Daniel J Marx

US Patent:

56981589, Dec 16, 1997

Filed:

Nov 4, 1996

Appl. No.:

8/743472

Inventors:

Raymond K. F. Lam - Park Ridge NJ
Daniel R. Marx - West Caldwell NJ

Assignee:

Sony Corporation - Tokyo
Materials Research Corporation - Orangeburg NY

International Classification:

C22B 408

US Classification:

266 87

Abstract:

Ultra high purity materials, particularly metallic materials such magnesium and similarly high volatility materials, are produced by a vacuum distillation method and apparatus to increase purity by approximately five hundred times in a single step. For example, magnesium purity, exclusive of zinc content, is increased from 99. 95% to greater than 99. 9999%. A distillation column is formed of a high purity (less than 10 ppm ash) graphite, and includes a crucible, a vertical condenser in which horizontal high purity graphite baffles are selectively located at a plurality of levels, for example at nine levels. The column is contained in a three-zone resistance furnace that is controlled to heat the crucible to evaporate the material, maintain the condenser immediately above the crucible to above the boiling point of the material, and maintain the portion of the column thereabove at below the boiling point of the material, preferably with the temperature gradually decreasing with the height of the column. The baffles are spaced along the condenser and are staggered to slow the vapors such that the high purity material reaches its condensation temperature and condenses on one or more selected ones of the baffles. The condenser is split so the baffles can be selectively placed and removed to remove the purified material.

US Patent:

55826300, Dec 10, 1996

Filed:

Feb 21, 1995

Appl. No.:

8/391047

Inventors:

Raymond K. F. Lam - Park Ridge NJ
Daniel R. Marx - West Caldwell NJ

Assignee:

Sony Corporation - Tokyo
Materials Research Corporation - Orangeburg NY

International Classification:

C22B 2622

US Classification:

75380

Abstract:

Ultra high purity materials, particularly metallic materials such as magnesium and similarly high volatility materials, are produced by a vacuum distillation method and apparatus to increase purity by approximately five hundred times in a single step. For example, magnesium purity, exclusive of zinc content, is increased from 99. 95% to greater than 99. 9999%. A distillation column is formed of a high purity (less than 10 ppm ash) graphite, and includes a crucible, a vertical condenser in which horizontal high purity graphite baffles are selectively located at a plurality of levels, for example at nine levels. The column is contained in a three-zone resistance furnace that is controlled to heat the crucible to evaporate the material, maintain the condenser immediately above the crucible to above the boiling point of the material, and maintain the portion of the column thereabove at below the boiling point of the material, preferably with the temperature gradually decreasing with the height of the column. The baffles are spaced along the condenser and are staggered to slow the vapors such that the high purity material reaches its condensation temperature and condenses on one or more selected ones of the baffles. The condenser is split so the baffles can be selectively placed and removed to remove the purified material.

US Patent:

44837399, Nov 20, 1984

Filed:

Feb 16, 1984

Appl. No.:

6/579154

Inventors:

Elena H. Too - Nutley NJ
Daniel R. Marx - Montclair NJ

Assignee:

OMI International Corporation - Warren MI

International Classification:

C23F 102
B44C 122
C03C 1500
C03C 2506

US Classification:

156656

Abstract:

An improved composition for selectively stripping gold from a metal substrate, especially copper metal, wherein the gold deposit is rapidly and effectively stripped without an attendant attack on the metal substrate. A minor amount of an organo mercapto compound, e. g. mercaptobenzothiazole, is added to the stripping composition to inhibit attack on the metal substrate.

US Patent:

54395003, Aug 8, 1995

Filed:

Dec 2, 1993

Appl. No.:

8/161143

Inventors:

Daniel R. Marx - West Caldwell NJ

Assignee:

Materials Research Corporation - Orangeburg NY

International Classification:

C22C 1900
C22C 3800
B22F 312

US Classification:

75246

Abstract:

A magneto-optical sputter target having a composition comprising at least one rare earth element and at least one transition metal, with a structure which includes a transition metal constituent and a finely mixed alloy constituent of a rare earth phase and a rare earth/transition metal intermetallic compound. The structure of the present target contains a minimum of the intermetallic compound. A method of producing the present sputter target includes mixing particles of the transition metal constituent (preferably only alloyed transition metals) with particles of the finely mixed alloy to produce a powder blend and subjecting the powder blend to a pressing operation in an oxidizing inhibiting environment for a time and at a temperature and pressure which minimizes the rare earth/transition metal intermetallic compound content of the target.

US Patent:

44708866, Sep 11, 1984

Filed:

Jan 4, 1983

Appl. No.:

6/454503

Inventors:

Robert Duva - Paramus NJ
Daniel R. Marx - Montclair NJ

Assignee:

OMI International Corporation - Warren MI

International Classification:

C25D 362

US Classification:

204 43G

Abstract:

Improved electroplating ternary gold alloy plating baths wherein the gold ingredient is an alkali metal auricyanide, the gold metal being in the plus three oxidation state, and the alloying metals are both cobalt and molybdenum. The electroplating baths also contain citric acid. A wetting agent or surfactant as well as a stress reducer-brightener are also advantageously utilized in the bath. The ternary alloys may be deposited on various electronic and decorative substrates, and the deposits were characterized by unique physical and mechanical properties. Most importantly, there is a substantial improvement in wear resistance. The method of utilizing such improved electroplating baths on various substrates is also described and claimed.

US Patent:

53363868, Aug 9, 1994

Filed:

Oct 28, 1992

Appl. No.:

7/967458

Inventors:

Daniel R. Marx - West Caldwell NJ
Steven Hurwitt - Park Ridge NJ

Assignee:

Materials Research Corporation - Orangeburg NY

International Classification:

C23C 1434

US Classification:

20429812

Abstract:

A sputtering target and target assembly includes a target member having a substantially continuously concave top surface and a bottom surface with a central, downwardly directed hub and at least three annular regions of differing radius of curvature. The shape of the target member bottom surface conforms to a backplate to which it is mounted, thereby facilitating accurate mounting of the target member during sputtering. The corresponding shapes of the target member and backplate promote maximum utilization of sputtering material.