Chao Yin Chen

US Patent:

6353552, Mar 5, 2002

Filed:

Mar 26, 2001

Appl. No.:

09/817951

Inventors:

Stephen P. Sample - Saratoga CA
Michael R. Butts - Portland OR
Kevin A. Norman - Belmont CA
Rakesh H. Patel - Cupertino CA
Chao Chiang Chen - Cupertino CA

Assignee:

Altera Corporation - San Jose CA
Quickturn Design Systems, Inc. - Mountain View CA

International Classification:

G11C 700

US Classification:

365154, 36518908

Abstract:

Methods and apparatus for initializing and determining the contents of a memory block in a programmable logic device. One apparatus includes a logic element, programmably configurable to implement user-defined combinatorial or registered logic functions, and a memory block to store data. The memory block is coupled to the logic element. The memory block includes a memory storage cell to store a first data bit, a shadow cell to store a second data bit, and a transfer circuit. When a first control line of a transfer circuit is asserted, the second bit is transferred from the shadow cell to the memory storage cell. When a second control line of the transfer circuit is asserted, the first bit is transferred from the memory storage cell to the shadow cell.

US Patent:

6905811, Jun 14, 2005

Filed:

Apr 22, 2003

Appl. No.:

10/420593

Inventors:

Chao Peng Chen - Fremont CA, US
Chunping Luo - Milpitas CA, US
Stuart Kao - Fremont CA, US

Assignee:

Headway Technologies, Inc. - Milpitas CA

International Classification:

G03F007/00

US Classification:

430296

Abstract:

As feature sizes approach 0. 1 μm or smaller, reduction of line edge roughness (LER) becomes increasingly important. Significant reductions in edge roughness have been achieved by applying a second Ebeam exposure after the initial one that is used to define the pattern. After this second blanket exposure a longer heat treatment and a stronger development process than before are used. In addition to reducing edge roughness the disclosed treatment allows the CD to be reduced under tight control since the amount of CD reduction is proportional to the second Ebeam dosage.

US Patent:

7279269, Oct 9, 2007

Filed:

Dec 12, 2003

Appl. No.:

10/734422

Inventors:

Stuart Kao - Fremont CA, US
Chao Peng Chen - Fremont CA, US
Chunping Luo - Milpitas CA, US
Kochan Ju - Monte Sereno CA, US
Min Li - Fremont CA, US

Assignee:

Headway Technologies, Inc. - Milpitas CA

International Classification:

G11B 5/39

US Classification:

430320, 430313, 360324, 216 22, 20419234

Abstract:

The series resistance of a CPP GMR stack can be reduced by shaping it into a small upper, on a somewhat larger, lower part. Because of the sub-micron dimensions involved, good alignment between these is normally difficult to achieve. The present invention discloses a self-alignment process based on first laying down a mask that will determine the shape of the top part. Ion beam etching is then initiated, the ion beam being initially applied from one side only at an angle to the surface normal. During etching, all material on the near side of the mask gets etched but, on the far side, only material that is outside the mask's shadow gets removed so, depending on the beam's angle, the size of the lower part is controlled and the upper part is precisely centrally aligned above it.

US Patent:

7301719, Nov 27, 2007

Filed:

Sep 21, 2006

Appl. No.:

11/525292

Inventors:

Chao Yuan Chen - San Jose CA, US
Shuyu Sun - Saratoga CA, US
Hoa Pham - San Jose CA, US
Sang Lee - Pleasanton CA, US

Assignee:

Samsung Electronics Co., Ltd. - Suwon

International Classification:

G11B 15/18

US Classification:

360 69

Abstract:

A calibration method for a fly on demand head of a hard disk drive. The method includes the steps of flying a head over a test track of a disk that is covered with a lubricant. A voltage is applied to a heating element of the head to move the head closer to the disk. The fly height of the head is then determined. The voltage can be incrementally varied until the head makes contact with the disk. This sequence can cause a modulated wear pattern in the lubricant of the disk. The voltage is terminated and the head is allowed to fly over the test track. The head is also moved to adjacent tracks on either side of the test track. A pressure gradient of the flying head moves the lubricant about the disk to mitigate the modulated wear pattern.

