Christopher C Chang

US Patent:

6533910, Mar 18, 2003

Filed:

Dec 29, 2000

Appl. No.:

09/750251

Inventors:

Robert J. ODonnell - Alameda CA
John E. Daugherty - Alameda CA
Christopher C. Chang - Sunnyvale CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

C23C 1434

US Classification:

20429831, 156345, 20429801

Abstract:

A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a carbonitride containing surface and process for manufacture thereof.

US Patent:

6537429, Mar 25, 2003

Filed:

Dec 29, 2000

Appl. No.:

09/749925

Inventors:

Robert J. ODonnell - Alameda CA
John E. Daugherty - Alameda CA
Christopher C. Chang - Sunnyvale CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

C23C 1400

US Classification:

204193, 2041921, 20419211, 20419215, 20419225, 20419637, 20429801, 427577, 428332, 428408, 428698, 428704

Abstract:

A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a diamond containing surface and process for manufacture thereof.

US Patent:

6613442, Sep 2, 2003

Filed:

Dec 29, 2000

Appl. No.:

09/749924

Inventors:

Robert J. ODonnell - Alameda CA
John E. Daugherty - Alameda CA
Christopher C. Chang - Sunnyvale CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

B23B 1504

US Classification:

428469, 428704, 428697

Abstract:

A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a boron nitride/yttria composite containing surface and process for manufacture thereof.

US Patent:

6620520, Sep 16, 2003

Filed:

Dec 29, 2000

Appl. No.:

09/750056

Inventors:

Robert J. ODonnell - Alameda CA
Christopher C. Chang - Sunnyvale CA
John E. Daugherty - Alameda CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

B32B 1504

US Classification:

428469, 438 9, 118715

Abstract:

A corrosion resistant component of semiconductor processing equipment such as a plasma chamber comprises zirconia toughened ceramic material as an outermost surface of the component. The component can be made entirely of the ceramic material or the ceramic material can be provided as a coating on a substrate such as aluminum or aluminum alloy, stainless steel, or refractory metal. The zirconia toughened ceramic can be tetragonal zirconia polycrystalline (TZP) material, partially-stabilized zirconia (PSZ), or a zirconia dispersion toughened ceramic (ZTC) such as zirconia-toughened alumina (tetragonal zirconia particles dispersed in Al O ). In the case of a ceramic zirconia toughened coating, one or more intermediate layers may be provided between the component and the ceramic coating. To promote adhesion of the ceramic coating, the component surface or the intermediate layer surface may be subjected to a surface roughening treatment prior to depositing the ceramic coating.

US Patent:

6773751, Aug 10, 2004

Filed:

Mar 21, 2003

Appl. No.:

10/393010

Inventors:

Robert J. ODonnell - Alameda CA
John E. Daugherty - Alameda CA
Christopher C. Chang - Sunnyvale CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

C23C 1634

US Classification:

42725538, 42725534, 4272557, 427576, 427455, 2041921

Abstract:

A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a boron nitride/yttria composite containing surface and process for manufacture thereof.

US Patent:

6790242, Sep 14, 2004

Filed:

Dec 29, 2000

Appl. No.:

09/749923

Inventors:

Robert J. ODonnell - Alamada CA
Christopher C. Chang - Sunnyvale CA
John E. Daugherty - Alamada CA

Assignee:

LAM Research Corporation - Fremont CA

International Classification:

H01L 2100

US Classification:

29 2501, 118 501, 423DIG 39, 423DIG 40, 423445 B, 427402

Abstract:

A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a fullerene containing surface and process for manufacturing thereof.

US Patent:

6805952, Oct 19, 2004

Filed:

Dec 29, 2000

Appl. No.:

09/749917

Inventors:

Christopher C. Chang - Sunnyvale CA
Robert J. Steger - Los Altos CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

B32B 300

US Classification:

428334, 428335, 428457, 428469, 4284735, 438 9, 216 67, 118723 R

Abstract:

Components for use in plasma processing chambers having plasma exposed surfaces with surface roughness characteristics that promote polymer adhesion. The roughened surfaces are formed by plasma spraying a coating material such as a ceramic or high temperature polymer onto the surface of the component. The plasma sprayed components of the present invention can be used for plasma reactor components having surfaces exposed to the plasma during processing. Suitable components include chamber walls, chamber liners, baffle rings, gas distribution plates, plasma confinement rings, and liner supports. By improving polymer adhesion, the plasma sprayed component surfaces can reduce the levels of particle contamination in the process chamber thereby improving yields and reducing down-time required for cleaning and/or replacing chamber components.

US Patent:

7128804, Oct 31, 2006

Filed:

Dec 29, 2000

Appl. No.:

09/749921

Inventors:

Robert J. O'Donnell - Alameda CA, US
Christopher C. Chang - Sunnyvale CA, US
John E. Daugherty - Alameda CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

H01L 21/306

US Classification:

15634533, 15634537, 15634547, 15634551

Abstract:

A corrosion resistant component of a plasma chamber includes a liquid crystalline polymer. In a preferred embodiment, the liquid crystalline polymer (LCP) is provided on an aluminum component having an anodized or non-anodized surface. The liquid crystalline polymer can also be provided on an alumina component. The liquid crystalline polymer can be deposited by a method such as plasma spraying. The liquid crystalline polymer may also be provided as a preformed sheet or other shape adapted to cover the exposed surfaces of the reaction chamber. Additionally, the reactor components may be made entirely from liquid crystalline polymer by machining the component from a solid block of liquid crystalline polymer or molding the component from the polymer. The liquid crystalline polymer may contain reinforcing fillers such as glass or mineral fillers.