Daniel James Devine
age ~49
from Ceres, CA
- Also known as:
-
- Daniel J Devine
- Danirl J Devine
- David J Devine
- Carin Devine
- Gregory Devine
- Phone and address:
-
3870 Don Pedro Rd, Ceres, CA 95307
2097657229
Daniel Devine Phones & Addresses
- 3870 Don Pedro Rd, Ceres, CA 95307 • 2097657229
- 1807 Waring Way, Modesto, CA 95350
- Los Banos, CA
- Escalon, CA
- 1798 Paseo Laguna Seco APT 183, Livermore, CA 94551
- Riverbank, CA
Lawyers & Attorneys
Daniel Devine - Lawyer
view sourceSpecialties:
Tax Law
Finance
Finance
ISLN:
907884345
Admitted:
1987
University:
University of Notre Dame, B.A., 1983
Law School:
Detroit College of Law, J.D., 1987
Daniel Devine - Lawyer
view sourceISLN:
907884321
Admitted:
1990
University:
Cornell University, B.S., 1986
Law School:
State University of New York at Buffalo, J.D., 1989
Name / Title
Company / Classification
Phones & Addresses
Chairman, CFO, Treasurer
Bridgepoint Education, Inc
College/University · Educational Services
College/University · Educational Services
8586682586
Resumes
Daniel S Devine
view sourceWork:
St Catherine of Genoa Theater Group Mar 2018 - Mar 2018
Actor
Actor
Daniel P Devine
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Daniel Devine
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Daniel Devine
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Daniel Alan Devine
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Daniel Devine
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Daniel Devine
view sourceLocation:
United States
Us Patents
-
Selective Reflectivity Process Chamber With Customized Wavelength Response And Method
view source -
US Patent:7115837, Oct 3, 2006
-
Filed:Jul 28, 2003
-
Appl. No.:10/629400
-
Inventors:Paul J. Timans - Mountain View CA, US
Daniel J. Devine - Los Gatos CA, US
Young Jai Lee - Sunnyvale CA, US
Yao Zhi Hu - San Jose CA, US
Peter C. Bordiga - Petaluma CA, US -
Assignee:Mattson Technology, Inc. - Fremont CA
-
International Classification:F27B 5/14
F26B 19/00 -
US Classification:219405, 219390, 219411, 2194431, 219543, 118724, 118725, 118 501, 118728, 392416, 392418
-
Abstract:A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy. The chamber responds in a first way to the heating arrangement radiated energy and in a second way to the treatment object radiated energy that is incident thereon. The chamber may respond in the first way by reflecting the majority of the heat source radiated energy and in the second way by absorbing the majority of the treatment object radiated energy. Different portions of the chamber may be treated with selectively reflectivity based on design considerations to achieve objectives with respect to a particular chamber performance parameter.
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Slotted Electrostatic Shield Modification For Improved Etch And Cvd Process Uniformity
view source -
US Patent:7232767, Jun 19, 2007
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Filed:Mar 18, 2004
-
Appl. No.:10/803453
-
Inventors:Rene George - San Jose CA, US
Andreas Kadavanich - Fremont CA, US
Daniel J. Devine - Los Gatos CA, US
Stephen E. Savas - San Jose CA, US
John Zajac - San Jose CA, US
Hongching Shan - Cupertino CA, US -
Assignee:Mattson Technology, Inc. - Fremont CA
-
International Classification:H01L 21/302
-
US Classification:438714, 257E2117, 257E21218
-
Abstract:A more uniform plasma process is implemented for treating a treatment object using an inductively coupled plasma source which produces an asymmetric plasma density pattern at the treatment surface using a slotted electrostatic shield having uniformly spaced-apart slots. The slotted electrostatic shield is modified in a way which compensates for the asymmetric plasma density pattern to provide a modified plasma density pattern at the treatment surface. A more uniform radial plasma process is described in which an electrostatic shield arrangement is configured to replace a given electrostatic shield in a way which provides for producing a modified radial variation characteristic across the treatment surface. The inductively coupled plasma source defines an axis of symmetry and the electrostatic shield arrangement is configured to include a shape that extends through a range of radii relative to the axis of symmetry.
