Daniel J Spence

US Patent:

7919409, Apr 5, 2011

Filed:

Aug 15, 2008

Appl. No.:

12/192603

Inventors:

Hansong Cheng - Allentown PA, US
Xinjian Lei - Vista CA, US
Daniel P. Spence - San Diego CA, US
John Anthony Thomas Norman - Encinitas CA, US
David Allen Roberts - Fogelsville PA, US
Bo Han - Wuhan, CN
Chenggang Zhou - Wuhan, CN
Jinping Wu - Wuhan, CN

Assignee:

Air Products and Chemicals, Inc. - Allentown PA

International Classification:

H01L 21/285

US Classification:

438653, 257E21168

Abstract:

We have used the state-of-the-art computational chemistry techniques to identify adhesion promoting layer materials that provide good adhesion of copper seed layer to the adhesion promoting layer and the adhesion promoting layer to the barrier layer. We have identified factors responsible for providing good adhesion of copper layer on various metallic surfaces and circumstances under which agglomeration of copper film occur. Several promising adhesion promoting layer materials based on chromium alloys have been predicted to be able to significantly enhance the adhesion of copper films. Chromium containing complexes of a polydentate β-ketoiminate have been identified as chromium containing precursors to make the alloys with chromium.

US Patent:

8507704, Aug 13, 2013

Filed:

Aug 30, 2010

Appl. No.:

12/871284

Inventors:

Sergei Vladimirovich Ivanov - Schnecksville PA, US
Xinjian Lei - Vista CA, US
Daniel P. Spence - Carlsbad CA, US
John Anthony Thomas Norman - Encinitas CA, US
Laura M. Matz - Allentown PA, US

Assignee:

Air Products and Chemicals, Inc. - Allentown PA

International Classification:

C07F 5/00
C07F 5/06
C07F 9/00
C07F 13/00
C07F 7/00
C07F 11/00
C07F 1/00
C07F 3/00
C07F 15/00
C07C 49/92

US Classification:

556 1, 556 27, 556 40, 556 42, 556 45, 556 51, 556 57, 556 64, 556113, 556118, 556137, 556138

Abstract:

A formulation, comprising: a) at least one metal-ligand complex, wherein one or more ligands are selected from the group consisting of β-diketonates, β-ketoiminates, β-ketoesterates, β-diiminates, alkyls, carbonyls, alkyl carbonyls, cyclopentadienyls, pyrrolyls, alkoxides, amidinates, imidazolyls, and mixtures thereof; and the metal is selected from Group 2 to 16 elements of the Periodic Table of the Elements; and, b) at least one aminoether selected from the group consisting of RRNRORNRR, RORNRR, O(CHCH)NR, RRNRN(CHCH)O, RRNRORN(CHCH)O, O(CHCH)NRORN(CHCH)O, and mixtures thereof, wherein Rare independently selected from group consisting of Clinear alkyl, Cbranched alkyl, Ccyclic alkyl, C-Caromatic, Calkylamine, Calkylaminoalkyl, Cether, C-Ccyclic ether, C-Ccyclic aminoether, and mixture thereof.

US Patent:

8642797, Feb 4, 2014

Filed:

Feb 18, 2011

Appl. No.:

13/030227

Inventors:

Sergei Vladimirovich Ivanov - Schnecksville PA, US
Xinjian Lei - Vista CA, US
Daniel P. Spence - Carlsbad CA, US

Assignee:

Air Products and Chemicals, Inc. - Allentown PA

International Classification:

C07F 7/00
C07F 11/00
C07F 15/00
C23C 16/00

US Classification:

556 56, 556 42, 556 45, 556 57, 556146, 534 15, 4272481, 4272557, 427569, 427582

Abstract:

Volatile metal amidate metal complexes are exemplified by bis(N-(tert-butyl)ethylamidate)bis(ethylmethylamido) titanium; (N-(tert-butyl)(tert-butyl)amidate)tris(ethylmethylamido) titanium; bis(N-(tert-butyl)(tert-butyl)amidate)bis(dimethylamido) titanium and (N-(tert-butyl)(tert-butyl)amidate)tris(dimethylamido) titanium. The term “volatile” refers to any precursor of this invention having vapor pressure above 0. 5 torr at temperature less than 200 C. Metal-containing film depositions using these metal amidate ligands are also described.

