Brian Wesley Nelson

US Patent:

7372059, May 13, 2008

Filed:

Oct 17, 2005

Appl. No.:

11/252021

Inventors:

Uri Shumlak - Seattle WA, US
Raymond Golingo - Seattle WA, US
Brian A. Nelson - Mountlake Terrace WA, US

Assignee:

The University of Washington - Seattle WA

International Classification:

A61N 5/06
G01J 3/10
H05G 2/00

US Classification:

250504R, 2505051, 2504931, 378119, 378121, 378122, 378145, 378 34, 378 84, 31511131, 31511141, 31511181, 31511191, 21912131, 21912141, 21912148, 31323131, 31323141

Abstract:

Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13. 5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.

US Patent:

7825391, Nov 2, 2010

Filed:

Apr 10, 2008

Appl. No.:

12/101083

Inventors:

Uri Shumlak - Seattle WA, US
Raymond Golingo - Seattle WA, US
Brian A. Nelson - Mountlake Terrace WA, US

Assignee:

The University of Washington - Seattle WA

International Classification:

A61N 5/06

US Classification:

250504R, 2504931

Abstract:

Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13. 5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.

US Patent:

8341653, Dec 25, 2012

Filed:

May 7, 2010

Appl. No.:

12/776060

Inventors:

Price Berrien Terzis - Los Altos Hills CA, US
Artem Mishin - Pacifica CA, US
Christopher Montgomery Carpenter - Sunnyvale CA, US
Brian Hale Nelson - Fremont CA, US
Craig Barker - San Carlos CA, US

Assignee:

Hitachi-LG Data Storage Korea, Inc.

International Classification:

G11B 15/68
G11B 17/22

US Classification:

720615, 369 3042, 369 3049

Abstract:

Embodiments provide methods and systems for handling optical discs in a media library appliance and for replacing optical drives in the field. In one embodiment, the media library appliance comprises optical disc handling robotics developed for slim form factor slot load drives in a vertical orientation located on both sides of the robotics within a 19 inch rackable appliance. On the system level, the optical disc storage system provides modularity and scalability. The drives reside in field replaceable units (“FRUs”) that are oriented vertically on a horizontal backplane. The disc handling robotics access discs on each side stored in horizontal stacks within large disc cartridges. A small disc shuttle cartridge attaches to a large disc cartridge to provide a means to import and export a smaller number of discs from the disc cartridge.

US Patent:

56005121, Feb 4, 1997

Filed:

Jun 7, 1995

Appl. No.:

8/477295

Inventors:

Hatem R. Radwam - San Jose CA
Clifford T. Jue - Santa Cruz CA
Brian H. Nelson - Fremont CA
Bradley D. Kelemen - Santa Cruz CA

Assignee:

Seagate Technology, Inc. - Scotts Valley CA

International Classification:

G11B 1708

US Classification:

360 9808

Abstract:

A spacer supports a disc on a hub in a disc drive. The hub is rotatable about an axis of rotation. The spacer includes a member having an inner radial surface defining a hub receiving aperture for receiving an exterior surface of the hub. The inner radial surface has a generally annular groove extending from the inner radial surface generally radially outwardly from the hub.

US Patent:

20220392651, Dec 8, 2022

Filed:

May 27, 2022

Appl. No.:

17/827396

Inventors:

- Seattle WA, US
Brian A. Nelson - Edmonds WA, US
Uri Shumlak - Seattle WA, US

International Classification:

G21B 1/05
G21B 1/21

Abstract:

Methods and systems are provided for plasma confinement utilizing various electrode and valve configurations. In one example, a device includes a first electrode positioned to define an outer boundary of an acceleration volume, a second electrode arranged coaxially with respect to the first electrode and positioned to define an inner boundary of the acceleration volume, at least one power supply to drive an electric current along a Z-pinch plasma column between the first second electrodes, and a set of valves to provide gas to the acceleration volume to fuel the Z-pinch plasma column, wherein an electron flow of the electric current is in a first direction from the second electrode to the first electrode. In additional or alternative examples, a shaping part is conductively connected to the second electrode to, in a presence of the gas, cause a gas breakdown of the gas to generate a sheared flow velocity profile.

US Patent:

20220394838, Dec 8, 2022

Filed:

May 27, 2022

Appl. No.:

17/827379

Inventors:

- Seattle WA, US
Brian A. Nelson - Edmonds WA, US
Eric T. Meier - Seattle WA, US

International Classification:

H05H 1/06

Abstract:

Methods and systems are provided for plasma confinement utilizing various electrode and valve configurations. In one example, a device includes a first electrode positioned to define an outer boundary of an acceleration volume, a second electrode arranged coaxially with respect to the first electrode and positioned to define an inner boundary of the acceleration volume, at least one power supply to drive an electric current along a Z-pinch plasma column between the first second electrodes, and a set of valves to provide gas to the acceleration volume to fuel the Z-pinch plasma column, wherein an electron flow of the electric current is in a first direction from the second electrode to the first electrode. In additional or alternative examples, a shaping part is conductively connected to the second electrode to, in a presence of the gas, cause a gas breakdown of the gas to generate a sheared flow velocity profile.

US Patent:

20220394839, Dec 8, 2022

Filed:

Jun 15, 2022

Appl. No.:

17/841591

Inventors:

- Seattle WA, US
Brian A. Nelson - Edmonds WA, US
Eric T. Meier - Seattle WA, US

International Classification:

H05H 1/06
H05H 1/54

Abstract:

Methods and systems are provided for plasma confinement utilizing various electrode and valve configurations. In one example, a device includes a first electrode positioned to define an outer boundary of an acceleration volume, a second electrode arranged coaxially with respect to the first electrode and positioned to define an inner boundary of the acceleration volume, at least one power supply to drive an electric current along a Z-pinch plasma column between the first second electrodes, and a set of valves to provide gas to the acceleration volume to fuel the Z-pinch plasma column, wherein an electron flow of the electric current is in a first direction from the second electrode to the first electrode. In additional or alternative examples, a shaping part is conductively connected to the second electrode to, in a presence of the gas, cause a gas breakdown of the gas to generate a sheared flow velocity profile.

US Patent:

20220394840, Dec 8, 2022

Filed:

Jun 15, 2022

Appl. No.:

17/841593

Inventors:

- Seattle WA, US
Brian A. Nelson - Edmonds WA, US
Uri Shumlak - Seattle WA, US

International Classification:

H05H 1/06

Abstract:

Methods and systems are provided for plasma confinement utilizing various electrode and valve configurations. In one example, a device includes a first electrode positioned to define an outer boundary of an acceleration volume, a second electrode arranged coaxially with respect to the first electrode and positioned to define an inner boundary of the acceleration volume, at least one power supply to drive an electric current along a Z-pinch plasma column between the first second electrodes, and a set of valves to provide gas to the acceleration volume to fuel the Z-pinch plasma column, wherein an electron flow of the electric current is in a first direction from the second electrode to the first electrode. In additional or alternative examples, a shaping part is conductively connected to the second electrode to, in a presence of the gas, cause a gas breakdown of the gas to generate a sheared flow velocity profile.