Epitaxial formation support structures and associated methods of manufacturing epitaxial formation support structures and solid state lighting devices are disclosed herein. In several embodiments, a method of manufacturing an epitaxial formation support substrate can include forming an uncured support substrate that has a first side, a second side opposite the first side, and coefficient of thermal expansion substantially similar to N-type gallium nitride. The method can further include positioning the first side of the uncured support substrate on a first surface of a first reference plate and positioning a second surface of a second reference plate on the second side to form a stack. The first and second surfaces can include uniformly flat portions. The method can also include firing the stack to sinter the uncured support substrate. At least side of the support substrate can form a planar surface that is substantially uniformly flat.
Quantum Tunneling Devices And Circuits With Lattice-Mismatched Semiconductor Structures
Structures include a tunneling device disposed over first and second lattice-mismatched semiconductor materials. Process embodiments include forming tunneling devices over lattice-mismatched materials.
Semiconductor Sensor Structures With Reduced Dislocation Defect Densities
Non-silicon based semiconductor devices are integrated into silicon fabrication processes by using aspect-ratio-trapping materials. Non-silicon light-sensing devices in a least a portion of a crystalline material can output electrons generated by light absorption therein. Exemplary light-sensing devices can have relatively large micron dimensions. As an exemplary application, complementary-metal-oxide-semiconductor photodetectors are formed on a silicon substrate by incorporating an aspect-ratio-trapping technique.
Michael Tischler - Scottsdale AZ, US Philippe Schick - Vancouver, CA Ian Ashdown - West Vancouver, CA Calvin Wade Sheen - Derry NH, US Paul Jungwirth - Burnaby, CA
Assignee:
Cooledge Lighting Inc. - British Columbia
International Classification:
H01L 33/00 H01L 21/00
US Classification:
257 99, 438 22
Abstract:
In accordance with certain embodiments, a semiconductor die is adhered directly to a yielding substrate with a pressure-activated adhesive notwithstanding any nonplanarity of the surface of the semiconductor die or non-coplanarity of the semiconductor die contacts.
Michael Tischler - Scottsdale AZ, US Philippe Schick - Vancover, CA Ian Ashdown - West Vancover, CA Calvin Wade Sheen - Derry NH, US Paul Jungwirth - Burnaby, CA
Assignee:
Cooledge Lighting Inc. - Burnaby
International Classification:
H01L 29/72
US Classification:
257 99, 257 13
Abstract:
In accordance with certain embodiments, an unpackaged inorganic LED die is adhered directly to a yielding substrate with a pressure-activated adhesive notwithstanding any nonplanarity of the surface of the unpackaged inorganic LED die or non-coplanarity of the contacts thereof.
Epitaxial Formation Support Structures And Associated Methods
Epitaxial formation support structures and associated methods of manufacturing epitaxial formation support structures and solid state lighting devices are disclosed herein. In several embodiments, a method of manufacturing an epitaxial formation support substrate can include forming an uncured support substrate that has a first side, a second side opposite the first side, and coefficient of thermal expansion substantially similar to N-type gallium nitride. The method can further include positioning the first side of the uncured support substrate on a first surface of a first reference plate and positioning a second surface of a second reference plate on the second side to form a stack. The first and second surfaces can include uniformly flat portions. The method can also include firing the stack to sinter the uncured support substrate. At least side of the support substrate can form a planar surface that is substantially uniformly flat.
Michael A. Tischler - Scottsdale AZ, US Philippe M. Schick - Vancouver, CA Ian Ashdown - West Vancouver, CA Calvin Wade Sheen - Derry NH, US Paul Jungwirth - Burnaby, CA
Assignee:
Cooledge Lighting Inc. - Burnaby
International Classification:
H01L 33/00 H01L 21/00
US Classification:
257 99, 438 22
Abstract:
In accordance with certain embodiments, a semiconductor die is adhered directly to a yielding substrate with a pressure-activated adhesive notwithstanding any nonplanarity of the surface of the semiconductor die or non-coplanarity of the semiconductor die contacts.
Quantum Tunneling Devices And Circuits With Lattice-Mismatched Semiconductor Structures
Structures include a tunneling device disposed over first and second lattice-mismatched semiconductor materials. Process embodiments include forming tunneling devices over lattice-mismatched materials.