Jason Tian - Milpitas CA, US Wenxian Zhu - Palo Alto CA, US M. Ziaul Karim - San Jose CA, US Cong Do - San Jose CA, US
Assignee:
Novellus Systems, Inc. - San Jose CA
International Classification:
H01L 2358
US Classification:
257634, 257635, 257650
Abstract:
A fluorine-doped silica glass (FSG) dielectric layer includes a number of sublayers. Each sublayer is doped with fluorine in such a way that the doping concentration of fluorine in the sublayer decreases as one moves from an interior region of the sublayer towards one or both of the interfaces between the sublayer and adjacent sublayers. This structure reduces the generation of HF when the layer is exposed to moisture and thereby improves the stability and adhesion properties of the layer. The principles of this invention can also be applied to dielectric layers doped with such other dopants as boron, phosphorus or carbon.