Carl C Hansen

US Patent:

6690768, Feb 10, 2004

Filed:

Dec 21, 2000

Appl. No.:

09/745938

Inventors:

Carl Christian Hansen - Aloha OR

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

H04M 124

US Classification:

379 103, 379 28, 379 2907, 370465, 370480, 370493

Abstract:

The invention provides a technique for power cutback of DSL transceivers (e. g. , modems) using public switched telephone network (PSTN) signaling. For example, one or more dual-tone/multiple frequency (DTMF) signals generated by a touch-tone telephone, or other device, can cause a DSL transceiver to reduce the power of upstream data communications. A user of a DSL modem can cause the modem to transmit upstream data while listening to the microphone of a telephone coupled to the same twisted-pair line. Data transmission power can be adjusted by use of one or more buttons on the telephone. The DSL transceiver, in response to one or more predetermined DTMF signals, can adjust transmission power. Thus, the power cutback of the DSL transceiver can be controlled using PSTN signaling.

US Patent:

6807234, Oct 19, 2004

Filed:

Dec 19, 2000

Appl. No.:

09/742804

Inventors:

Carl Christian Hansen - Aloha OR

Assignee:

Intel Corporation - Santa Clara CA

International Classification:

H04L 2700

US Classification:

375259, 375295, 370525, 370526

Abstract:

A multi-carrier transceiver, such as a DMT-based ADSL transceiver, has separate processing paths for different information types, such as voice, data, video, etc. Each processing path can include separate scrambling, interleaving, bit loading or tone ordering, and constellation encoding. In this manner, specific bit loading or tone ordering can be performed for each of the different information types, such that transmission carriers are selected for optimal bit rates and error rates.

US Patent:

6899137, May 31, 2005

Filed:

Apr 6, 2001

Appl. No.:

09/826583

Inventors:

Marc A. Unger - South San Francisco CA, US
Todd A. Thorsen - Pasadena CA, US
Axel Scherer - Laguna Beach CA, US
Stephen R. Quake - San Marino CA, US
Markus M. Enzelberger - Pasadena CA, US
Mark L. Adams - Pasadena CA, US
Carl L. Hansen - Pasadena CA, US

Assignee:

California Institute of Technology - Pasadena CA

International Classification:

F15C001/06

US Classification:

137833, 137803, 137807, 137824, 13756516

Abstract:

A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

US Patent:

6929030, Aug 16, 2005

Filed:

Nov 28, 2001

Appl. No.:

09/997205

Inventors:

Marc A. Unger - South San Francisco CA, US
Todd A. Thorsen - Pasadena CA, US
Axel Scherer - Laguna Beach CA, US
Stephen R. Quake - San Marino CA, US
Jian Liu - Pasadena CA, US
Mark L. Adams - Pasadena CA, US
Carl L. Hansen - Pasadena CA, US

Assignee:

California Institute of Technology - Pasadena CA

International Classification:

F16K031/126

US Classification:

137883, 251 611

Abstract:

A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

US Patent:

7216671, May 15, 2007

Filed:

Feb 10, 2005

Appl. No.:

11/056451

Inventors:

Marc Unger - South San Francisco CA, US
Todd Thorsen - Pasadena CA, US
Axel Scherer - Laguna Beach CA, US
Stephen Quake - San Marino CA, US
Markus Enzelberger - Pasadena CA, US
Mark Adams - Pasadena CA, US
Carl Hansen - Pasadena CA, US

Assignee:

California Institute of Technology - Pasadena CA

International Classification:

F15C 1/06

US Classification:

137833, 137803, 137807, 137824, 13756516

Abstract:

A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

US Patent:

7250128, Jul 31, 2007

Filed:

Apr 20, 2005

Appl. No.:

11/111264

Inventors:

Marc A. Unger - South San Francisco CA, US
Todd A. Thorsen - Pasadena CA, US
Axel Scherer - Laguna Beach CA, US
Stephen R. Quake - San Marino CA, US
Jian Liu - Pasadena CA, US
Mark L. Adams - Pasadena CA, US
Carl L. Hansen - Pasadena CA, US

Assignee:

California Institute of Technology - Pasadena CA

International Classification:

B29C 39/02

US Classification:

264155, 264238, 264250, 264310, 264319

Abstract:

A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.

US Patent:

7326296, Feb 5, 2008

Filed:

May 23, 2005

Appl. No.:

11/135923

Inventors:

Stephen R. Quake - Stanford CA, US
Carl L. Hansen - Pasadena CA, US
James M. Berger - Kensington CA, US

Assignee:

California Institute of Technology - Pasadena CA
The Regents of the University of California - Oakland CA

International Classification:

C30B 29/00

US Classification:

117200, 117 68, 117 69, 4222451

Abstract:

High throughput screening of crystallization of a target material is accomplished by simultaneously introducing a solution of the target material into a plurality of chambers of a microfabricated fluidic device. The microfabricated fluidic device is then manipulated to vary the solution condition in the chambers, thereby simultaneously providing a large number of crystallization environments. Control over changed solution conditions may result from a variety of techniques, including but not limited to metering volumes of crystallizing agent into the chamber by volume exclusion, by entrapment of volumes of crystallizing agent determined by the dimensions of the microfabricated structure, or by cross-channel injection of sample and crystallizing agent into an array of junctions defined by intersecting orthogonal flow channels.

US Patent:

7754010, Jul 13, 2010

Filed:

Oct 31, 2007

Appl. No.:

11/932171

Inventors:

Marc A. Unger - South San Francisco CA, US
Todd A. Thorsen - Pasadena CA, US
Axel Scherer - Laguna Beach CA, US
Stephen R. Quake - San Marino CA, US
Markus M. Enzelberger - Pasadena CA, US
Mark L. Adams - Pasadena CA, US
Carl L. Hansen - Pasadena CA, US

Assignee:

California Institute of Technology - Pasadena CA

International Classification:

C30B 29/54

US Classification:

117 68, 117 69, 117 70, 117925

Abstract:

A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.