Cheuk H Lee

age ~50

from Fremont, CA

Also known as:
  • Cheuk Hang Lee
  • Cheuk Hang William Lee
  • Cheuk Han Lee
  • Cheuk Te Lee
  • Cheuk W Lee
  • Cheuk Hang Te Lee
  • Cheuk Hang Wlee
  • William Lee
  • Cheukhang Lee
  • Willia Lee

Cheuk Lee Phones & Addresses

  • Fremont, CA
  • San Ramon, CA
  • 419 Terra Mesa Way, Milpitas, CA 95035 • 4089419608
  • San Jose, CA
  • Sacramento, CA
  • Trenton, NJ
  • Santa Clara, CA
  • Lovettsville, VA

Work

  • Company:
    Phoenix satellite television holdings limited - Phoenix, AZ
    Jul 2013
  • Position:
    Intern

Education

  • School / High School:
    University of California- Davis, CA
    Jun 2014
  • Specialities:
    Bachelor of Arts in Communication

Us Patents

  • Quinolizinone Type Compounds

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  • US Patent:
    55808727, Dec 3, 1996
  • Filed:
    Sep 30, 1994
  • Appl. No.:
    8/316319
  • Inventors:
    Daniel T. Chu - Santa Clara CA
    Qun Li - Gurnee IL
    Curt S. Cooper - Gurnee IL
    Anthony K. L. Fung - Gurnee IL
    Cheuk M. Lee - Libertyville IL
    Jacob J. Plattner - Libertyville IL
  • Assignee:
    Abbott Laboratories - Abbott Park IL
  • International Classification:
    A61K 31495
    A61K 31505
    C07D40100
    C07D23972
  • US Classification:
    514254
  • Abstract:
    Antibacterial compounds having the formula ##STR1## and the pharmaceutically acceptable salts, esters and amides thereof, preferred examples of which include those compounds wherein A is. dbd. CR. sup. 6 --; R. sup. 1 is cycloalkyl of from three to eight carbon atoms or substituted phenyl; R. sup. 2 is selected from the group consisting of ##STR2## R. sup. 3 is halogen; R. sup. 4 is hydrogen, loweralkyl, a pharmaceutically acceptable cation, or a prodrug ester group; R. sup. 5 is hydrogen, loweralkyl, halo(loweralkyl), or --NR. sup. 13 R. sup. 14 ; and R. sup. 6 is halogen, loweralkyl, halo(loweralkyl), hydroxy-substituted loweralkyl, loweralkoxy(loweralkyl), loweralkoxy, or amino(loweralkyl), as well as pharmaceutical compositions containing such compounds and the use of the same in the treatment of bacterial infections.
  • Quinolizinone Type Compounds

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  • US Patent:
    57261822, Mar 10, 1998
  • Filed:
    Jun 7, 1995
  • Appl. No.:
    8/484632
  • Inventors:
    Daniel T. Chu - Santa Clara CA
    Qun Li - Gurnee IL
    Curt S. Cooper - Gurnee IL
    Anthony K. L. Fung - Gurnee IL
    Cheuk M. Lee - Libertyville IL
    Jacob J. Plattner - Libertyville IL
    Zhenkun Ma - Gurnee IL
    Wei-Bo Wang - Park City IL
  • Assignee:
    Abbott Laboratories - Abbott Park IL
  • International Classification:
    C07D49100
    C07D49800
    A61K 3144
  • US Classification:
    514291
  • Abstract:
    Antibacterial compounds having the formula ##STR1## and the pharmaceutically acceptable salts, esters and amides thereof, selected preferred examples of which include those compounds wherein A is. dbd. CR. sup. 6 --; R. sup. 1 is cycloalkyl of from three to eight carbon atoms or substituted phenyl; R. sup. 2 is selected from the group consisting of ##STR2## R. sup. 3 is halogen; R. sup. 4 is hydrogen, loweralkyl, a pharmaceutically acceptable cation, or a prodrug ester group; R. sup. 5 is hydrogen, loweralkyl, halo(loweralkyl), or --NR. sup. 13 R. sup. 14 ; and R. sup. 6 is halogen, loweralkyl, halo(loweralkyl), hydroxy-substituted loweralkyl, loweralkoxy(loweralkyl), loweralkoxy, or amino(loweralkyl), as well as pharmaceutical compositions containing such compounds and the use of the same in the treatment of bacterial infections.
  • Quinolizinone Type Compounds

