Chad R Fero

US Patent:

20110318909, Dec 29, 2011

Filed:

Jun 29, 2010

Appl. No.:

12/826446

Inventors:

Jeffrey C. Gum - Stevensville MT, US
Chad Fero - Missoula MT, US

Assignee:

GT SOLAR INCORPORATED - Merrimack NH

International Classification:

H01L 21/205
H01L 21/365
C23C 16/02

US Classification:

438488, 118724, 438478, 257E21102, 257E21463

Abstract:

The invention can provide or facilitate energy recovery operations during semiconductor processing operations by utilizing a bell jar having a radiation shield thereon that is comprised of a mediating layer comprising nickel disposed on an interior surface of the bell jar, and a reflective layer which can comprise a gold layer that is disposed on the mediating layer. The reflective layer has an emissivity of less than 5% and, more preferably, the reflective layer has an emissivity of less than about 1%. Heat from the reaction chamber can be used to reduce the heating load of one or more other unit operations.

US Patent:

20110159214, Jun 30, 2011

Filed:

Mar 26, 2009

Appl. No.:

12/934160

Inventors:

Jeffrey C. Gum - Stevensville MT, US
Chad Fero - Missoula MT, US
Dan Desrosier - Missoula MT, US

Assignee:

GT SOLAR, INCORPORATED - Merrimack NH

International Classification:

C23C 16/46
C23C 16/455
C23C 16/458
C23C 16/24

US Classification:

427587, 118725, 427593

Abstract:

A reaction chamber system, and related devices and methods for use in the system, are provided in which reduced power consumption can be achieved by providing a thin layer of gold on one or more components inside a reaction chamber. The reaction chamber system can be used for chemical vapor deposition. The gold coating should be maintained to a thickness of at least about 0.1 microns, and more preferably about 0.5 to 3.0 microns, to provide a suitable emissivity inside the reaction chamber, and thus reduce heat losses.

US Patent:

20180327271, Nov 15, 2018

Filed:

Nov 14, 2016

Appl. No.:

15/776599

Inventors:

- Merrimack NH, US
Chad R. Fero - Missoula MT, US

International Classification:

C01B 33/035
C23C 16/24
C23C 16/44

Abstract:

A method of forming a filament assembly of a chemical vapor deposition (CVD) reactor, comprising at least one filament structure connected by a bridge, is disclosed. The filament structure comprises a hollow silicon filament integral with a silicon seed. Various embodiments of this invention are described, along with a CVD system comprising this filament assembly as well as a method of depositing silicon onto this filament assembly.

US Patent:

20170320746, Nov 9, 2017

Filed:

Jun 5, 2017

Appl. No.:

15/613517

Inventors:

- Seoul, KR
Chad Fero - Missoula MT, US
Aaron D. Rhodes - Missoula MT, US
Jeffrey C. Gum - Stevensville MT, US

International Classification:

C01B 33/035
C23C 16/44
C23C 16/24

Abstract:

In various embodiments, systems, methods, and apparatus are provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor system. A system includes a base plate having a plurality of electrical connections, a pair of filaments extending from the base plate, and a stabilizer connecting the pair of filaments. Each filament is in electrical contact with, and defines a conductive path between, the two electrical connections. A method of stabilizing the filaments includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electrically insulating material.

US Patent:

20140170337, Jun 19, 2014

Filed:

Dec 19, 2012

Appl. No.:

13/720133

Inventors:

- Merrimack NH, US
Chad Fero - Missoula MT, US
Aaron Dean Rhodes - Missoula MT, US
Jeffrey C. Gum - Stevensville MT, US

Assignee:

GTAT Corporation - Merrimack NH

International Classification:

C01B 33/021

US Classification:

427585, 118728

Abstract:

In various embodiments, systems, methods, and apparatus are provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor system. A system includes a base plate having a plurality of electrical connections, a pair of filaments extending from the base plate, and a stabilizer connecting the pair of filaments. Each filament is in electrical contact with, and defines a conductive path between, the two electrical connections. A method of stabilizing the filaments includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electrically insulating material.