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Low Cost High Throughput Processing Platform
view source -
US Patent:7563068, Jul 21, 2009
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Filed:Jan 11, 2007
-
Appl. No.:11/622361
-
Inventors:Leszek Niewmierzycki - San Jose CA, US
David Barker - Walnut Creek CA, US
Daniel J. Devine - Los Gatos CA, US
Michael Kuhlman - Fremont CA, US
Ryan Pakulski - Discovery Bay CA, US
Hongqing Shan - Cupertino CA, US
Martin Zucker - Orinda CA, US -
Assignee:Mattson Technology, Inc. - Fremont CA
-
International Classification:B65H 1/00
-
US Classification:414806
-
Abstract:As part of a system for processing workpieces, a workpiece support arrangement, separate from a process chamber arrangement supports at least two workpieces at least generally in a stacked relationship to form a workpiece column. A transfer arrangement transports at least two of the workpieces between the workpiece column and the process chamber arrangement by simultaneously moving the two workpieces at least generally along first and second transfer paths, respectively, that are defined between the workpiece column and the first and second process stations. The transfer arrangement can simultaneously move untreated and treated workpieces. Vertical motion swing arms and coaxial swing arms are described. A pair of spaced apart swing arms, the workpiece column and the processing stations can cooperatively define a pentagonal shape. Timing belt backlash elimination, a dual degree of freedom slot valve and low point chamber pumping, for removing chamber contaminants, are also described.
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Selective Reflectivity Process Chamber With Customized Wavelength Response And Method
view source -
US Patent:7737385, Jun 15, 2010
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Filed:Aug 16, 2006
-
Appl. No.:11/506174
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Inventors:Paul J. Timans - Mountain View CA, US
Daniel J. Devine - Los Gatos CA, US
Young Jai Lee - Sunnyvale CA, US
Yao Zhi Hu - San Jose CA, US
Peter C. Bordiga - Petaluma CA, US -
Assignee:Mattson Technology, Inc. - Fremont CA
-
International Classification:F27B 5/14
F26B 19/00 -
US Classification:219390, 219405, 219411, 2194431, 2194441, 2194661, 219533, 219534, 219546, 219547, 219548, 118724, 118725, 118 501, 118728
-
Abstract:A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy. The chamber responds in a first way to the heating arrangement radiated energy and in a second way to the treatment object radiated energy that is incident thereon. The chamber may respond in the first way by reflecting the majority of the heat source radiated energy and in the second way by absorbing the majority of the treatment object radiated energy. Different portions of the chamber may be treated with selectively reflectivity based on design considerations to achieve objectives with respect to a particular chamber performance parameter.
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Workpiece Support With Fluid Zones For Temperature Control
view source -
US Patent:7972444, Jul 5, 2011
-
Filed:Nov 7, 2007
-
Appl. No.:11/936576
-
Inventors:Martin L. Zucker - Orinda CA, US
Daniel J. Devine - Los Gatos CA, US
Vladimir Nagorny - Tracy CA, US
Jonathan Mohn - Saratoga CA, US -
Assignee:Mattson Technology, Inc. - Fremont CA
-
International Classification:C23C 16/00
C23F 1/00
H01L 21/306 -
US Classification:118728, 118724, 15634551, 15634552, 15634553
-
Abstract:A workpiece support is disclosed defining a workpiece-receiving surface. The workpiece support includes a plurality of fluid zones. A fluid, such as a gas, is fed to the fluid zones for contact with a workpiece on the workpiece support. The fluid can have selected thermoconductivity characteristics for controlling the temperature of the workpiece at particular locations. In accordance with the present disclosure, at least certain of the fluid zones are at different azimuthal positions. In this manner, the temperature of the workpiece can be adjusted not only in a radial direction but also in an angular direction.
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Method And System For Thermally Processing A Plurality Of Wafer-Shaped Objects
view source -
US Patent:7977258, Jul 12, 2011
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Filed:Apr 6, 2007
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Appl. No.:11/784503
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Inventors:Zsolt Nenyei - Blaustein, DE
Paul J. Timans - Mountain View CA, US
Wilfried Lerch - Dornstadt, DE
Jüergen Niess - Sontheim, DE
Manfred Falter - Ulm, DE
Patrick Schmid - Donzdorf, DE
Conor Patrick O'Carroll - Vancouver BC, CA
Rudy Cardema - San Jose CA, US
Igor Fidelman - Danville CA, US
Yao Zhi Hu - San Jose CA, US
Daniel J. Devine - Los Gatos CA, US -
Assignee:Mattson Technology, Inc. - Fremont CA
-
International Classification:H01L 21/00
F27B 9/14 -
US Classification:438795, 432122
-
Abstract:Process and system for processing wafer-shaped objects, such as semiconductor wafers is disclosed. In accordance with the present disclosure, a multiple of two wafers are processed in a thermal processing chamber. The thermal processing chamber is in communication with at least one heating device for heating the wafers. The wafers are placed in the thermal processing chamber in a face-to-face configuration or in a back-to-back configuration.
