Daniel R Sanders

US Patent:

7521090, Apr 21, 2009

Filed:

Apr 1, 2008

Appl. No.:

12/060500

Inventors:

Joy Cheng - San Jose CA, US
Charles T. Rettner - San Jose CA, US
Daniel P. Sanders - San Jose CA, US
Ratnam Sooriyakumaran - San Jose CA, US
Linda Sundberg - Los Gatos CA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B05D 5/00

US Classification:

427256, 4302801, 427258

Abstract:

Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.

US Patent:

7521094, Apr 21, 2009

Filed:

Jan 14, 2008

Appl. No.:

12/013957

Inventors:

Joy Cheng - San Jose CA, US
William D. Hinsberg - San Jose CA, US
Charles T. Rettner - San Jose CA, US
Daniel P. Sanders - San Jose CA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B05D 3/00

US Classification:

427532, 4273855, 427558, 430315

Abstract:

Disclosed herein is a method of forming polymer structures comprising applying a solution of a diblock copolymer assembly comprising at least one diblock copolymer that forms lamellae, to a neutral surface of a substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and which have a chemical pattern spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains comprising blocks of the diblock copolymer. The domains form by lateral segregation of the blocks. At least one domain has an affinity for the pinning regions and forms on the pinning region, the domains so formed on the pinning region are aligned with the underlying chemical pattern, and domains that do not form on the pinning region form adjacent to and are aligned with the domains formed on the pinning regions. In this way, a structure comprising repeating sets of domains is formed on the chemical pattern with a spatial frequency given by the number of repeating sets of domains in the given direction, that is at least twice that of the chemical pattern spatial frequency. Methods of forming the chemical patterns, and pattern transfer methods using patterned domains, are also disclosed.

US Patent:

7678537, Mar 16, 2010

Filed:

Mar 31, 2008

Appl. No.:

12/058893

Inventors:

Robert D. Allen - San Jose CA, US
Phillip Brock - Sunnyvale CA, US
Daniel P. Sanders - San Jose CA, US
Linda K. Sundberg - Los Gatos CA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7/207
G03F 7/26
G03F 7/38

US Classification:

430327, 430325, 4302731, 430326, 430330, 430311, 438952

Abstract:

A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.

US Patent:

7763319, Jul 27, 2010

Filed:

Jan 11, 2008

Appl. No.:

12/013138

Inventors:

Joy Cheng - San Jose CA, US
Daniel P. Sanders - San Jose CA, US
Linda Sundberg - Los Gatos CA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B05D 5/00
B05D 5/12

US Classification:

427256, 427258, 427532, 4273855, 427558, 4302801, 525 88, 216 49, 216 56, 428910, 428212, 264435, 264901, 156246

Abstract:

A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

US Patent:

7781157, Aug 24, 2010

Filed:

Jul 28, 2006

Appl. No.:

11/495038

Inventors:

Gregory Breyta - San Jose CA, US
Daniel Paul Sanders - San Jose CA, US
Hoa D. Truong - San Jose CA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7/38
G03F 7/11

US Classification:

430325, 430326, 4302731, 430330, 430327, 430396, 4302701

Abstract:

The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90 C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.

US Patent:

7824845, Nov 2, 2010

Filed:

Mar 28, 2008

Appl. No.:

12/057472

Inventors:

Robert D. Allen - San Jose CA, US
Matthew E. Colburn - Schenectady NY, US
Daniel P. Sanders - San Jose CA, US
Ratnam Sooriyakumaran - San Jose CA, US
Hoa D. Truong - San Jose CA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7/038
G03F 7/039
G03F 7/20
G03F 7/30

US Classification:

430326, 430325, 4302701, 430905, 430907, 430942, 430967

Abstract:

Linear or branched functionalized polycarbosilanes having an absorbance less than 3. 0 μmat 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e. g. , immersion lithography.

US Patent:

7883828, Feb 8, 2011

Filed:

Mar 28, 2008

Appl. No.:

12/057478

Inventors:

Robert D. Allen - San Jose CA, US
Matthew E. Colburn - Schenectady NY, US
Daniel P. Sanders - San Jose CA, US
Ratnam Sooriyakumaran - San Jose CA, US
Hoa D. Truong - San Jose CA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7/039
G03F 7/038
C08G 77/60
C08G 77/50

US Classification:

4302701, 430325, 430326, 430905, 430907, 430919, 430921, 430925, 528 35, 528 25, 528 26, 528 27, 528 28, 528 29, 528 31

Abstract:

Linear or branched functionalized polycarbosilanes having an absorbance less than 3. 0 μmat 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e. g. , immersion lithography.

US Patent:

7906031, Mar 15, 2011

Filed:

Feb 22, 2008

Appl. No.:

12/036091

Inventors:

Joy Cheng - San Jose CA, US
Daniel P. Sanders - San Jose CA, US
Ratnam Sooriyakumaran - San Jose CA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

C03C 15/00

US Classification:

216 41, 216 42, 216 46, 216 49, 216 67

Abstract:

A Method. The method includes forming a substructure, on a substrate, including a feature having a sidewall of a first material and a bottom surface of a second material. Applying a solution including two immiscible polymers and third material to the substructure. The immiscible polymers include a first and second polymer. A selective chemical affinity of the first polymer for the material is greater than a selective chemical affinity of the second polymer for the material. The first polymer is segregated from the second polymer. The first polymer selectively migrates to the at least one sidewall, resulting in the first polymer being disposed between the at least one sidewall and the second polymer. The first polymer is selectively removed. The second polymer remains, resulting in forming structures including the substructure, the third material, and the second polymer.