Chaolin H Hu

US Patent:

20020004105, Jan 10, 2002

Filed:

May 16, 2001

Appl. No.:

09/859232

Inventors:

Joseph Kunze - Tewksbury MA, US
Chaolin Hu - Acton MA, US
Frank Kuchinski - Chelmsford MA, US

International Classification:

C23C008/00
H05B007/00
C23C014/30

US Classification:

427/586000, 427/596000

Abstract:

A method of fabricating ceramic parts is disclosed using a laser deposition process to produce highly dense ceramic parts. A metal substrate is preferably used and ceramic powder deposited in layers on the substrate, while varying the power of the laser beam to bond the layers together without cracking the substrate or causing a plasma reaction in the ceramic powder. Dense structures which are about 96% to about 100% ceramic can be produced. A part can be graded using different types and mixtures of ceramic powders to produce the part of a desired composition.

US Patent:

20110005922, Jan 13, 2011

Filed:

Jul 8, 2009

Appl. No.:

12/499453

Inventors:

Chiu-Ying Tai - Chelmsford MA, US
Xing Chen - Lexington MA, US
Chaolin Hu - North Billerica MA, US
Andrew Cowe - Andover MA, US
Ali Shajii - Weston MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

C23C 14/34

US Classification:

20419225, 20429807

Abstract:

A method for creating a protective layer over a surface of an object comprising aluminum and magnesium for use in a semiconductor processing system, which includes oxidizing the surface of the object using a plasma electrolytic oxidation process. The method also includes generating a halogen-comprising plasma by exciting a gas comprising a halogen. The method also includes exposing the oxidized surface to the halogen-comprising plasma or excited gas.

US Patent:

6627847, Sep 30, 2003

Filed:

Dec 13, 2001

Appl. No.:

10/021975

Inventors:

Chaolin Hu - Billerica MA
Parviz Tayebati - Wilmington MA
Masud Azimi - Nashua NH

Assignee:

Nortel Networks Limited - St. Laurent

International Classification:

B23K 2620

US Classification:

21912185, 21912164

Abstract:

According to an aspect of the present invention, a method for laser soldering optical components is described. In that method, a first selected material is disposed on the components to facilitate the deposition of solder. Subsequently, solder is disposed on that material and the component is aligned. A laser beam is properly focused on the solder such that the solder melts and, when the laser beam is turned off, hardens, thereby fixing the component in the desired position.

US Patent:

20190006154, Jan 3, 2019

Filed:

Jun 28, 2017

Appl. No.:

15/635592

Inventors:

Chaolin Hu - North Billerica MA, US

International Classification:

H01J 37/32
C22C 21/10
C22C 21/06
C22F 1/053
C22F 1/047
C22F 1/00
B22D 21/00
B22D 25/02

Abstract:

An apparatus and methods for forming a toroidal plasma chamber includes metallic material, material forming process, heat treatment, anodization and a feature to form an ideal gas flow pattern in the plasma chamber. The gas passing through the plasma chamber that functions as a secondary wiring in a transformer will be dissociated when coupled with the current induced through a magnetic core by a primary wiring that is a semiconductor switching power source.

US Patent:

20170345622, Nov 30, 2017

Filed:

May 27, 2016

Appl. No.:

15/166777

Inventors:

- Andover MA, US
Chaolin Hu - North Billerica MA, US
Olivia Keller - Topsfield MA, US

Assignee:

MKS Instruments, Inc. - Andover MA

International Classification:

H01J 37/32

Abstract:

A plasma applicator includes a plasma discharge tube and a microwave cavity at least partially surrounding a portion of the plasma discharge tube. Microwave energy is coupled to the microwave cavity via a coupling iris. At least two orthogonal dimensions of the microwave cavity are selected such that the microwave energy in the microwave cavity propagates in a transverse electric (TE) mode. Primary electric fields generated from the microwave energy combine with an evanescent electric field generated from the coupling iris, such that a combined electric field in the microwave cavity is substantially uniform along the longitudinal axis of the plasma discharge tube. A plurality of radial microwave chokes is disposed over an exterior of the plasma discharge tube. Positions of the microwave chokes are such that microwave energy propagating in the TE mode and a transverse electric magnetic (TEM) mode is attenuated.