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Electrostatic Chuck System And Process For Radially Tuning The Temperature Profile Across The Surface Of A Substrate
view source -
US Patent:8405005, Mar 26, 2013
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Filed:Jan 29, 2010
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Appl. No.:12/696119
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Inventors:Martin L. Zucker - Orinda CA, US
Daniel J. Devine - Los Gatos CA, US
Young Jai Lee - Sunnyvale CA, US -
Assignee:Mattson Technology, Inc. - Fremont CA
-
International Classification:H05B 3/68
-
US Classification:2194441, 2194681
-
Abstract:An electrostatic chuck system for maintaining a desired temperature profile across the surface of the substrate is disclosed. The electrostatic chuck system includes a pedestal support defining a substantially uniform temperature profile across the surface of the pedestal support and an electrostatic chuck supported by the pedestal support. The electrostatic chuck has a clamping electrode and a plurality of independently controlled heating electrodes. The independently controlled heating electrodes include an inner heating electrode defining an inner heating zone and a peripheral heating electrode defining a peripheral heating zone separated by a gap distance. The temperature profile across the surface of the substrate can be tuned by varying thermal characteristics of the pedestal thermal zone, the inner heating zone, the peripheral heating zone, or by varying the size of the gap distance between the inner heating electrode and the peripheral heating electrode.
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Slotted Electrostatic Shield Modification For Improved Etch And Cvd Process Uniformity
view source -
US Patent:8413604, Apr 9, 2013
-
Filed:Nov 28, 2006
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Appl. No.:11/564134
-
Inventors:Rene George - San Jose CA, US
Andreas Kadavanich - Fremont CA, US
Daniel J. Devine - Los Gatos CA, US
Stephen E. Savas - San Jose CA, US
John Zajac - San Jose CA, US
Hongching Shan - Cupertino CA, US -
Assignee:Mattson Technology, Inc. - Fremont CA
-
International Classification:C23C 16/00
C23F 1/00
H01L 21/306 -
US Classification:118723I, 15634548
-
Abstract:A more uniform plasma process is implemented for treating a treatment object using an inductively coupled plasma source which produces an asymmetric plasma density pattern at the treatment surface using a slotted electrostatic shield having uniformly spaced-apart slots. The slotted electrostatic shield is modified in a way which compensates for the asymmetric plasma density pattern to provide a modified plasma density pattern at the treatment surface. A more uniform radial plasma process is described in which an electrostatic shield arrangement is configured to replace a given electrostatic shield in a way which provides for producing a modified radial variation characteristic across the treatment surface. The inductively coupled plasma source defines an axis of symmetry and the electrostatic shield arrangement is configured to include a shape that extends through a range of radii relative to the axis of symmetry.
License Records
Daniel E Devine
License #:
RS098921A - Expired
Category:
Real Estate Commission
Type:
Real Estate Salesperson-Standard
Wikipedia
Dan Devine
view sourceDaniel John Devine (December 22, 1924 May 9, 2002) was an American football player and coach. He served as the head coach football coach at Arizona ...
ISBN #
3
Amazon
The Cull Chronicles Book 2: The Enemy of My Enemy (Volume 2)
view sourceCaptain, a title Jason Cull had never really imagined he'd own. The Freedom's launch may have been a disaster, but Mr. Lucas had still been there to keep the crew focused and tell them all what to do. Well one single botched mission had taken care of that, and now the others had voted to put Jason i...
Author
Daniel Devine
Binding
Paperback
Pages
294
Publisher
Writers Exchange E-Publishing
ISBN #
1922066052
EAN Code
9781922066053
ISBN #
6
The Next Best Thing To Heroes (The Cull Chronicles)
view sourceJason Cull is one of the best and the brightest that the human race has to offer. At least, that's what it tells him in all of the Academy's brochures.The Earth has been conquered by a technologically superior race called the Grath, and while the rest of humanity toils away their lives in dank facto...
Author
Daniel Devine
Binding
Kindle Edition
Pages
269
Publisher
Writer's Exchange E-Publishing
ISBN #
9
Simply Devine: Memoirs of a Hall of Fame Coach (Notre Dame Edition)
view sourceDan Devine: Memoirs of a Hall of Fame Coach is the autobio- graphy of the former University of Missouri and Notre Dame head football coach. As head coach at Arizona State, Devine accumulated a 27-3-1 record. From 1958-1970, he guided Missouri to a 93-37-7 mark. Devine also served as the head coach a...
Author
Dan Devine
Binding
Hardcover
Pages
200
Publisher
Sports Publishing LLC
ISBN #
158261007X
EAN Code
9781582610078
ISBN #
8
Saga of a Stop and Go Family
view sourceTheir families lived 20 miles apart for 3 generations in Ontario, but Daniel W. Devine first met Mary Ann McCusker in 1907 in Niagara Falls NY. On their wedding night in 1911, they boarded a 3 AM train in the rain, for a 2500 mile journey to a Cascade Mountain tent. It was the first of 22 homes they...
