Cheuk H Lee

US Patent:

55808727, Dec 3, 1996

Filed:

Sep 30, 1994

Appl. No.:

8/316319

Inventors:

Daniel T. Chu - Santa Clara CA
Qun Li - Gurnee IL
Curt S. Cooper - Gurnee IL
Anthony K. L. Fung - Gurnee IL
Cheuk M. Lee - Libertyville IL
Jacob J. Plattner - Libertyville IL

Assignee:

Abbott Laboratories - Abbott Park IL

International Classification:

A61K 31495
A61K 31505
C07D40100
C07D23972

US Classification:

514254

Abstract:

Antibacterial compounds having the formula ##STR1## and the pharmaceutically acceptable salts, esters and amides thereof, preferred examples of which include those compounds wherein A is. dbd. CR. sup. 6 --; R. sup. 1 is cycloalkyl of from three to eight carbon atoms or substituted phenyl; R. sup. 2 is selected from the group consisting of ##STR2## R. sup. 3 is halogen; R. sup. 4 is hydrogen, loweralkyl, a pharmaceutically acceptable cation, or a prodrug ester group; R. sup. 5 is hydrogen, loweralkyl, halo(loweralkyl), or --NR. sup. 13 R. sup. 14 ; and R. sup. 6 is halogen, loweralkyl, halo(loweralkyl), hydroxy-substituted loweralkyl, loweralkoxy(loweralkyl), loweralkoxy, or amino(loweralkyl), as well as pharmaceutical compositions containing such compounds and the use of the same in the treatment of bacterial infections.

US Patent:

57261822, Mar 10, 1998

Filed:

Jun 7, 1995

Appl. No.:

8/484632

Inventors:

Daniel T. Chu - Santa Clara CA
Qun Li - Gurnee IL
Curt S. Cooper - Gurnee IL
Anthony K. L. Fung - Gurnee IL
Cheuk M. Lee - Libertyville IL
Jacob J. Plattner - Libertyville IL
Zhenkun Ma - Gurnee IL
Wei-Bo Wang - Park City IL

Assignee:

Abbott Laboratories - Abbott Park IL

International Classification:

C07D49100
C07D49800
A61K 3144

US Classification:

514291

Abstract:

Antibacterial compounds having the formula ##STR1## and the pharmaceutically acceptable salts, esters and amides thereof, selected preferred examples of which include those compounds wherein A is. dbd. CR. sup. 6 --; R. sup. 1 is cycloalkyl of from three to eight carbon atoms or substituted phenyl; R. sup. 2 is selected from the group consisting of ##STR2## R. sup. 3 is halogen; R. sup. 4 is hydrogen, loweralkyl, a pharmaceutically acceptable cation, or a prodrug ester group; R. sup. 5 is hydrogen, loweralkyl, halo(loweralkyl), or --NR. sup. 13 R. sup. 14 ; and R. sup. 6 is halogen, loweralkyl, halo(loweralkyl), hydroxy-substituted loweralkyl, loweralkoxy(loweralkyl), loweralkoxy, or amino(loweralkyl), as well as pharmaceutical compositions containing such compounds and the use of the same in the treatment of bacterial infections.

US Patent:

55998160, Feb 4, 1997

Filed:

Jun 7, 1995

Appl. No.:

8/482249

Inventors:

Daniel T. Chu - Santa Clara CA
Qun Li - Gurnee IL
Curt S. Cooper - Gurnee IL
Anthony K. L. Fung - Gurnee IL
Cheuk M. Lee - Libertyville IL
Jacob J. Plattner - Libertyville IL
Zhenkun Ma - Gurnee IL
Wei-Bo Wang - Park City IL

Assignee:

Abbott Laboratories - Abbott Park IL

International Classification:

A61K 31495
A61K 31535
A61K 31505
A61K 3144
C07D49802
C07D48700
C07D45502
C07D47102

US Classification:

514254

Abstract:

Antibacterial compounds having the formula ##STR1## and the pharmaceutically acceptable salts, esters and amides thereof, selected preferred examples of which include those compounds wherein A is. dbd. CR. sup. 6 --; R. sup. 1 is cycloalkyl of from three to eight carbon atoms or substituted phenyl; R. sup. 2 is selected from the group consisting of ##STR2## R. sup. 3 is halogen; R. sup. 4 is hydrogen, loweralkyl, a pharmaceutically acceptable cation, or a prodrug ester group; R. sup. 5 is hydrogen, loweralkyl, halo(loweralkyl), or --NR. sup. 13 R. sup. 14 ; and R. sup. 6 is halogen, loweralkyl, halo(loweralkyl), hydroxy-substituted loweralkyl, loweralkoxy(loweralkyl), loweralkoxy, or amino(loweralkyl), as well as pharmaceutical compositions containing such compounds and the use of the same in the treatment of bacterial infections.

US Patent:

20210149308, May 20, 2021

Filed:

Jan 25, 2021

Appl. No.:

17/157634

Inventors:

- Santa Clara CA, US
Preston FUNG - Daly City CA, US
Sean SCREWS - San Jose CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US

International Classification:

G03F 7/20

Abstract:

The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.

US Patent:

20200103760, Apr 2, 2020

Filed:

Sep 28, 2018

Appl. No.:

16/146054

Inventors:

- Santa Clara CA, US
Preston FUNG - Santa Clara CA, US
Sean SCREWS - Santa Clara CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US

International Classification:

G03F 7/20

Abstract:

The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.

US Patent:

20200011652, Jan 9, 2020

Filed:

Jul 3, 2018

Appl. No.:

16/026982

Inventors:

- Santa Clara CA, US
Cheuk Ming LEE - Castro Valley CA, US
Jae Myung YOO - San Jose CA, US
Glen Alan GOMES - San Jose CA, US
David Michael CORRIVEAU - Sacramento CA, US
Thang Duc NGUYEN - Milpitas CA, US

International Classification:

G01B 9/02
G03F 7/20

Abstract:

Processing systems and methods used in the manufacturing of flat panel displays (FPDs) are provided herein. In one embodiment, a processing system features a motion stage movably disposed on a base surface, one or more X-position interferometers, and a plurality of Y-position interferometers. The X-position interferometers include an X-position mirror fixedly coupled to the motion stage and an X-axis stationary module fixedly coupled a non-moving surface of processing system. Each of the plurality of Y-position interferometers include one of a first or second Y-position mirror fixedly coupled to the motion stage in orthogonal relationship to the one or more X-position mirrors and one of a first or a second Y-axis stationary module fixedly coupled to a non-moving surface of the processing system. Here, each of the Y-axis stationary modules is positioned to direct coherent radiation towards a respective Y-position mirror when the Y-position interferometer thereof is in an active arrangement.

Address:

40780 Msn Blvd, Fremont, CA 94539

Phone:

4085013897

VIN:

JH4CW2H69CC004534

Make:

ACURA

Model:

TSX SPORT WAGON

Year:

2012