Mar 2011 to Present Support AnalystANSYS Inc Pittsburgh, PA Dec 2010 to Jan 2011 Support AnalystData Networks Pittsburgh, PA Jul 2010 to Aug 2010 Team LeadSouth Side Local Development Company Pittsburgh, PA Oct 2008 to Apr 2009 Business Development AssistantUnited States Air Force Misawa, Japan 2004 to 2005 Server Management SupervisorUnited States Air Force Lakenheath 2001 to 2004 Customer Support Manager
Education:
University of Pittsburgh Pittsburgh, PA Apr 2009 Bachelor of Arts in Urban StudiesCommunity College of the Air Force Tacoma, WA Aug 2001 Associate of Applied Science in Information Systems Technology
Skills:
Microsoft: Office 2003/7, Exchange 2007, Server 2003 Active Directory, Windows XP/7 Desktop
A chemical vapor deposition (CVD) reactor includes a resonating cavity configured to receive microwaves. A microwave transparent window positioned in the resonating cavity separates the resonating cavity into an upper zone and a plasma zone. Microwaves entering the upper zone propagate through the microwave transparent window into the plasma zone. A substrate is disposed proximate a bottom of the plasma zone opposite the microwave transparent window. A ring structure, positioned around a perimeter of the substrate in the plasma zone, includes a lower section that extends from the bottom of the resonating cavity toward the microwave transparent window and an upper section on a side of the lower section opposite the bottom of the resonating cavity. The upper section extends radially toward a central axis of the ring structure. An as-grown diamond film on the substrate is also disclosed.
Method Of Manufacture Of Free Standing Microwave Plasma Cvd Polycrystalline Diamond Films With Major Dimensions On The Order Of One Wavelength Of The Utilized Microwave
- Saxonburg PA, US Charles D. Tanner - Saxonburg PA, US Elgin E. Eissler - Renfrew PA, US
International Classification:
C23C 16/511
Abstract:
A chemical vapor deposition (CVD) reactor includes a resonating cavity configured to receive microwaves. A microwave transparent window positioned in the resonating cavity separates the resonating cavity into an upper zone and a plasma zone. Microwaves entering the upper zone propagate through the microwave transparent window into the plasma zone. A substrate is disposed proximate a bottom of the plasma zone opposite the microwave transparent window. A ring structure, positioned around a perimeter of the substrate in the plasma zone, includes a lower section that extends from the bottom of the resonating cavity toward the microwave transparent window and an upper section on a side of the lower section opposite the bottom of the resonating cavity. The upper section extends radially toward a central axis of the ring structure. A method of microwave plasma CVD growth of a diamond film on the substrate is also disclosed.
Substrate Including A Diamond Layer And A Composite Layer Of Diamond And Silicon Carbide, And, Optionally, Silicon
- Saxonburg PA, US Elgin E. Eissler - Renfrew PA, US Chao Liu - Butler PA, US Charles D. Tanner - Saxonburg PA, US Charles J. Kraisinger - Saxonburg PA, US Michael Aghajanian - Newark DE, US
International Classification:
C23C 16/27 C30B 25/02 C23C 16/44
Abstract:
A multilayer substrate includes a diamond layer CVD grown on a composite layer. The composite layer includes particles of diamond and silicon carbide and, optionally, silicon. A loading level (by volume) of diamond in the composite layer can be ≧5%; ≧20%; ≧40%; or ≧60%. The multilayer substrate can be used as an optical device; a detector for detecting radiation particles or electromagnetic waves; a device for cutting, drilling, machining, milling, lapping, polishing, coating, bonding, or brazing; a braking device; a seal; a heat conductor; an electromagnetic wave conductor; a chemically inert device for use in a corrosive environment, a strong oxidizing environment, or a strong reducing environment, at an elevated temperature, or under a cryogenic condition; or a device for polishing or planarization of other devices, wafers or films.