David C Allred

US Patent:

20120067337, Mar 22, 2012

Filed:

Sep 30, 2010

Appl. No.:

12/894491

Inventors:

David R. Hall - Provo UT, US
Craig Boswell - Provo UT, US
Eric Gardner - , US
David Allred - Provo UT, US

International Classification:

F24J 2/38
H01L 31/00
F24J 2/46

US Classification:

126600, 126623, 136252

Abstract:

In one aspect of the present invention, a structure comprises a plurality of reflective panels secured to the structure. Each reflective panel has an axis of rotation. A processing element controls an orientation of each reflective panel about its axis of rotation to direct solar energy within the structure.

US Patent:

20120067339, Mar 22, 2012

Filed:

Sep 21, 2010

Appl. No.:

12/886724

Inventors:

David R. Hall - Provo UT, US
Craig Boswell - Provo UT, US
Eric Gardner - Provo UT, US
David Allred - Provo UT, US

International Classification:

E04D 13/18
F24J 2/00

US Classification:

126621, 126714

Abstract:

In one aspect of the present invention, a structure comprises a plurality of reflective panels secured to the structure. Each reflective panel has an axis of rotation. A processing element controls an orientation of each reflective panel about its axis of rotation to direct solar energy within the structure.

US Patent:

52260674, Jul 6, 1993

Filed:

Mar 6, 1992

Appl. No.:

7/847588

Inventors:

David D. Allred - Provo UT
Fang Yuan - Provo UT
Irwin Rudich - Wilton CT

Assignee:

Brigham Young University - Provo UT
Multilayer Optics and X-Ray Technology, Inc. - Provo UT

International Classification:

G21K 100

US Classification:

378161

Abstract:

An optical device for interacting with x-ray radiation, wherein the device includes an optical element configured for use as part of a spectroscopy tube, proportional counter, Geiger counter, optical detector or similar optical instrument. An exposed surface of the optical element is coated with at least one bonded layer of boron hydride composition to protect against abrasion, corrosion and other forms of degradation, as well as to provide enhanced sealing of the Z material against leakage. Methods of bonding the desired coating to the optical element are also disclosed.

US Patent:

54580846, Oct 17, 1995

Filed:

Dec 9, 1993

Appl. No.:

8/164362

Inventors:

James M. Thorne - Provo UT
James K. Shurtleff - Sandy UT
David D. Allred - Provo UT
Raymond T. Perkins - Provo UT

Assignee:

Moxtek, Inc. - Provo UT

International Classification:

C30B 2516

US Classification:

117 89

Abstract:

X-ray wave diffraction devices are constructed using atomic layer epetaxy. A crystalline substrate is prepared with one or more surface areas on which multiple pairs of layers of material are to be deposited. These layers are then formed by atomic layer epetaxy on the surface areas of the substrate, one on top of another, with the material of each layer of each pair being selected to have a different index of refraction from that of the material of the other layer of each pair. The layers are formed so that the thickness of each layer of a pair is substantially the same as that of the corresponding layer of every other pair and so that x-ray waves impinging on the layers may be reflected therefrom. Layer pairs having a thickness of about 20 angstroms or less are formed on the substrate.

US Patent:

54854997, Jan 16, 1996

Filed:

Aug 5, 1994

Appl. No.:

8/286693

Inventors:

Hans K. Pew - Orem UT
David D. Allred - Provo UT

Assignee:

Moxtek, Inc. - Orem UT

International Classification:

G01T 132

US Classification:

378 84

Abstract:

X-ray dispersive and reflective structures utilizing special materials which exhibit improved performance in the specific ranges of interest. The structures are formed of alternating thin layers of uranium, uranium compound or uranium alloy and another spacer material consisting of elements or compounds with low absorptance chosen to match the wavelength of interest. These low index of refraction elements or compounds are those best suited for water window microscopy and nitrogen analysis, or are similar elements or compounds best suited for carbon analysis, boron analysis, and x-ray lithography. The structures are constructed using standard thin layer deposition techniques such as evaporation, sputtering, and CVD, or by novel methods which allow thinner and smoother layers to be deposited.