Bryan W Reed

US Patent:

6342430, Jan 29, 2002

Filed:

Apr 13, 2000

Appl. No.:

09/548680

Inventors:

Scott G. Adams - Ithaca NY
Kevin A. Shaw - Ithaca NY
Russell Y. Webb - Ithaca NY
Bryan W. Reed - Ithaca NY
Noel C. MacDonald - Ithaca NY
Timothy J. Davis - Trumansburg NY

Assignee:

Kionix, Inc. - Ithaca NY
Cornell Research Foundation - Ithaca NY

International Classification:

H01L 2176

US Classification:

438424, 438421, 438666, 438 50, 438 52

Abstract:

An isolation process which enhances the performance of silicon micromechanical devices incorporates dielectric isolation segments within the silicon microstructure, which is otherwise composed of an interconnected grid of cantilevered beams. A metal layer on top of the beams provides interconnects and also allows contact to the silicon beams, electrically activating the device for motion or transduction. Multiple conduction paths are incorporated through a metal patterning step prior to structure definition. The invention improves manufacturability of previous processes by performing all lithographic patterning steps on flat topographies, and removing complicated metal sputtering steps required of most high aspect ratio processes. With little modification, the invention can be implemented with in grated circuit fabrication sequences for fully integrated devices.

US Patent:

8217352, Jul 10, 2012

Filed:

Sep 13, 2010

Appl. No.:

12/881075

Inventors:

Bryan W. Reed - Livermore CA, US

Assignee:

Lawrence Livermore National Security, LLC - Livermore CA

International Classification:

G01N 23/04

US Classification:

250311, 250306, 250307, 250310

Abstract:

A ponderomotive phase plate system and method for controllably producing highly tunable phase contrast transfer functions in a transmission electron microscope (TEM) for high resolution and biological phase contrast imaging. The system and method includes a laser source and a beam transport system to produce a focused laser crossover as a phase plate, so that a ponderomotive potential of the focused laser crossover produces a scattering-angle-dependent phase shift in the electrons of the post-sample electron beam corresponding to a desired phase contrast transfer function.

US Patent:

20110168888, Jul 14, 2011

Filed:

Jan 10, 2011

Appl. No.:

12/987803

Inventors:

Bryan W. Reed - Livermore CA, US
Richard M. Shuttlesworth - Brentwood CA, US
Thomas B. Lagrange - Brentwood CA, US
David J. Gibson - San Francisco CA, US

Assignee:

Lawrence Livermore National Security, LLC - Livermore CA

International Classification:

G01N 23/04
H01J 37/26

US Classification:

250307, 250311

Abstract:

A dynamic transmission electron microscope (DTEM) according to one embodiment includes an electron gun positioned at a top of a column for emitting electrons; an accelerator for accelerating the electrons; a C lens positioned below the accelerator for focusing greater than about 95% of the electrons exiting the accelerator; a drift space positioned below the C lens; a condenser lens system positioned below the drift space; and a camera chamber positioned below the condenser lens system, the camera chamber for housing a single electron sensitive camera. Additional systems and methods are also presented.

US Patent:

62394738, May 29, 2001

Filed:

Jan 14, 1999

Appl. No.:

9/231082

Inventors:

Scott G. Adams - Ithaca NY
Kevin A. Shaw - Ithaca NY
Russell Y. Webb - Ithaca NY
Bryan W. Reed - Ithaca NY
Noel C. MacDonald - Ithaca NY
Timothy J. Davis - Trumansburg NY

Assignee:

Kionix, Inc. - Ithaca NY
Cornell Research Foundation Inc. - Ithaca NY

International Classification:

H01L 2984

US Classification:

257419

Abstract:

An isolation process which enhances the performance of silicon micromechanical devices incorporates dielectric isolation segments within the silicon microstructure, which is otherwise composed of an interconnected grid of cantilevered beams. A metal layer on top of the beams provides interconnects and also allows contact to the silicon beams, electrically activating the device for motion or transduction. Multiple conduction paths are incorporated through a metal patterning step prior to structure definition. The invention improves manufacturability of previous processes by performing all lithographic patterning steps on flat topographies, and removing complicated metal sputtering steps required of most high aspect ratio processes. With little modification, the invention can be implemented with integrated circuit fabrication sequences for fully integrated devices.

US Patent:

20220406561, Dec 22, 2022

Filed:

May 26, 2022

Appl. No.:

17/825261

Inventors:

- Pleasanton CA, US
Bryan Walter REED - San Leandro CA, US
Daniel Joseph MASIEL - Alamo CA, US
Sang Tae PARK - Danville CA, US

International Classification:

H01J 37/24
H01J 37/28
H01J 37/29
H01J 37/147

Abstract:

A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.

US Patent:

20220336185, Oct 20, 2022

Filed:

Mar 7, 2022

Appl. No.:

17/688339

Inventors:

- Pleasanton CA, US
Bryan Walter REED - San Leandro CA, US
Daniel Joseph MASIEL - Alamo CA, US
Sang Tae PARK - Danville CA, US

International Classification:

H01J 37/24
H01J 37/147
H01J 37/28
H01J 37/29

Abstract:

A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.

US Patent:

20230072991, Mar 9, 2023

Filed:

Sep 7, 2022

Appl. No.:

17/939309

Inventors:

- Tokyo, JP
Kazuki Yagi - Tokyo, JP
Ruth Shewmon Bloom - Oakland CA, US
Bryan W. Reed - San Leandro CA, US

International Classification:

H01J 37/04
H01J 37/28
G01N 23/04

Abstract:

A charged particle beam device scans a specimen with a charged particle beam and generates an image based on a detected signal from a detector that detects a signal generated from the specimen based on the scan performed by the charged particle beam. The charged particle beam device includes: a blanker that performs blanking of the charged particle beam; an image acquisition unit that acquires a plurality of images by controlling the blanking during the scan performed by the charged particle beam, the plurality of images including pixels corresponding to a region of the specimen that is irradiated with the charged particle beam and pixels corresponding to a region of the specimen that is not irradiated with the charged particle beam; and an integrated image generation unit that generates an integrated image by integrating the plurality of acquired images.

US Patent:

20210082661, Mar 18, 2021

Filed:

Jul 27, 2020

Appl. No.:

16/939576

Inventors:

- Pleasanton CA, US
Sang Tae PARK - Pleasanton CA, US
Bryan REED - Pleasanton CA, US
Daniel MASIEL - Pleasanton CA, US

International Classification:

H01J 37/26
H01J 37/147
H01J 37/244

Abstract:

Methods and systems for acquiring transmission electron microscope video data on a rolling-shutter detector at an enhanced frame rate and without temporal distortions are described. Also described are methods to enhance the dynamic range of image and diffraction data acquired using a transmission electron microscope. The disclosed methods and systems may also be applicable to photon detection and imaging systems.