Calvin Wade Sheen

age ~63

from La Mesa, CA

Also known as:
  • Calvin W Sheen
  • Calvin O Sheen
  • Wade C Sheen

Calvin Sheen Phones & Addresses

  • La Mesa, CA
  • 428 Agua Vista Dr, Chula Vista, CA 91914 • 6034791024
  • Gilbert, AZ
  • 126 500 W, Salem, UT 84653
  • 5 Stoneleigh Dr, Derry, NH 03038 • 6034328607
  • Salem, NH
  • Mesa, AZ
  • San Jose, CA
  • West Chester, PA
  • Chester Springs, PA
  • Exton, PA
  • 498 E Bridle Way, Gilbert, AZ 85295 • 4808997884

Work

  • Position:
    Service Occupations

Education

  • Degree:
    High school graduate or higher

Us Patents

  • Epitaxial Formation Support Structures And Associated Methods

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  • US Patent:
    8187901, May 29, 2012
  • Filed:
    Dec 6, 2010
  • Appl. No.:
    12/961370
  • Inventors:
    Calvin Wade Sheen - Derry NH, US
  • Assignee:
    Micron Technology, Inc. - Boise ID
  • International Classification:
    H01L 21/00
  • US Classification:
    438 46, 438458, 257E21497
  • Abstract:
    Epitaxial formation support structures and associated methods of manufacturing epitaxial formation support structures and solid state lighting devices are disclosed herein. In several embodiments, a method of manufacturing an epitaxial formation support substrate can include forming an uncured support substrate that has a first side, a second side opposite the first side, and coefficient of thermal expansion substantially similar to N-type gallium nitride. The method can further include positioning the first side of the uncured support substrate on a first surface of a first reference plate and positioning a second surface of a second reference plate on the second side to form a stack. The first and second surfaces can include uniformly flat portions. The method can also include firing the stack to sinter the uncured support substrate. At least side of the support substrate can form a planar surface that is substantially uniformly flat.
  • Quantum Tunneling Devices And Circuits With Lattice-Mismatched Semiconductor Structures

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  • US Patent:
    8216951, Jul 10, 2012
  • Filed:
    Dec 20, 2010
  • Appl. No.:
    12/973616
  • Inventors:
    Zhiyuan Cheng - Lincoln MA, US
    Calvin Sheen - Derry NH, US
  • Assignee:
    Taiwan Semiconductor Manufacturing Company, Ltd. - Hsin-Chu
  • International Classification:
    H01L 21/04
  • US Classification:
    438979, 438143, 438407, 438511, 438797, 257E21353, 257E21367, 257E21404
  • Abstract:
    Structures include a tunneling device disposed over first and second lattice-mismatched semiconductor materials. Process embodiments include forming tunneling devices over lattice-mismatched materials.
  • Semiconductor Sensor Structures With Reduced Dislocation Defect Densities

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  • US Patent:
    8253211, Aug 28, 2012
  • Filed:
    Sep 24, 2009
  • Appl. No.:
    12/565863
  • Inventors:
    Zhiyuan Cheng - Lincoln MA, US
    James G. Fiorenza - Wilmington MA, US
    Calvin Sheen - Derry NH, US
    Anthony Lochtefeld - Ipswich MA, US
  • Assignee:
    Taiwan Semiconductor Manufacturing Company, Ltd. - Hsin-Chu
  • International Classification:
    H01L 21/14
  • US Classification:
    257431, 257E33002, 257E31079
  • Abstract:
    Non-silicon based semiconductor devices are integrated into silicon fabrication processes by using aspect-ratio-trapping materials. Non-silicon light-sensing devices in a least a portion of a crystalline material can output electrons generated by light absorption therein. Exemplary light-sensing devices can have relatively large micron dimensions. As an exemplary application, complementary-metal-oxide-semiconductor photodetectors are formed on a silicon substrate by incorporating an aspect-ratio-trapping technique.
  • Electronic Devices With Yielding Substrates

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  • US Patent:
    8384121, Feb 26, 2013
  • Filed:
    Jun 29, 2011
  • Appl. No.:
    13/171973
  • Inventors:
    Michael Tischler - Scottsdale AZ, US
    Philippe Schick - Vancouver, CA
    Ian Ashdown - West Vancouver, CA
    Calvin Wade Sheen - Derry NH, US
    Paul Jungwirth - Burnaby, CA
  • Assignee:
    Cooledge Lighting Inc. - British Columbia
  • International Classification:
    H01L 33/00
    H01L 21/00
  • US Classification:
    257 99, 438 22
  • Abstract:
    In accordance with certain embodiments, a semiconductor die is adhered directly to a yielding substrate with a pressure-activated adhesive notwithstanding any nonplanarity of the surface of the semiconductor die or non-coplanarity of the semiconductor die contacts.
  • Electronic Devices With Yielding Substrates