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  • US Patent:
    55998160, Feb 4, 1997
  • Filed:
    Jun 7, 1995
  • Appl. No.:
    8/482249
  • Inventors:
    Daniel T. Chu - Santa Clara CA
    Qun Li - Gurnee IL
    Curt S. Cooper - Gurnee IL
    Anthony K. L. Fung - Gurnee IL
    Cheuk M. Lee - Libertyville IL
    Jacob J. Plattner - Libertyville IL
    Zhenkun Ma - Gurnee IL
    Wei-Bo Wang - Park City IL
  • Assignee:
    Abbott Laboratories - Abbott Park IL
  • International Classification:
    A61K 31495
    A61K 31535
    A61K 31505
    A61K 3144
    C07D49802
    C07D48700
    C07D45502
    C07D47102
  • US Classification:
    514254
  • Abstract:
    Antibacterial compounds having the formula ##STR1## and the pharmaceutically acceptable salts, esters and amides thereof, selected preferred examples of which include those compounds wherein A is. dbd. CR. sup. 6 --; R. sup. 1 is cycloalkyl of from three to eight carbon atoms or substituted phenyl; R. sup. 2 is selected from the group consisting of ##STR2## R. sup. 3 is halogen; R. sup. 4 is hydrogen, loweralkyl, a pharmaceutically acceptable cation, or a prodrug ester group; R. sup. 5 is hydrogen, loweralkyl, halo(loweralkyl), or --NR. sup. 13 R. sup. 14 ; and R. sup. 6 is halogen, loweralkyl, halo(loweralkyl), hydroxy-substituted loweralkyl, loweralkoxy(loweralkyl), loweralkoxy, or amino(loweralkyl), as well as pharmaceutical compositions containing such compounds and the use of the same in the treatment of bacterial infections.
  • Method For Fast Loading Substrates In A Flat Panel Tool

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  • US Patent:
    20210149308, May 20, 2021
  • Filed:
    Jan 25, 2021
  • Appl. No.:
    17/157634
  • Inventors:
    - Santa Clara CA, US
    Preston FUNG - Daly City CA, US
    Sean SCREWS - San Jose CA, US
    Cheuk Ming LEE - Castro Valley CA, US
    Jae Myung YOO - San Jose CA, US
  • International Classification:
    G03F 7/20
  • Abstract:
    The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.
  • Dynamic Cooling Control For Thermal Stabilization For Lithography System

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  • US Patent:
    20210011390, Jan 14, 2021
  • Filed:
    Sep 28, 2020
  • Appl. No.:
    17/035105
  • Inventors:
    - Santa Clara CA, US
    David Michael CORRIVEAU - Sacramento CA, US
    Cheuk Ming LEE - Castro Valley CA, US
    Jae Myung YOO - San Jose CA, US
    WeiMin TAO - Palo Alto CA, US
    Antoine P. MANENS - Saratoga CA, US
  • International Classification:
    G03F 7/20
  • Abstract:
    Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.
  • Dynamic Cooling Control For Thermal Stabilization For Lithography System

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  • US Patent:
    20200272063, Aug 27, 2020
  • Filed:
    Feb 25, 2019
  • Appl. No.:
    16/284516
  • Inventors:
    - Santa Clara CA, US
    David Michael CORRIVEAU - Sacramento CA, US
    Cheuk Ming LEE - Castro Valley CA, US
    Jae Myung YOO - San Jose CA, US
    WeiMin TAO - Palo Alto CA, US
    Antoine P. MANENS - Saratoga CA, US
  • International Classification:
    G03F 7/20
  • Abstract:
    Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.
  • Method For Fast Loading Substrates In A Flat Panel Tool

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  • US Patent:
    20200103760, Apr 2, 2020
  • Filed:
    Sep 28, 2018
  • Appl. No.:
    16/146054
  • Inventors:
    - Santa Clara CA, US
    Preston FUNG - Santa Clara CA, US
    Sean SCREWS - Santa Clara CA, US
    Cheuk Ming LEE - Castro Valley CA, US
    Jae Myung YOO - San Jose CA, US
  • International Classification:
    G03F 7/20
  • Abstract:
    The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.
  • Interferometry System And Methods For Substrate Processing

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  • US Patent:
    20200011652, Jan 9, 2020
  • Filed:
    Jul 3, 2018
  • Appl. No.:
    16/026982
  • Inventors:
    - Santa Clara CA, US
    Cheuk Ming LEE - Castro Valley CA, US
    Jae Myung YOO - San Jose CA, US
    Glen Alan GOMES - San Jose CA, US
    David Michael CORRIVEAU - Sacramento CA, US
    Thang Duc NGUYEN - Milpitas CA, US
  • International Classification:
    G01B 9/02
    G03F 7/20
  • Abstract:
    Processing systems and methods used in the manufacturing of flat panel displays (FPDs) are provided herein. In one embodiment, a processing system features a motion stage movably disposed on a base surface, one or more X-position interferometers, and a plurality of Y-position interferometers. The X-position interferometers include an X-position mirror fixedly coupled to the motion stage and an X-axis stationary module fixedly coupled a non-moving surface of processing system. Each of the plurality of Y-position interferometers include one of a first or second Y-position mirror fixedly coupled to the motion stage in orthogonal relationship to the one or more X-position mirrors and one of a first or a second Y-axis stationary module fixedly coupled to a non-moving surface of the processing system. Here, each of the Y-axis stationary modules is positioned to direct coherent radiation towards a respective Y-position mirror when the Y-position interferometer thereof is in an active arrangement.
Name / Title
Company / Classification
Phones & Addresses
Cheuk Ming Lee
Bellina Properties, LLC
Real Property Ownership Rental
4061 E Castro Vly Blvd #205, Castro Valley, CA 94552
Cheuk Lee
President
INFOBASE CONSULTING, INC
Business Consulting Services
7044 Corinth Ct, Dublin, CA 94568

