Charles C Pearce

US Patent:

6537135, Mar 25, 2003

Filed:

Dec 13, 1999

Appl. No.:

09/459708

Inventors:

William G. Easter - Orlando FL
Sailesh M. Merchant - Orlando FL
Frank Miceli - Orlando FL
Charles W. Pearce - Emmaus PA

Assignee:

Agere Systems Inc. - Allentown PA

International Classification:

B24B 100

US Classification:

451 36, 451 41, 451283, 451287

Abstract:

The present invention relates to an apparatus and method for polishing substrate surfaces. The method can include the steps of holding a substrate against a polishing surface and depositing slurry on the polishing surface. The method can further include the step of moving the holding device in a substantially curvilinear path relative to the polishing surface, or the step of moving the polishing surface in a substantially curvilinear path relative to the holding device. The apparatus comprises a polishing surface, a holding device for holding a substrate against the polishing surface, and a slurry supply system for depositing slurry on the polishing surface. The apparatus further includes a moving structure for moving the holding device in a substantially curvilinear path along the polishing surface, or a moving structure for moving the polishing surface in a substantially curvilinear path relative to the holding device. The substantially curvilinear path is preferably substantially a figure eight path.