Christopher A Michaluk

US Patent:

6348113, Feb 19, 2002

Filed:

Nov 25, 1998

Appl. No.:

09/199569

Inventors:

Christopher A. Michaluk - Gilbertsville PA
Louis E. Huber - Allentown PA
Mark N. Kawchak - Phoenixville PA
James D. Maguire - Norristown PA

Assignee:

Cabot Corporation - Boston MA

International Classification:

C22F 118

US Classification:

148668, 148423, 148DIG 14, 148DIG 158

Abstract:

High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99. 995% and more preferably at least 99. 999%. In addition, tantalum metal and alloys thereof are described, which either have a grain size of about 50 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about -4. 0, or any combination of these properties. Also described are articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity metal which includes the step of reacting a salt-containing tantalum with at least one compound capable of reducing this salt to tantalum powder and a second salt in a reaction container. The reaction container or liner in the reaction container and the agitator or liner on the agitator are made from a metal material having the same or higher vapor pressure of melted tantalum.

US Patent:

6462339, Oct 8, 2002

Filed:

Sep 20, 2000

Appl. No.:

09/665845

Inventors:

Christopher A. Michaluk - Gilbertsville PA
David P. Field - Pullman WA

Assignee:

Cabot Corporation - Boston MA

International Classification:

G01N 23203

US Classification:

250310, 250307, 250311

Abstract:

A method for quantifying the texture homogeneity of a polycrystalline material is described. The method involves selecting a reference pole orientation; scanning in increments a cross-section of the polycrystalline material having a thickness with scanning orientation imaging microscopy or other measuring technique to obtain actual pole orientations of a multiplicity of grains throughout the cross-section of the polycrystalline material. The orientation differences between the reference pole orientation and actual pole orientations of a multiplicity of grains is then determined. A value of misorientation from the reference pole orientation at each grain measured throughout the thickness is then assigned. The average misorientation of each measured increment throughout the thickness is then determined. A texture gradient and/or texture banding can then be obtained by determining the first and/or second derivative, respectively, of the average misorientation of each measured increment through the thickness of the sample used for evaluation.

US Patent:

6540851, Apr 1, 2003

Filed:

Aug 3, 2001

Appl. No.:

09/922049

Inventors:

Christopher A. Michaluk - Gilbertsville PA

Assignee:

Cabot Corporation - Boston MA

International Classification:

C22F 300

US Classification:

148538, 148565, 148668, 148422

Abstract:

An alloy comprising tantalum and silicon is described. The tantalum is the predominant metal present. The alloy also has a uniformity of tensile strength when formed into a wire, such that the maximum population standard deviation of tensile strength for the wire is about 3 KSI for an unannealed wire at finish diameter and about 2 KSI for an annealed wire at finish diameter. Also described is a process of making a TaâSi alloy which includes reducing a silicon-containing solid and a tantalum-containing solid into a liquid state and mixing the liquids to form a liquid blend and forming a solid alloy from the liquid blend. Another process of making a TaâSi alloy is described which involves blending powders containing tantalum or an oxide thereof with powders containing silicon or a silicon-containing compound to form a blend and then reducing the blend to a liquid state and forming a solid alloy from the liquid state. Also, a method of increasing the uniformity of tensile strength in tantalum metal, a method of reducing embrittlement of tantalum metal, and a method of imparting a controlled mechanical tensile strength in tantalum metal are described which involve adding silicon to tantalum metal so as to form a TaâSi alloy.

US Patent:

6863750, Mar 8, 2005

Filed:

May 21, 2001

Appl. No.:

09/861879

Inventors:

Christopher A. Michaluk - Gilbertsville PA, US

Assignee:

Cabot Corporation - Boston MA

International Classification:

C22C030/00

US Classification:

148668, 148422, 420425, 20429812

Abstract:

High purity niobium metals and alloys containing the same are described. The niobium metal preferably has a purity of at least 99. 99% and more preferably at least 99. 999%. In addition, niobium metal and alloys thereof are described, which either have a grain size of about 150 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 30 random, or an incremental log ratio of (111):(100) intensity of greater than about −4. 0, or any combination of these properties. Also described are articles and components made from the niobium metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity niobium metal which includes the step of reacting a salt-containing niobium and a metal salt along with at least one compound capable of reducing the salt-containing niobium to niobium and in a reaction container. The reaction container or liner in the reaction container and the agitator or liner on the agitator are made from a metal material having the same or higher vapor pressure of melted niobium.

US Patent:

6887356, May 3, 2005

Filed:

Nov 9, 2001

Appl. No.:

10/036338

Inventors:

Robert B. Ford - West Reading PA, US
Christopher A. Michaluk - Gilbertsville PA, US

Assignee:

Cabot Corporation - Boston MA

International Classification:

C23C014/34

US Classification:

20429812, 20429813

Abstract:

Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.

US Patent:

6893513, May 17, 2005

Filed:

Aug 6, 2001

Appl. No.:

09/922815

Inventors:

Christopher A. Michaluk - Gilbertsville PA, US
Louis E. Huber - Allentown PA, US
Mark N. Kawchak - Phoenixville PA, US

Assignee:

Cabot Corporation - Boston MA

International Classification:

C22C027/02

US Classification:

148422, 420427

Abstract:

High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99. 995% and more preferably at least 99. 999%. In addition, tantalum metal and alloys thereof are described, which either have a grain size of about 50 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about −4. 0, or any combination of these properties. Also described are articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity metal which includes the step of reacting a salt-containing tantalum with at least one compound capable of reducing this salt to tantalum powder and a second salt in a reaction container. The reaction container or liner in the reaction container and the agitator or liner on the agitator are made from a metal material having the same or higher vapor pressure of melted tantalum.

US Patent:

6921470, Jul 26, 2005

Filed:

Feb 13, 2003

Appl. No.:

10/366650

Inventors:

Christopher A. Michaluk - Gilbertsville PA, US

Assignee:

Cabot Corporation - Boston MA

International Classification:

C23C014/34

US Classification:

20429813, 20429812

Abstract:

The present invention relates to an improvement in the manufacture of metal blanks, discs, and sputtering targets by flattening only one of the two surfaces of a metal plate. The elimination of flattening the metal plate's second surface results in a significant cost reduction. The metal plate of the present invention preferably has a single-side flatness of 0. 005 inches or less, which improves the reliability of the bond between the target blank and a backing plate. Preferred metals include, but are not limited to, tantalum, niobium, titanium, and alloys thereof. The present invention also relates to machining the first side of a metal plate, bonding the first side to a backing plate, and then optionally machining the second side of the metal plate.

US Patent:

7067197, Jun 27, 2006

Filed:

Jan 6, 2004

Appl. No.:

10/752270

Inventors:

Christopher A. Michaluk - Gilbertsville PA, US
Shi Yuan - West Chester PA, US
James Maguire - Norristown PA, US

Assignee:

Cabot Corporation - Boston MA

International Classification:

B22F 1/02
B22F 7/04

US Classification:

428551, 428559, 75244

Abstract:

A method of forming a sputtering target and other metal articles having controlled oxygen and nitrogen content levels and the articles so formed are described. The method includes surface-nitriding a deoxidized metal powder and further includes consolidating the powder by a powder metallurgy technique. Preferred metal powders include, but are not limited to, valve metals, including tantalum, niobium, and alloys thereof.