Bryant A Campbell

US Patent:

45399336, Sep 10, 1985

Filed:

Aug 31, 1983

Appl. No.:

6/528193

Inventors:

Bryant A. Campbell - Los Gatos CA
Dale R. DuBois - Los Gatos CA
Ralph F. Manriquez - Saratoga CA
Nicholas E. Miller - Cupertino CA

Assignee:

Anicon, Inc. - San Jose CA

International Classification:

C23C 1308

US Classification:

118719

Abstract:

An improved chemical vapor deposition device having heating means substantially surrounding an inner deposition chamber for providing isothermal or precisely controlled gradient temperature conditions therein. The internal components of the chamber are quartz or similar radiant energy transparent material. Also included are special cooling means to protect thermally sensitive seals, structural configurations strengthening areas of glass components subjected to severe stress during operation, and specific designs permitting easy removal and replacement of all glass components exposed to deposition gas.

US Patent:

45453276, Oct 8, 1985

Filed:

Aug 27, 1982

Appl. No.:

6/412237

Inventors:

Bryant A. Campbell - Los Gatos CA
Nicholas E. Miller - Cupertino CA

Assignee:

Anicon, Inc. - San Jose CA

International Classification:

C23C 1308

US Classification:

118719

Abstract:

A chemical vapor deposition device having uniformly distributed heating means substantially surrounding an inner deposition reaction chamber for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber spaced therefrom.

US Patent:

45247196, Jun 25, 1985

Filed:

Sep 6, 1983

Appl. No.:

6/529415

Inventors:

Bryant A. Campbell - Los Gatos CA
Dale R. DuBois - Los Gatos CA
Ralph F. Manriquez - Saratoga CA
Nicholas E. Miller - Cupertino CA

Assignee:

Anicon, Inc. - San Jose CA

International Classification:

C23C 1308

US Classification:

118719

Abstract:

A controlled temperature deposition device comprising an inner reaction chamber having gas distribution means for introducing gas into inner chamber and removing gas therefrom and a vacuum chamber means surrounding the inner deposition chamber and spaced from the walls thereof for maintaining a medium vacuum therein. Associated with the deposition device is a substrate loading and unloading fork which transfers substrates such as wafer boats from outside the device to a position in the inner deposition chamber and removes them from the inner deposition chamber following deposition.

US Patent:

50842390, Jan 28, 1992

Filed:

Aug 31, 1990

Appl. No.:

7/576235

Inventors:

Kern A. Moulton - Livermore CA
Bryant A. Campbell - Los Gatos CA
Ross A. Caputo - Long Grove IL

Assignee:

Abtox, Inc. - Pleasanton CA

International Classification:

A61L 214
A61L 220

US Classification:

422 22

Abstract:

A process for plasma sterilization comprising exposing an article in a sterilizing chamber to at least one cycle comprising a pulsed treatment with gaseous antimicrobial agent and a plasma treatment. The pulsed treatment comprises at least two pulse-vacuum cycles, each pulse-vacuum cycle comprising the steps of exposing the article to the gaseous antimicrobial agent at a pressure of from 4 to 18 torr and reducing the pressure in the sterilizing chamber to from 0. 1 to 4 torr. The plasma treatment comprising exposing the article to a plasma generated from gases selected from the group consisting essentially of argon, helium, nitrogen, oxygen, hydrogen and mixtures thereof, the exposure to the plasma being carried out at a pressure of from 0. 1 to 10 torr and a temperature of less than 80. degree. C. The antimicrobial agent is selected from the group consisting of hydrogen peroxide, a peracid antimicrobial agent, and mixtures thereof, the peracid antimicrobial agent being selected from the group consisting of saturated and unsaturated peralkanoic acids having from 1 to 8 carbon atoms and halogenated derivatives thereof.

US Patent:

45474044, Oct 15, 1985

Filed:

Oct 2, 1984

Appl. No.:

6/657313

Inventors:

Bryant A. Campbell - Los Gatos CA
Nicholas E. Miller - Cupertino CA

Assignee:

Anicon, Inc. - San Jose CA

International Classification:

C23C 1100

US Classification:

4272481

Abstract:

A chemical vapor deposition device having uniformly distributed heating means substantially surrounding an inner deposition reaction chamber for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber spaced therefrom.

US Patent:

53763327, Dec 27, 1994

Filed:

Feb 22, 1993

Appl. No.:

8/020904

Inventors:

Phillip A. Martens - Fremont CA
Bryant A. Campbell - Los Gatos CA

Assignee:

ABTOX, Inc. - Mundelein IL

International Classification:

A61L 200

US Classification:

422 23

Abstract:

A method for plasma sterilization includes forming a gas plasma from a substantially oxygen-free mixture containing argon or helium and from 1% to 5% (v/v) hydrogen in a plasma generating chamber, and exposing an article to be sterilized in a sterilizing chamber to a non-explosive mixture of the plasma gas and from 1% up to 20% (v/v) oxygen gas. Preferably, the pressure in the sterilizing chamber is from 0. 1 to 10 torr and the chamber temperature is less than 6. degree. C. , the mixture from which the plasma is generated contains from 4% to 5% (v/v) hydrogen, and the article in the sterilizing chamber is exposed to a mixture of plasma gas and from 1% to 10% (v/v) oxygen.

US Patent:

51840464, Feb 2, 1993

Filed:

Sep 28, 1990

Appl. No.:

7/589511

Inventors:

Bryant A. Campbell - Los Gatos CA

Assignee:

Abtox, Inc. - Pleasanton CA

International Classification:

H05H 146
A61L 200

US Classification:

31511121

Abstract:

An apparatus for plasma sterilization including a sterilization chamber and at least one microwave plasma generator for producing gas plasma products communicating therewith. The mircowave plasma generator includes a cylindrical metal waveguide and an axially concentric magnetron antenna extending into the waveguide. The plasma generator includes an inner plasma container made of a electromagnetic transparent material.

US Patent:

51868938, Feb 16, 1993

Filed:

Aug 31, 1990

Appl. No.:

7/576294

Inventors:

Kern A. Moulton - Livermore CA
Bryant A. Campbell - Los Gatos CA
Ross A. Caputo - Long Grove IL

Assignee:

Abtox, Inc. - Pleasanton CA

International Classification:

A61L 200

US Classification:

422 23

Abstract:

A method for plasma sterilization within a controlled temperature range includes exposing an article in a sterilizing chamber to a gas plasma flowing from a plasma generating chamber until the temperature in the sterilizing chamber rises to a preselected maximum temperature. The flow of the plasma gas to the sterilizing chamber is terminated until the temperature in the sterilizing chamber falls to a temperature below the preselected maximum temperature. These steps are repeated until sterilization of the article is effected. The temperature below the preselected maximum temperature when gas plasma flow is again initiated is preferably not more than 3. degree. C. below the preselected maximum temperature. The gas plasma can be generated from a mixture of gases consisting essentially of argon, helium, nitrogen or mixtures thereof; from 1 to 21 (v/v) % oxygen; and from 1 to 20 (v/v) % hydrogen; or a mixture containing from 1 to 10 (v/v) % oxygen and from 3 to 7 (v/v) % hydrogen; or a mixture containing 1 to 10 (v/v) % hydrogen and from 90 to 99 (v/v) % of argon, helium, nitrogen or mixtures thereof. Preferably the pressure in the sterilizing chamber rises to from 0.