US Patent:

20110250126, Oct 13, 2011

Filed:

Oct 14, 2010

Appl. No.:

12/904421

Inventors:

Sergei Vladimirovich Ivanov - Schnecksville PA, US
Xinjian Lei - Vista CA, US
Hansong Cheng - Singapore, SG
Daniel P. Spence - Carlsbad CA, US
Moo-Sung Kim - Sungnam, KR

Assignee:

AIR PRODUCTS AND CHEMICALS, INC. - Allentown PA

International Classification:

C07F 7/00
C01G 23/047
C07F 7/28

US Classification:

423610, 556 54

Abstract:

The present invention is related to a family of Group 4 metal precursors represented by the formula:wherein M is a Group 4 metals of Ti, Zr, or Hf; wherein Ris selected from the group consisting of a linear or branched Calkyl and a Caryl, preferably methyl, ethyl or n-propyl; Ris selected from the group consisting of branched Calkyls, preferably iso-propyl, tert-butyl, sec-butyl, iso-butyl, or tert-amyl and a Caryl; Ris selected from the group consisting of hydrogen, Calkyls, and a Caryl, preferably hydrogen. In a preferred embodiment of this invention, the precursor is a liquid or a solid with a melting point below 60 C.

US Patent:

20110256314, Oct 20, 2011

Filed:

Oct 14, 2010

Appl. No.:

12/904461

Inventors:

Sergei Vladimirovich Ivanov - Schnecksville PA, US
Xinjian Lei - Vista CA, US
Hansong Cheng - Singapore, SG
Daniel P. Spence - Carlsbad CA, US
Moo-Sung Kim - Sungnam, KR

Assignee:

AIR PRODUCTS AND CHEMICALS, INC. - Allentown PA

International Classification:

C23C 16/18

US Classification:

4272481

Abstract:

A method for forming metal-containing films by atomic layer deposition using precursors of the formula:wherein M is Group 4 metals; wherein Rand Rcan be same or different selected from the group consisting of a linear or branched Calkyl and a Caryl; Rcan be selected from the group consisting of linear or branched Calkyls, preferably Calkyls and a Caryl; Ris selected from the group consisting of hydrogen, Calkyls, and a Caryl, preferably hydrogen; Ris selected from the group consisting of Clinear or branched alkyls, and a Caryl, preferably a methyl or ethyl group; X═O or N wherein when X═O, y=1 and Rare the same, when X═N, y=2 and each Rcan be the same or different.

US Patent:

20130180215, Jul 18, 2013

Filed:

Jan 10, 2013

Appl. No.:

13/738482

Inventors:

Air Products And Chemicals, Inc. - Allentown PA, US
Ronald Martin Pearlstein - San Marcos CA, US
Richard Ho - Anaheim CA, US
Xinjian Lei - Vista CA, US
Steven Gerard Mayorga - Oceanside CA, US
Daniel P. Spence - Carlsbad CA, US

Assignee:

AIR PRODUCTS AND CHEMICALS, INC. - Allentown PA

International Classification:

C09D 1/00
B65B 1/04

US Classification:

53467, 25218311

Abstract:

A stable formulation comprising a silicon containing precursor selected from an alkoxysilane, aryloxysilane, or alkylalkoxysilane and a catalyst compound comprising a haloalkoxyalkylsilane or haloaryloxyalkylsilane wherein the substitutents within the silicon-containing precursor and catalyst compound are the same are described herein. More specifically, the formulation comprises a silicon-containing precursor comprising an alkoxyalkylsilane or aryloxysilane having a formula of Si(OR)Rand a catalyst comprising haloalkoxyalkylsilane having a formula of XSi(OR)R; or a silicon-containing precursor comprising an alkoxysilane or aryloxysilane having a formula of R(RO)Si—R—Si(OR)Rand a catalyst comprising a haloalkoxyalkylsilane or haloaryloxyalkylsilane having a formula of (RO)R(X)Si—R—Si(OR)Rwherein at least one or all of the Rand Rsubstituents are the same in both the silicon-containing precursor and catalyst compound are described herein. The formulations can be used in semiconductor deposition process, such as for example, a flowable silicon oxide process.