Christopher B Reeves

US Patent:

20220246454, Aug 4, 2022

Filed:

Jan 29, 2021

Appl. No.:

17/163101

Inventors:

- Santa Clara CA, US
Joseph James Dox - Boxford MA, US
Vishali Ragam - Chantilly VA, US
Eric J. Warren - Malta NY, US
Shijing Wang - Sandy UT, US
Charles Largo - Saratoga Springs NY, US
Christopher Reeves - Clifton Park NY, US
Randy Raynaldo Corral - Glbert AZ, US

International Classification:

H01L 21/67
G06F 17/18

Abstract:

The subject matter of this specification can be implemented in, among other things, a method, system, and/or device to receive current metrology data for an operation on a current sample in a fabrication process. The metrology data includes a current value for a parameter at each of one or more locations on the current sample. The method includes obtaining a reference rate of change of the parameter value of the parameter for each of the one or more locations. The method further includes determining a current rate of change of the parameter value for each of the one or more locations. The current rate of change is associated with the current sample. The method further includes comparing the current rate of change of the parameter value to the reference rate of change of the parameter value and identifying an instance of abnormality of the fabrication process based on the comparison.

US Patent:

20230052392, Feb 16, 2023

Filed:

Oct 31, 2022

Appl. No.:

17/978075

Inventors:

- Santa Clara CA, US
Joseph James Dox - Boxford MA, US
Vishali Ragam - Chantilly VA, US
Eric J. Warren - Malta NY, US
Shijing Wang - Sandy UT, US
Charles Largo - Saratoga Springs NY, US
Christopher Reeves - Clifton Park NY, US
Randy Raynaldo Corral - Glbert AZ, US

International Classification:

G06F 17/18
H01L 21/67
G05B 19/418

Abstract:

The subject matter of this specification can be implemented in, among other things, a method, system, and/or device to receive current metrology data for an operation on a current sample in a fabrication process. The metrology data includes a current value for a parameter at each of one or more locations on the current sample. The method further includes determining a current rate of change of the parameter value for each of the one or more locations. The current rate of change is associated with the current sample. The method further includes identifying one or more violating locations each having an associated current rate of change of the parameter value that is greater than an associated reference rate of change of the parameter value, and identifying an instance of abnormality of the fabrication process based on the one or more violating locations.