Resumes

Cheuk Lee Photo 1

Cheuk Lam Tanki Lee

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Cheuk Lee Photo 2

Cheuk Lee

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Cheuk Lee Photo 3

Cheuk Lee Davis, CA

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Work:
Phoenix Satellite Television Holdings Limited
Phoenix, AZ
Jul 2013 to Aug 2013
Intern
Parfums Christian Dior Company Limited
Hong Kong, Hong Kong Island
Jun 2012 to Aug 2012
Administrative Assistant Intern
AXA General Insurance Hong Kong Limited
Hong Kong, Hong Kong Island
Jul 2011 to Sep 2011
Financial Consultant Intern
Ocean Park
Hong Kong, Hong Kong Island
Jun 2011 to Jul 2011
Sales Associate Intern
Education:
University of California
Davis, CA
Jun 2014
Bachelor of Arts in Communication
Dean College
Franklin, MA
May 2012
Associate of Arts in Liberal Studies

Vehicle Records

  • Cheuk Lee

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  • Address:
    40780 Msn Blvd, Fremont, CA 94539
  • Phone:
    4085013897
  • VIN:
    JH4CW2H69CC004534
  • Make:
    ACURA
  • Model:
    TSX SPORT WAGON
  • Year:
    2012

Googleplus

Cheuk Lee Photo 4

Cheuk Lee

Cheuk Lee Photo 5

Cheuk Lee

Cheuk Lee Photo 6

Cheuk Lee

Youtube

Defending champion Viktor Axelsen goes the di...

Defending champion Viktor Axelsen goes the distance against Lee Cheuk ...

  • Duration:
    5m 1s

YONEX All England Open 2023 | Viktor Axelsen ...

YONEX All England Open Badminton Championships 2023 | Super 1000 Men's...

  • Duration:
    1h 9m 20s

WORLD'S FASTEST SMASH?!? ~ Lee Cheuk Yiu vs ...

Subscribe!

  • Duration:
    4m 49s

BWF World Championships 2022 | Chou Tien Chen...

TotalEnergies BWF World Championships 2022 Men's Singles | Round of 16...

  • Duration:
    1h 22m 41s

Badminton Unlimited | Profile: Lee Cheuk Yiu ...

Hong Kong China's Lee Cheuk Yiu opens up about the person behind the f...

  • Duration:
    4m 51s

Chia Hao LEE VS LEE Cheuk Yiu Badminton Germa...

Chia Hao LEE VS LEE Cheuk Yiu Badminton German Open 2023 | Quarter fin...

  • Duration:
    13m 46s

Facebook

Cheuk Lee Photo 7

Cheuk Ling Lee

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Cheuk Lee Photo 8

Hung Cheuk Lee

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Cheuk Lee Photo 9

Cheuk Lun Lee

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Cheuk Lee Photo 10

Cheuk Lee

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Cheuk Lee Photo 11

Cheuk Kuen Lee

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Cheuk Lee Photo 12

Cheuk Lee

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Cheuk Lee Photo 13

Cheuk Lee

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Cheuk Lee Photo 14

Cheuk Lam Lee

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Myspace

Cheuk Lee Photo 15

Cheuk Lee

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Locality:
Bellflower, California
Gender:
Male
Birthday:
1952

Classmates

Cheuk Lee Photo 16

Cheuk Lee

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Schools:
Walters Junior High School Fremont CA 1993-1997
Community:
Lorraine Benn, Bruce Caires, Scott Smith, Shawn Ellis, Lisa Rubio, Janet Mccracken
Cheuk Lee Photo 17

Cheuk Wing Lee

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Schools:
Dgs High School Hong Kong IL 1995-1999
Community:
Mandy Lok, Olivia Saw, Lucci Liyeung, I Tng, Jennifer Tse
Cheuk Lee Photo 18

Walters Junior High Schoo...

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Graduates:
Katie Holderfield (1998-2000),
Cheuk Lee (1993-1997),
Sarah Salcedo (1994-1995),
Tiffany Dressler (1994-1998),
Denise Dickey (1980-1982)
Cheuk Lee Photo 19

Kennedy High School, Silv...

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Graduates:
Cheuk Pin Lee (1986-1990),
Seo Kim (1994-1998),
Celastand Torrence (1976-1980),
Conni Lee (1963-1967)
Cheuk Lee Photo 20

St. Lawrence College, Que...

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Graduates:
Cheuk Sang Lee (1992-1995),
Jonathan de Chantal (2002-2002),
Maude Ouellet (2000-2002),
Audrey Boissonneault (1999-2002),
Catherine Fiset (1997-2001)
Cheuk Lee Photo 21

Dgs High School, Hong kong

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Graduates:
Caroline Chan (1988-1995),
Josephine Millar (1973-1977),
Barbara Wong (1990-1994),
Cheuk Wing Lee (1995-1999),
Marie Taguchi (1966-1970)

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