Daniel E Sutton

US Patent:

6649525, Nov 18, 2003

Filed:

Jan 16, 2002

Appl. No.:

10/050485

Inventors:

Khoi A. Phan - San Jose CA
Jeffrey Erhardt - San Jose CA
Jerry Cheng - Milpitas CA
Richard J. Bartlett - Bonny Doon CA
Anthony P. Coniglio - San Jose CA
Wolfram Grundke - Dresden, DE
Carol M. Bradway - Austin TX
Daniel E. Sutton - Austin TX
Martin Mazur - Pulsnitz, DE

Assignee:

Advanced Micro Devices, Inc. - Sunnyvale CA

International Classification:

H01L 21461

US Classification:

438694, 438689, 438690, 438715, 438724, 438725

Abstract:

Methods and systems are disclosed for reducing resist residue defects in a semiconductor manufacturing process. The methods comprise appropriate adjustment of hardware, substrate, resist, developer, and process variables in order to remove resist residues from a semiconductor substrate structure in order to reduce resist residue defects therein. The method may comprise employing an anti reflective coating prior to applying a photo resist coating in a semiconductor manufacturing process. Also disclosed are methodologies for exhausting resist residue during development via a rinsing fluid.

US Patent:

6759179, Jul 6, 2004

Filed:

Jan 16, 2002

Appl. No.:

10/050417

Inventors:

Khoi A. Phan - San Jose CA
Jeffrey Erhardt - San Jose CA
Jerry Cheng - Milpistas CA
Richard J. Bartlett - Bonny Doon CA
Anthony P. Coniglio - San Jose CA
Wolfram Grundke - Dresden, DE
Carol M. Bradway - Austin TX
Daniel E. Sutton - Austin TX
Martin Mazur - Pulsnitz, DE

Assignee:

Advanced Micro Devices, Inc. - Sunnyvale CA

International Classification:

G03F 720

US Classification:

430311, 430326, 430327, 430329

Abstract:

Methods and systems are disclosed for reducing resist residue defects in a semiconductor manufacturing process. The methods comprise appropriate adjustment of hardware, substrate, resist, developer, and process variables in order to remove resist residues from a semiconductor substrate structure in order to reduce resist residue defects therein, including special vapor prime and development operations.