Cynthia L Anderson

US Patent:

48787701, Nov 7, 1989

Filed:

Sep 9, 1987

Appl. No.:

7/094513

Inventors:

Paul A. Ruggierio - Littleton MA
Cynthia E. Anderson - Glenview IL

Assignee:

Analog Devices, Inc. - Norwood MA

International Classification:

H01C 1012

US Classification:

388308

Abstract:

Process of making an IC chip with thin film resistors, and IC chips made by such process, wherein a chip substrate first is covered with layers of thin film and interconnect material (with an intermediate barrier layer if needed), such layers being etched away in predetermined regions in accordance with the metal interconnect pattern, the remaining layered material being aligned vertically, and thereafter, in a section of the remaining material, etching away the interconnect material (and barrier material if used) to expose the thin film material to form a thin film resistor which is self-aligned with the adjoining sections of interconnect conductors. The material in the predetermined regions may be etched by a dry-etch (plasma) or by a wet-etch.

US Patent:

50432958, Aug 27, 1991

Filed:

Jun 20, 1989

Appl. No.:

7/368825

Inventors:

Paul A. Ruggerio - Littleton MA
Cynthia E. Anderson - Glenview IL

International Classification:

H01L 21461

US Classification:

437 47

Abstract:

Process of making an IC chip with thin film resistors, and IC chips made by such process, wherein a chip substrate first is covered with layers of thin film and interconnect material (with an intermediate barrier layer if needed), such layers being etched away in predetermined regions in accordance with the metal interconnect pattern, the remaining layered material being aligned vertically, and thereafter, in a section of the remaining material, etching away the interconnect material (and barrier material if used) to expose the thin film material to form a thin film resistor which is self-aligned withe the adjoining sections of interconnect conductors. The material in the predetermined regions may be etched by a dry-etch (plasma) or by a wet-etch.