Bridgette Maria Budhlall

US Patent:

8007986, Aug 30, 2011

Filed:

May 29, 2007

Appl. No.:

11/754725

Inventors:

Peng Zhang - Quakertown PA, US
Bridgette Maria Budhlall - Bethlehem PA, US
Gene Everad Parris - Coopersburg PA, US
Leslie Cox Barber - Bothell WA, US

Assignee:

Air Products and Chemicals, Inc. - Allentown PA

International Classification:

G02F 1/361

US Classification:

430311, 252588, 252589, 252582

Abstract:

Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least one additive useful for performing immersion lithography at an operating wavelength ranging from 140 nm to 365 nm are disclosed herein.

US Patent:

20050161644, Jul 28, 2005

Filed:

Jan 23, 2004

Appl. No.:

10/764227

Inventors:

Peng Zhang - Quakertown PA, US
Bridgette Budhlall - Bethlehem PA, US
Gene Parris - Coopersburg PA, US
Leslie Barber - Cave Creek AZ, US

International Classification:

G03B011/00

US Classification:

252582000

Abstract:

Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least one additive useful for performing immersion lithography at an operating wavelength ranging from 140 nm to 248 nm are disclosed herein.

US Patent:

20050173682, Aug 11, 2005

Filed:

Jan 7, 2005

Appl. No.:

11/030132

Inventors:

Peng Zhang - Quakertown PA, US
Bridgette Budhlall - Bethlehem PA, US
Gene Parris - Coopersburg PA, US
Leslie Barber - Cave Creek AZ, US

International Classification:

G03B011/00

US Classification:

252582000

Abstract:

Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least one additive useful for performing immersion lithography at an operating wavelength ranging from 140 nm to 365 nm are disclosed herein.

US Patent:

20130150533, Jun 13, 2013

Filed:

Aug 25, 2011

Appl. No.:

13/818408

Inventors:

Bridgette M. Budhlall - Dracut MA, US
Amit L. Garle - New Haven CT, US

International Classification:

C08G 63/672
C07D 313/04

US Classification:

525447, 528301, 549271, 540544, 549266, 549267, 549 10, 549 11

Abstract:

A shape-memory polymers comprising at least one monomer subunit represented by the following structural formula (1).

US Patent:

20140045218, Feb 13, 2014

Filed:

Mar 15, 2013

Appl. No.:

13/841903

Inventors:

Zarif Farhana Mohd Aris - Lowell MA, US
Ryan M. Bouldin - Bar Harbor ME, US
Ramaswamy Nagarajan - Westford MA, US
Bridgette Budhlall - Dracut MA, US
Vishal Bavishi - Lowell MA, US

Assignee:

University of Massachusetts - Shrewsbury MA

International Classification:

C08B 37/00
C12P 19/26
C08B 37/08

US Classification:

435 84, 530322, 536 3, 536 20, 536115, 527313

Abstract:

A surfactant produced by reacting naturally occurring polysaccharides that are not water soluble with a hydrophilic substituent on a carboxylic portion of the polysaccharide. In a second reaction, the surfactant is further substituted on a hydroxylic portion with a hydrophobic or lipophilic substituent, so as to make the reaction product both water soluble and capable of attracting oily material that is hydrophobic to be removed from a substrate by cleaning in water. Methods of making the surfactant and the follow-on reaction product are described.