Christopher D Robinson

US Patent:

8202460, Jun 19, 2012

Filed:

Sep 22, 2005

Appl. No.:

11/162765

Inventors:

Steven J. Holmes - Guilderland NY, US
David V. Horak - Essex Junction VT, US
Kurt R. Kimmel - Waterford NY, US
Karen E. Petrillo - Voorheesville NY, US
Christopher F. Robinson - Hyde Park NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B29C 45/14

US Classification:

26427217

Abstract:

An article including a microelectronic substrate is provided as an article usable during the processing of the microelectronic substrate. Such article includes a microelectronic substrate having a front surface, a rear surface opposite the front surface and a peripheral edge at boundaries of the front and rear surfaces. The front surface is a major surface of the article. A removable annular edge extension element having a front surface, a rear surface and an inner edge extending between the front and rear surfaces has the inner edge joined to the peripheral edge of the microelectronic substrate. In such way, a continuous surface is formed which includes the front surface of the edge extension element and the front surface of the microelectronic substrate, the continuous surface being substantially co-planar and flat where the peripheral edge is joined to the inner edge.

US Patent:

20120241913, Sep 27, 2012

Filed:

Jun 6, 2012

Appl. No.:

13/490239

Inventors:

Steven J. Holmes - Guilderland NY, US
David V. Horak - Essex Junction VT, US
Kurt R. Kimmel - Waterford NY, US
Karen E. Petrillo - Voorheesville NY, US
Christopher F. Robinson - Hyde Park NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01L 29/06

US Classification:

257618, 257E29005

Abstract:

An article including a microelectronic substrate is provided as an article usable during the processing of the microelectronic substrate. Such article includes a microelectronic substrate having a front surface, a rear surface opposite the front surface and a peripheral edge at boundaries of the front and rear surfaces. The front surface is a major surface of the article. A removable annular edge extension element having a front surface, a rear surface and an inner edge extending between the front and rear surfaces has the inner edge joined to the peripheral edge of the microelectronic substrate. In such way, a continuous surface is formed which includes the front surface of the edge extension element extending laterally from the peripheral edge of the microelectronic substrate and the front surface of the microelectronic substrate, the continuous surface being substantially co-planar and flat where the peripheral edge is joined to the inner edge.

US Patent:

20200386729, Dec 10, 2020

Filed:

Jun 10, 2019

Appl. No.:

16/436420

Inventors:

- Armonk NY, US
Robert Young - Poestenkill NY, US
Christopher F. Robinson - Hyde Park NY, US
Kelly Bronson - Glenmont NY, US

International Classification:

G01N 33/00
H01J 37/32
H01J 37/317

Abstract:

A method of controlling a gas mixture for a laser includes receiving as an input one or more of a plurality of concentration values. Each of the concentration values respectively corresponds to a constituent of a plurality of constituents of air. In the method, a blend of the plurality of constituents of air is generated based on the received one or more of the concentration values. The method also includes determining whether the blend of the plurality of constituents of air is within a threshold range for a ratio of the concentration values for the plurality of constituents of air. A flow of the blend of the plurality of constituents of air is controlled to be routed through an output circuit for use as the gas mixture for the laser following a determination that the blend of the plurality of constituents of air is within the threshold range.

US Patent:

20200117100, Apr 16, 2020

Filed:

Oct 10, 2018

Appl. No.:

16/156227

Inventors:

- Armonk NY, US
Scott D. Halle - Slingerlands NY, US
Richard C. Johnson - Selkirk NY, US
Christopher F. Robinson - Hyde Park NY, US
Chumeng Zheng - San Jose CA, US

International Classification:

G03F 7/20

Abstract:

Systems, methods and computer program products generally include a vector by vector subtraction method per wafer. A first layer is exposed to form a pattern image on a wafer and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a baseline reference are measured. The first layer is then reworked and exposed to form the same pattern image and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a first layer are measured. The overlay data of the reworked first layer is subtracted from the overlay data of the first layer to provide an overlay difference at each of the multiple locations. The overlay difference is converted to a pre-correction factor of a magnitude opposite that of the overlay difference and is applied to exposure of a second layer provided on the first layer.

US Patent:

20180373164, Dec 27, 2018

Filed:

Jun 23, 2017

Appl. No.:

15/631617

Inventors:

- Armonk NY, US
LUCIANA MELI THOMPSON - ALBANY NY, US
CHRISTOPHER F. ROBINSON - HYDE PARK NY, US

International Classification:

G03F 7/20

Abstract:

Embodiments are directed to a method and system for determining effective dose of a lithography tool. The method includes performing a series of open frame exposures with the lithography tool on a substrate to produce a set of controlled exposure dose blocks in resist, and then baking and developing the exposed substrate. The method further includes scanning the resultant open frame images with oblique light and capturing the light scattered from the substrate surface. The method further includes creating a haze map from the background signal of the scattered light data, converting the haze map to a graphical image file, and analyzing the graphical image file to determine effective dose of the lithography tool, wherein a brightness of the graphical image file is related to effective dose of the lithography tool.

US Patent:

20180373165, Dec 27, 2018

Filed:

Nov 27, 2017

Appl. No.:

15/822242

Inventors:

- ARMONK NY, US
LUCIANA MELI THOMPSON - ALBANY NY, US
CHRISTOPHER F. ROBINSON - HYDE PARK NY, US

International Classification:

G03F 7/20

Abstract:

Embodiments are directed to a method and system for determining effective dose of a lithography tool. The method includes performing a series of open frame exposures with the lithography tool on a substrate to produce a set of controlled exposure dose blocks in resist, and then baking and developing the exposed substrate. The method further includes scanning the resultant open frame images with oblique light and capturing the light scattered from the substrate surface. The method further includes creating a haze map from the background signal of the scattered light data, converting the haze map to a graphical image file, and analyzing the graphical image file to determine effective dose of the lithography tool, wherein a brightness of the graphical image file is related to effective dose of the lithography tool.