the other fan services its own zone and the zone normally serviced by the off-line fan.