Cheuk M Lee

US Patent:

7976123, Jul 12, 2011

Filed:

Apr 25, 2006

Appl. No.:

11/912177

Inventors:

Paul A. Parks - Austin TX, US
Robert F. Taff - Brentwood CA, US
Roy M. Patterson - Round Rock TX, US
David Albertalli - Santa Clara CA, US
Cheuk Lee - Castro Valley CA, US
Ben J. Sy - Austin TX, US

Assignee:

Ulvac, Inc. - Chigasaki, Kanagawa

International Classification:

B41J 23/00

US Classification:

347 37, 347 40

Abstract:

According to the present disclosure, a printer apparatus may include a chuck configured to support a substrate thereon, a rail spaced apart from the chuck, a printhead carriage frame coupled to the rail, and a printhead carriage pivotally coupled to the printhead carriage frame.

US Patent:

55808727, Dec 3, 1996

Filed:

Sep 30, 1994

Appl. No.:

8/316319

Inventors:

Daniel T. Chu - Santa Clara CA
Qun Li - Gurnee IL
Curt S. Cooper - Gurnee IL
Anthony K. L. Fung - Gurnee IL
Cheuk M. Lee - Libertyville IL
Jacob J. Plattner - Libertyville IL

Assignee:

Abbott Laboratories - Abbott Park IL

International Classification:

A61K 31495
A61K 31505
C07D40100
C07D23972

US Classification:

514254

Abstract:

Antibacterial compounds having the formula ##STR1## and the pharmaceutically acceptable salts, esters and amides thereof, preferred examples of which include those compounds wherein A is. dbd. CR. sup. 6 --; R. sup. 1 is cycloalkyl of from three to eight carbon atoms or substituted phenyl; R. sup. 2 is selected from the group consisting of ##STR2## R. sup. 3 is halogen; R. sup. 4 is hydrogen, loweralkyl, a pharmaceutically acceptable cation, or a prodrug ester group; R. sup. 5 is hydrogen, loweralkyl, halo(loweralkyl), or --NR. sup. 13 R. sup. 14 ; and R. sup. 6 is halogen, loweralkyl, halo(loweralkyl), hydroxy-substituted loweralkyl, loweralkoxy(loweralkyl), loweralkoxy, or amino(loweralkyl), as well as pharmaceutical compositions containing such compounds and the use of the same in the treatment of bacterial infections.

US Patent:

57261822, Mar 10, 1998

Filed:

Jun 7, 1995

Appl. No.:

8/484632

Inventors:

Daniel T. Chu - Santa Clara CA
Qun Li - Gurnee IL
Curt S. Cooper - Gurnee IL
Anthony K. L. Fung - Gurnee IL
Cheuk M. Lee - Libertyville IL
Jacob J. Plattner - Libertyville IL
Zhenkun Ma - Gurnee IL
Wei-Bo Wang - Park City IL

Assignee:

Abbott Laboratories - Abbott Park IL

International Classification:

C07D49100
C07D49800
A61K 3144

US Classification:

514291

Abstract:

Antibacterial compounds having the formula ##STR1## and the pharmaceutically acceptable salts, esters and amides thereof, selected preferred examples of which include those compounds wherein A is. dbd. CR. sup. 6 --; R. sup. 1 is cycloalkyl of from three to eight carbon atoms or substituted phenyl; R. sup. 2 is selected from the group consisting of ##STR2## R. sup. 3 is halogen; R. sup. 4 is hydrogen, loweralkyl, a pharmaceutically acceptable cation, or a prodrug ester group; R. sup. 5 is hydrogen, loweralkyl, halo(loweralkyl), or --NR. sup. 13 R. sup. 14 ; and R. sup. 6 is halogen, loweralkyl, halo(loweralkyl), hydroxy-substituted loweralkyl, loweralkoxy(loweralkyl), loweralkoxy, or amino(loweralkyl), as well as pharmaceutical compositions containing such compounds and the use of the same in the treatment of bacterial infections.

US Patent:

55998160, Feb 4, 1997

Filed:

Jun 7, 1995

Appl. No.:

8/482249

Inventors:

Daniel T. Chu - Santa Clara CA
Qun Li - Gurnee IL
Curt S. Cooper - Gurnee IL
Anthony K. L. Fung - Gurnee IL
Cheuk M. Lee - Libertyville IL
Jacob J. Plattner - Libertyville IL
Zhenkun Ma - Gurnee IL
Wei-Bo Wang - Park City IL

Assignee:

Abbott Laboratories - Abbott Park IL

International Classification:

A61K 31495
A61K 31535
A61K 31505
A61K 3144
C07D49802
C07D48700
C07D45502
C07D47102

US Classification:

514254

Abstract:

Antibacterial compounds having the formula ##STR1## and the pharmaceutically acceptable salts, esters and amides thereof, selected preferred examples of which include those compounds wherein A is. dbd. CR. sup. 6 --; R. sup. 1 is cycloalkyl of from three to eight carbon atoms or substituted phenyl; R. sup. 2 is selected from the group consisting of ##STR2## R. sup. 3 is halogen; R. sup. 4 is hydrogen, loweralkyl, a pharmaceutically acceptable cation, or a prodrug ester group; R. sup. 5 is hydrogen, loweralkyl, halo(loweralkyl), or --NR. sup. 13 R. sup. 14 ; and R. sup. 6 is halogen, loweralkyl, halo(loweralkyl), hydroxy-substituted loweralkyl, loweralkoxy(loweralkyl), loweralkoxy, or amino(loweralkyl), as well as pharmaceutical compositions containing such compounds and the use of the same in the treatment of bacterial infections.

US Patent:

20210149308, May 20, 2021

Filed:

Jan 25, 2021

Appl. No.:

17/157634

Inventors:

- Santa Clara CA, US
Preston FUNG - Daly City CA, US
Sean SCREWS - San Jose CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US

International Classification:

G03F 7/20

Abstract:

The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.

US Patent:

20210011390, Jan 14, 2021

Filed:

Sep 28, 2020

Appl. No.:

17/035105

Inventors:

- Santa Clara CA, US
David Michael CORRIVEAU - Sacramento CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US
WeiMin TAO - Palo Alto CA, US
Antoine P. MANENS - Saratoga CA, US

International Classification:

G03F 7/20

Abstract:

Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.

US Patent:

20200272063, Aug 27, 2020

Filed:

Feb 25, 2019

Appl. No.:

16/284516

Inventors:

- Santa Clara CA, US
David Michael CORRIVEAU - Sacramento CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US
WeiMin TAO - Palo Alto CA, US
Antoine P. MANENS - Saratoga CA, US

International Classification:

G03F 7/20

Abstract:

Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.

US Patent:

20200103760, Apr 2, 2020

Filed:

Sep 28, 2018

Appl. No.:

16/146054

Inventors:

- Santa Clara CA, US
Preston FUNG - Santa Clara CA, US
Sean SCREWS - Santa Clara CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US

International Classification:

G03F 7/20

Abstract:

The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.