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  • US Patent:
    8466488, Jun 18, 2013
  • Filed:
    May 8, 2012
  • Appl. No.:
    13/466288
  • Inventors:
    Michael Tischler - Scottsdale AZ, US
    Philippe Schick - Vancover, CA
    Ian Ashdown - West Vancover, CA
    Calvin Wade Sheen - Derry NH, US
    Paul Jungwirth - Burnaby, CA
  • Assignee:
    Cooledge Lighting Inc. - Burnaby
  • International Classification:
    H01L 29/72
  • US Classification:
    257 99, 257 13
  • Abstract:
    In accordance with certain embodiments, an unpackaged inorganic LED die is adhered directly to a yielding substrate with a pressure-activated adhesive notwithstanding any nonplanarity of the surface of the unpackaged inorganic LED die or non-coplanarity of the contacts thereof.
  • Epitaxial Formation Support Structures And Associated Methods

    view source
  • US Patent:
    8524518, Sep 3, 2013
  • Filed:
    May 7, 2012
  • Appl. No.:
    13/465867
  • Inventors:
    Calvin Wade Sheen - Derry NH, US
  • Assignee:
    Micron Technology, Inc. - Boise ID
  • International Classification:
    H01L 21/00
  • US Classification:
    438 46, 438458, 257E21497
  • Abstract:
    Epitaxial formation support structures and associated methods of manufacturing epitaxial formation support structures and solid state lighting devices are disclosed herein. In several embodiments, a method of manufacturing an epitaxial formation support substrate can include forming an uncured support substrate that has a first side, a second side opposite the first side, and coefficient of thermal expansion substantially similar to N-type gallium nitride. The method can further include positioning the first side of the uncured support substrate on a first surface of a first reference plate and positioning a second surface of a second reference plate on the second side to form a stack. The first and second surfaces can include uniformly flat portions. The method can also include firing the stack to sinter the uncured support substrate. At least side of the support substrate can form a planar surface that is substantially uniformly flat.
  • Electronic Devices With Yielding Substrates

    view source
  • US Patent:
    8552463, Oct 8, 2013
  • Filed:
    Jan 28, 2013
  • Appl. No.:
    13/751563
  • Inventors:
    Michael A. Tischler - Scottsdale AZ, US
    Philippe M. Schick - Vancouver, CA
    Ian Ashdown - West Vancouver, CA
    Calvin Wade Sheen - Derry NH, US
    Paul Jungwirth - Burnaby, CA
  • Assignee:
    Cooledge Lighting Inc. - Burnaby
  • International Classification:
    H01L 33/00
    H01L 21/00
  • US Classification:
    257 99, 438 22
  • Abstract:
    In accordance with certain embodiments, a semiconductor die is adhered directly to a yielding substrate with a pressure-activated adhesive notwithstanding any nonplanarity of the surface of the semiconductor die or non-coplanarity of the semiconductor die contacts.
  • Quantum Tunneling Devices And Circuits With Lattice-Mismatched Semiconductor Structures

    view source
  • US Patent:
    8629047, Jan 14, 2014
  • Filed:
    Jul 9, 2012
  • Appl. No.:
    13/544661
  • Inventors:
    Zhiyuan Cheng - Lincoln MA, US
    Calvin Sheen - Derry NH, US
  • Assignee:
    Taiwan Semiconductor Manufacturing Company, Ltd. - Hsin-Chu
  • International Classification:
    H01L 21/8232
  • US Classification:
    438594, 438407, 438471, 438511, 438947, 438979, 257 24, 257427, 257E21353, 257E21367, 257E21404
  • Abstract:
    Structures include a tunneling device disposed over first and second lattice-mismatched semiconductor materials. Process embodiments include forming tunneling devices over lattice-mismatched materials.

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Youtube

Calin & Viktor Sheen Dvej

reie: Jan Ruttner DOP: Filip Knoll edit & color grading: Jakub Salavec...

  • Duration:
    2m 42s

Calin & Viktor Sheen Safr (Text)

#Calin #ViktorSheen #ROADTRIP Calin Viktor Sheen...

  • Duration:
    2m 37s

Calvin Coolidge - Charlie Sheen Winning (feat...

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  • Duration:
    2m 46s

Pick 6- Calvin Sheen

Pick 6 News highlights the outlandish parties and erratic behavior of ...

  • Duration:
    2m 31s

Calin & Viktor Sheen Cikdy (Text)

#Calin #ViktorSheen #ROADTRIP Calin Viktor Sheen...

  • Duration:
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7 March 2023

  • Duration:
    16s

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