David F Crow

US Patent:

6700950, Mar 2, 2004

Filed:

Oct 31, 2002

Appl. No.:

10/284757

Inventors:

Joseph Pellegrini - Jamaica Plain MA
David Crow - Maple Grove MN

Assignee:

Inficon LT Inc. - Cambridge MA

International Classification:

G21K 500

US Classification:

378 34, 382145

Abstract:

Methods and systems for controlling critical dimension (CD) in a process system, including computing an exposure dose error based on at least one output of the process system, normalizing the computed exposure dose error based on a target exposure dose, and providing an exposure dose to the process system based on at least one normalized exposure dose error. The target exposure dose can be associated with a process system characteristic(s) and can be updated based on normalized computed exposure dose errors.

US Patent:

6912435, Jun 28, 2005

Filed:

Aug 28, 2002

Appl. No.:

10/229575

Inventors:

Joseph Pellegrini - Jamaica Plain MA, US
David Crow - Maple Grove MN, US
Etienne Joubert - Melbourne Beach FL, US

Assignee:

Inficon LT Inc. - Cambridge MA

International Classification:

G06F019/00
G01B011/00

US Classification:

700121, 700110, 702 82, 702 84, 356401

Abstract:

Systems and methods for controlling at least one reticle-induced error in a process system, the systems and methods including adjusting measurement data associated with the process system, where the adjustment can be based on at least one reticle identifier (ID) associated with the measurement data, and reticle-induced error data associated with the at least one reticle ID. The methods and systems also include combining the adjusted measurement data to compute at least one control for the process system.

US Patent:

7089528, Aug 8, 2006

Filed:

Nov 26, 2003

Appl. No.:

10/723640

Inventors:

Joseph Pellegrini - Cohasset MA, US
David Crow - Maple Grove MN, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G06F 17/50

US Classification:

716 19, 716 21

Abstract:

Disclosed are methods and systems for estimating a reticle bias state for a process system, that include computing a difference between control data provided to the process system and error data based on a process system output(s), and estimating the reticle bias state based on weighted measures associated with the control data, the weighted measures being based on the number of data points included in the difference. The methods and systems include associating the reticle bias state estimate with a first quality factor, computing at least one weighted measure based on a number of data elements associated with the reticle, using the weighted measure(s) to provide a computed reticle bias state estimate and an associated computed quality factor, and, comparing the computed quality factor with the first quality factor to determine whether to update the reticle bias state estimate with the computed reticle bias state estimate.

US Patent:

7957826, Jun 7, 2011

Filed:

Aug 21, 2007

Appl. No.:

11/842515

Inventors:

Christopher P. Ausschnitt - Lexington MA, US
Richard H. Broberg - Wellesley MA, US
David A. Crow - Maple Grove MN, US
William A. Muth - Lagrangeville NY, US
Keith E. Roberts - Cambridge MA, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G06F 19/00

US Classification:

700121, 700110

Abstract:

A method for fabricating parts using a photolithography system, includes: performing a search of normalization data for an estimated dose operating point; and using the estimated dose operating point for fabrication of new parts.