US Patent:

7350400, Apr 1, 2008

Filed:

Sep 22, 2006

Appl. No.:

11/525263

Inventors:

Chao Yuan Chen - San Jose CA, US

Assignee:

Samsung Electronics Co., Ltd. - Suwon

International Classification:

G01N 33/26
G01N 11/00
G01B 5/18
G01B 11/22

US Classification:

73 5305, 73 5402, 73150 R, 73866, 702166, 702170

Abstract:

A method for measuring the mobility of a lubricant located on the top surface of a disk used in hard disk drives. The method includes forming one or more scribe lines in a lubricant layer of the disk. The disk is then spun by a spin stand where lubricant moves in response to the centrifugal forces of the spinning disk. The disk is removed from the spin stand and the height of lubricant that moved into the scribe line is measured to determine lubricant mobility.

US Patent:

7864490, Jan 4, 2011

Filed:

Sep 18, 2007

Appl. No.:

11/901584

Inventors:

Stuart Kao - Fremont CA, US
Chao Peng Chen - Fremont CA, US
Chunping Luo - Milpitas CA, US
Kochan Ju - Monte Sereno CA, US
Min Li - Fremont CA, US

Assignee:

Headway Technologies, Inc. - Milpitas CA

International Classification:

G11B 5/33

US Classification:

3603241

Abstract:

The series resistance of a CPP GMR stack can be reduced by shaping it into a small upper, on a somewhat larger, lower part. Because of the sub-micron dimensions involved, good alignment between these is normally difficult to achieve. The present invention discloses a self-alignment process based on first laying down a mask that will determine the shape of the top part. Ion beam etching is then initiated, the ion beam being initially applied from one side only at an angle to the surface normal. During etching, all material on the near side of the mask gets etched but, on the far side, only material that is outside the mask's shadow gets removed so, depending on the beam's angle, the size of the lower part is controlled and the upper part is precisely centrally aligned above it.

US Patent:

8185348, May 22, 2012

Filed:

Oct 31, 2003

Appl. No.:

10/698736

Inventors:

Jerry Z. Shan - Palo Alto CA, US
Evan R. Kirshenbaum - Mountain View CA, US
Henri J. Suermondt - Sunnyvale CA, US
Dirk Beyer - Walnut Creek CA, US
Chao Chen - Berkeley CA, US

Assignee:

Hewlett-Packard Development Company, L.P. - Houston TX

International Classification:

G06F 17/18

US Classification:

702179, 702185

Abstract:

Systems and methods for detecting an interesting event in a data stream. More specifically, a monitoring system is configured to monitor a data stream and establish a sensitivity parameter based on sequences generated from values in a first portion of the data stream. A detector may be trained using the sensitivity parameter to detect the occurrence of an interesting event in the data stream.

US Patent:

20040009484, Jan 15, 2004

Filed:

Jul 11, 2002

Appl. No.:

10/195053

Inventors:

Paul Wolber - Los Altos CA, US
Matthew Yoshikawa - Milpitas CA, US
Chao Chen - Albany CA, US
Stephanie Fulmer-Smentek - Sunnyvale CA, US
Karen Shannon - Los Gatos CA, US
Francisco Cifuentes - Daly City CA, US

International Classification:

C12Q001/68
G06F019/00
G01N033/48
G01N033/50

US Classification:

435/006000, 702/020000

Abstract:

Methods are disclosed for predicting the potential of a hybridization oligonucleotide of length greater than about 20 nucleotides to hybridize to a target nucleotide sequence. The method involves evaluating predictor oligonucleotides based on one or more parameters. A subset of oligonucleotides within the predetermined number of predictor oligonucleotides is selected based on an examination of the parameter and application of a rule that rejects some of the oligonucleotides identified above. Oligonucleotides are identified in the selected subset, viewed according to order of position along the nucleotide sequence, that are in clusters along a region of the nucleotide sequence. The clusters are ranked in order of number of oligonucleotides. A hybridization oligonucleotide is selected for each cluster, in descending order of cluster rank. The selected hybridization oligonucleotide has as its central nucleotide the central nucleotide of a region of the nucleotide sequence that corresponds to the cluster. The remaining nucleotides of the hybridization oligonucleotide are added, in correspondence to the nucleotides in the nucleotide sequence that extend in one or both directions from the central nucleotide, until a hybridization oligonucleotide of predetermined length is obtained. Cross-hybridization probes are obtained based on the hybridization oligonucleotides by deletion of at least one nucleotide from the hybridization oligonucleotide wherein the deletion(s) are evenly spaced with respect to the nucleotides of the hybridization oligonucleotide and are based on the number of nucleotides in the hybridization oligonucleotide.