Christina Ann Lambert

US Patent:

20060222779, Oct 5, 2006

Filed:

Sep 7, 2004

Appl. No.:

10/567144

Inventors:

Aaron Gabelnick - Naperville IL, US
Christina Lambert - Midland MI, US

International Classification:

H05H 1/24

US Classification:

427569000

Abstract:

A process for creating plasma polymerized deposition on a substrate using a glow discharge is described. The glow discharge is created between an electrode and a counterelectrode. A mixture of a balance gas and a tetraalkylorthosilicate is flowed through the glow discharge onto a substrate to deposit a coating onto the substrate as an optically clear coating or to create surface modification. The process, which is preferably carried out at or near atmospheric pressure, can be designed to create an optically clear powder-free or virtually powder free coating.

US Patent:

20070264508, Nov 15, 2007

Filed:

Oct 6, 2005

Appl. No.:

11/663799

Inventors:

Aaron Gabelnick - Ithaca NY, US
Christina Lambert - Midland MI, US
John Warakomski - Midland MI, US
Ludo Aerts - Eksaarde, BE

International Classification:

B32B 9/04
C08J 7/00
C23C 16/50

US Classification:

428447000, 427489000

Abstract:

A process for preparing a multiple layer coating on the surface of an organic polymeric substrate by means of atmospheric pressure glow discharge deposition, the steps of the process comprising depositing a layer (first layer) of a plasma polymerized, optically clear, organosilicon compound and thereafter in a second step depositing a substantially uniform layer (second layer) of a polymeric siloxane or silicon oxide compound onto the exposed surface of said first layer, wherein the multiple layer coating has a thickness of at least 2.0 μm and an abrasion resistance demonstrating a change of 20 delta haze units or less after 500 Tabor cycles, measured according to ASTM D1044, CS10F wheels, 500 g weight.

US Patent:

20080095954, Apr 24, 2008

Filed:

Sep 2, 2005

Appl. No.:

11/661055

Inventors:

Aaron Gabelnick - Ithaca NY, US
Christina Lambert - Midland MI, US

International Classification:

C23C 16/513

US Classification:

427579000

Abstract:

The present invention provides a process for preparing a multiple layer coating on the surface of an organic polymeric substrate by means of atmospheric pressure plasma deposition, the steps of the process comprising depositing a layer (first layer) of a plasma polymerized, optically clear, highly adherent, organosilicon compound onto the surface of the organic polymeric substrate by atmospheric pressure plasma deposition of a gaseous mixture comprising an organosilicon reagent compound and optionally an oxidant in a first step and thereafter in a second step depositing a substantially uniform layer (second layer) of a silicon oxide compound onto the exposed surface of said first layer by atmospheric pressure plasma deposition of a gaseous mixture comprising an oxidant and an organosilicon reagent compound, wherein the molar ratio of oxidant to organosilicon reagent compound in the gaseous mixture is greater in the second step than in the first step.

US Patent:

20080107820, May 8, 2008

Filed:

Oct 19, 2005

Appl. No.:

11/664455

Inventors:

Aaron M. Gabelnick - Ithaca NY, US
Christina A. Lambert - Midland MI, US

International Classification:

C23C 16/513

US Classification:

427489

Abstract:

A process for depositing a layer of a plasma polymerized organosiloxane, siloxane or silicon oxide onto the surface of an organic polymeric substrate by atmospheric pressure glow discharge deposition from a gaseous mixture comprising a silicon containing compound and an oxidant, characterized in that the oxidant comprises NO.