David D Baldwin

US Patent:

D452866, Jan 8, 2002

Filed:

Oct 16, 2000

Appl. No.:

29/131049

Inventors:

Syed S. Towheed - Herndon VA
David A. Baldwin - Rockville MD

Assignee:

Ensoport.com, Inc. - Washington DC

International Classification:

1402

US Classification:

D14441

US Patent:

6870164, Mar 22, 2005

Filed:

Oct 12, 2000

Appl. No.:

09/689476

Inventors:

David A. Baldwin - Annandale VA, US
Boris Ciorneiu - Great Falls VA, US
Harold R. Kaufman - LaPorte CO, US

Assignee:

Kaufman & Robinson, Inc. - Ft. Collins CO
Veeco Instruments Inc. - Plainview NY

International Classification:

H01J027/00

US Classification:

250423R

Abstract:

In accordance with one specific embodiment of the present invention, a Hall-current ion source is operated in a pulsed mode where the pulse duration is short compared to the time for discharge fluctuations to develop. For a reduced loss of neutral gas, the time between pulses should be less than, or about equal to, the fill time for the ionizable gas in the discharge volume of the Hall-current ion source.

US Patent:

7177506, Feb 13, 2007

Filed:

Apr 6, 2004

Appl. No.:

10/819085

Inventors:

David Alan Baldwin - Annandale VA, US
Michael Joseph Minnemann - Washington DC, US

Assignee:

4 Wave, Inc. - Sterling VA

International Classification:

G02B 6/26

US Classification:

385 52, 385 34, 385 35, 385 88

Abstract:

A bench-joining optical component and a first optical component are aligned on a first optical bench, and then rigidly coupled to the first bench, in order to form a first portion of an optical subassembly. Following completion of the first portion, all components in the first portion are pre-aligned and fixed with respect to each other, moving as a unit. A third optical component is aligned and permanently coupled to a second optical bench, in order to form a second portion of the optical sub-assembly. The first and second portions of optical sub-assembly are combined by positioning an exposed side of the bench joining optical component on the second bench, aligning the bench-joining optical component with the third optical component on the second bench, and permanently securing the bench-joining optical component to the second bench.

US Patent:

7316764, Jan 8, 2008

Filed:

Mar 29, 2004

Appl. No.:

10/812409

Inventors:

David Alan Baldwin - Annandale VA, US
Todd Lanier Hylton - Vienna VA, US

Assignee:

4 Wave, Inc. - Sterling VA

International Classification:

C23C 14/35

US Classification:

20419233, 20419232, 20429831, 20429832, 20419234, 20429034, 20429836

Abstract:

A system and method for performing sputter etching includes an ion source that generates an ion current that is directed at a substrate and an electron source that generates an electron current directed at the substrate. Biasing circuitry biases the substrate with an a-symmetric bi-polar DC voltage pulse signal. The biasing circuitry is formed from a positive voltage source with respect to ground, a negative voltage source with respect to ground and a high frequency switch. At least one current sensor, coupled to the biasing circuitry, monitors a positive current and a negative current from the substrate during one or more cycles of the a-symmetric bi-polar DC voltage pulse signal. A control system, coupled to the at least one current sensor, varies the ion current independently from the electron current. The ion and electron sources create a continuous plasma that is proximate the substrate and the biasing circuitry causes the substrate to alternatively attract ions and electrons from the plasma. The ions attracted from the plasma sputter etch the substrate.

US Patent:

8329002, Dec 11, 2012

Filed:

Mar 10, 2009

Appl. No.:

12/382192

Inventors:

Anthony Githinji - Centreville VA, US
Sami C. Antrazi - Fairfax VA, US
David A. Baldwin - Annandale VA, US

Assignee:

4Wave, Inc. - Sterling VA

International Classification:

C23C 14/00

US Classification:

20419221, 20419222, 438104

Abstract:

Methods for depositing an amorphous vanadium oxide (VO) film include vaporizing vanadium from a vanadium source while the a gas containing an oxygen species and a process modifying additive are in the chamber so as to deposit an amorphous VOfilm on the substrate, where x>0. The process modifying additive includes a gas flowing into the chamber or vaporized material from a target source. The additive may stabilize the deposition rate of VO, reduce resistivity, improve thickness control, and improve uniformity of thickness and resistivity. The thin film may be a nitrogen-enhanced, amorphous vanadium oxide (VON) film formed on a substrate, where x>y>0, and the film contains at least 0. 2 atomic % nitrogen. The film may be used in a device, such as a thermal or infrared sensor, or more particularly a bolometer.

US Patent:

20020131182, Sep 19, 2002

Filed:

Mar 16, 2001

Appl. No.:

09/810388

Inventors:

David Baldwin - Annandale VA, US
Todd Hylton - Great Falls VA, US

Assignee:

4Wave, Inc.

International Classification:

G02B003/00
C23C014/32
G02B025/00

US Classification:

359/642000, 204/192110, 204/298040, 204/298030, 204/192130

Abstract:

A system and method for controlling a deposition thickness distribution over a substrate. A motor rotates the substrate, and at least one sensor senses the deposition thickness of the substrate at two or more radii on the substrate. An actuator varies a shadow of a mask disposed over a target used to sputter material on the substrate. An ion source generates an ion beam that is directed toward the target. The mask is positioned between the ion source and the target, and selectively blocks ion current from the ion source from reaching the target. A process controller is coupled to the deposition thickness sensor and the actuator. In response to the sensed deposition thickness, the process controller varies the shadow of the mask with respect to the target to control the deposition thickness distribution over the substrate.

US Patent:

20030074438, Apr 17, 2003

Filed:

Oct 15, 2001

Appl. No.:

09/976090

Inventors:

David Baldwin - Rockville MD, US
Brian Hak - Bethesda MD, US

Assignee:

Ensoport Internetworks - Washington DC

International Classification:

G06F015/173

US Classification:

709/224000, 705/026000

Abstract:

A system for defining, implementing, and maintaining geographically disperse Internet Service Providers (ISP) from a centralized processing center. Customers of ISP are provisioned services that include, but are not limited to, internet access, e-mail access, and web-hosting space. System provides ability to define flexible service offerings at price points dependent on disparate market conditions. Further, the system generates billing data based on specified service offerings that is aggregated and presented to the customer in a formatted bill in local currency and in accordance to local customs. Collection for services rendered is performed by the system in conjunction with third party processing systems in local currencies.

US Patent:

20030078996, Apr 24, 2003

Filed:

Oct 15, 2001

Appl. No.:

09/975955

Inventors:

David Baldwin - Rockville MD, US

Assignee:

Ensoport Internetworks - Washington DC

International Classification:

G06F015/173
H04B001/74

US Classification:

709/220000, 714/004000

Abstract:

Disclosed is a method that defines a standard configuration useful for scaling services independently. This method makes efficient use of the Network, Server and Storage layers of a computing infrastructure in such a way that services can be clustered. These clustered services allow for redundancy in hardware and software and take full advantage of the hardware and software to increase customer performance and throughput. By making appropriate use of inexpensive servers, network attached storage, virtual local area networks, content switching and service clustering, Internet services can be scaled incrementally as customer demand grows. This method is efficient and relatively affordable.