- Boise ID, US Christopher Locke - Boise ID, US Kyle B. Campbell - Boise ID, US
International Classification:
H01L 27/108 H01L 29/423 H01L 29/06 H01L 29/786
Abstract:
An apparatus includes fin structures comprising individual levels of a conductive material having elongated portions extending in a first horizontal direction, first conductive lines extending in a second horizontal direction transverse to the first horizontal direction, and second conductive lines extending in a vertical direction transverse to each of the first horizontal direction and the second horizontal direction. At least portions of the first conductive lines are aligned vertically. The apparatus also includes horizontal capacitor structures comprising the conductive material of the fin structures and access devices proximate intersections of the first conductive lines and the second conductive lines. The access devices comprise the conductive material of the fin structures. Memory devices, electronic systems, and methods of forming the apparatus are also disclosed.
Christopher Locke (born November 12, 1947) is a widely read blogger, author and the editor of the Entropy Gradient Reversals e-newsletter since 1995. Starting ...
University of South Florida Nov 2011 - Nov 2012
Research Associate
Sponsored Researcher Microtesting Solutions Sep 2011 - Oct 2012
Sponsored Researcher
United States Army Reserve Jan 1990 - Jan 1996
Physical Therapy Technician
Education:
University of South Florida
Skills:
Pspice Simulations Microsoft Office Thin Films Semiconductors Circuit Design Characterization Matlab C Electronics Agilent Ads Vhdl Afm Simulink C++ Ansys Comsol Solidworks Mems Cvd Powder X Ray Diffraction Photolithography Scanning Electron Microscopy Microfabrication Profilometer Spectroscopy Etching Raman
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