Daniel Paul Sanders

US Patent:

20200050108, Feb 13, 2020

Filed:

Aug 11, 2018

Appl. No.:

16/101411

Inventors:

- Armonk NY, US
Indira Seshadri - Niskayuna NY, US
Kristin Schmidt - Mountain View CA, US
Nelson Felix - Slingerlands NY, US
Daniel Sanders - San Jose CA, US
Jing Guo - Niskayuna NY, US
Ekmini Anuja De Silva - Slingerlands NY, US
Hoa Truong - Santa Clara CA, US

International Classification:

G03F 7/11
G03F 7/004
G03F 7/09

Abstract:

A self-priming resist may be formed from a first random copolymer forming a resist and a polymer brush having the general formula poly(A-r-B)-C-D, wherein A is a first polymer unit, B is a second polymer unit, wherein A and B are the same or different polymer units, C is a cleavable unit, D is a grafting group and r indicates that poly(A-r-B) is a second random copolymer formed from the first and second polymer units. The first random copolymer may be the same or different from the second random polymer. The self-priming resist can create a one-step method for forming an adhesion layer and resist by using the resist/brush blend.