Author
Daniel P. Devine
Binding
Paperback
Pages
202
Publisher
Infinity Publishing.com
ISBN #
0741408554
EAN Code
9780741408556
ISBN #
7
How to Do Financial Asset Investigations. (book reviews): An article from: Security Management
view sourceThis digital document is an article from Security Management, published by American Society for Industrial Security on December 1, 1994. The length of the article is 699 words. The page length shown above is based on a typical 300-word page. The article is delivered in HTML format and is available i...
Author
Daniel R. Devine
Binding
Digital
Pages
3
Publisher
American Society for Industrial Security
ISBN #
10
Making Camera Bellows
view sourceAuthor
Peter Wallage
Binding
Paperback
Pages
16
Publisher
Wallage Reprints
ISBN #
184147083X
EAN Code
9781841470832
ISBN #
5
News
Premier League Transfer Talk - August 19 2013
view source- Cameron (Torquay, Free), Brett Holman (Al Nasr, Free), Eric Lichaj (Nottm Fst, Free), Jean Makoun (Rennes, Free), Derrick Williams (Bristol City, Free), Richard Dunne (QPR, Free), Graham Burke (Shrewsbury, Loan).Released: Calum Barrett, Joshua Barton, Daniel Devine, Andrew Marshall.Retired
- Date: Aug 20, 2013
- Category: Sports
- Source: Google
Premier League Transfer Talk: August 3 - Clint Dempsey leaves Tottenham ...
view source- t: Courtney Cameron (Torquay, Free), Brett Holman (Al Nasr, Free), Eric Lichaj (Nottm Fst, Free), Jean Makoun (Rennes, Free), Derrick Williams (Bristol City, Free), Richard Dunne (QPR, Free).Released: Calum Barrett, Joshua Barton, Daniel Devine, Andrew Marshall.Retired: Stiliyan Petrov.
- Date: Aug 04, 2013
- Source: Google
Youtube
Myspace
daniel devine
view sourceLocality:
London and South East, United Kingdom
Gender:
Male
Birthday:
1947
Googleplus
Daniel Devine
Work:
Apple
Education:
Putnam city west, Columbia College
Daniel Devine
Work:
Air National Guard - Public Health (2006)
Pennsylvania Department of Agriculture - Food Sanitarian (2007)
Pennsylvania Department of Agriculture - Food Sanitarian (2007)
Daniel Devine
Education:
TMCC - Graphic Communications
Daniel Devine
Education:
Western Wayne Hs
Tagline:
G+ ADds!.
Daniel Devine
Education:
Humber College
Daniel Devine
Daniel Devine
Daniel Devine
Classmates
Daniel Devine
view sourceSchools:
Marist High School Chicago IL 1972-1976
Community:
Sandra Hubl, Tracy Thibeau, Daniel Klatt, John Ferenzi
Daniel Devine
view sourceSchools:
Burke Catholic High School Goshen NY 1987-1991
Community:
Denise Schneider, Catherine Demarco, Louise Valle, Robert Duggan
Daniel Devine
view sourceSchools:
Meyler Street Elementary School Torrance CA 1956-1964, White Junior High School Carson CA 1964-1967, Long Beach City High School Long Beach CA 1970-1972
Community:
David Cavano, Scott Carroll
Daniel Devine
view sourceSchools:
Trinity Lutheran School Hawthorne CA 1975-1982, Lynn Middle School Torrance CA 1982-1984
Community:
Michael Johnston, Terry Thompson, Joe Snyder
Daniel Devine
view sourceSchools:
Utica Elementary School Yankton SD 1996-2000
Community:
Rolland Gross, Michelle Young, Stacy Kotalik, Mary Novak, Haim Buzaglo, Bob Bobton, Alan Shapiro, David Island
Daniel Devine, Lakewood H...
view source
Schilling Elementary Scho...
view sourceGraduates:
Sarah Hayter (1986-1990),
Brittany Bernard (1999-2000),
Jose Perez (1990-1994),
Daniel Ramirez (1993-1997),
Daniel Devine (1981-1986)
Brittany Bernard (1999-2000),
Jose Perez (1990-1994),
Daniel Ramirez (1993-1997),
Daniel Devine (1981-1986)
Marina High School, Marin...
view sourceGraduates:
Dennis Lewis (1995-1999),
Daniel Devine (1996-2000),
Grant McCarty (2002-2006),
Debbie Mackin (1970-1972)
Daniel Devine (1996-2000),
Grant McCarty (2002-2006),
Debbie Mackin (1970-1972)
Daniel Devine Jr.
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Daniel Devine
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Daniel Devine
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Daniel Devine Log In
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Daniel Earl Devine
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Daniel Devine
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Daniel C. Devine
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Daniel Devine
view sourceGet Report for Daniel James Devine from Ceres, CA, age ~49