David Quoc Do

Address:

3843 Walden Way, Dallas, TX 75287

Phone:

9726620841

VIN:

5TFRV58177X004891

Make:

TOYOTA

Model:

TUNDRA

Year:

2007

US Patent:

20120216833, Aug 30, 2012

Filed:

Feb 24, 2011

Appl. No.:

13/034386

Inventors:

Jiansheng Wang - Union City CA, US
Barbara Stanczyk - Morgan Hill CA, US
Wendell Boyd, JR. - Morgan Hill CA, US
Kevin A. Papke - , US
Joseph F. Sommers - San Jose CA, US
David Do - Milpitas CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

B08B 3/00

US Classification:

134 10, 134109

Abstract:

Embodiments of the present invention generally relate to a method and apparatus for ex-situ cleaning of a chamber component. More particularly, embodiments of the present invention generally relate to a method and apparatus for endpoint detection during ex-situ cleaning of a chamber component used in a semiconductor processing chamber. In one embodiment, a system for cleaning parts disposed in a liner with a cleaning fluid is provided. The system comprises a portable cart, a liquid particle counter (LPC) carried by the portable cart, the LPC configured for detachable coupling to a fluid outlet port formed through the liner, the LPC operable to sample rinsate solution exiting the line, and a pump carried by the portable cart and configured for fluid coupling to the liner in a detachable manner, the pump operable to recirculate rinsate solution through the liner.

US Patent:

20130167885, Jul 4, 2013

Filed:

Jan 24, 2013

Appl. No.:

13/748709

Inventors:

Jiansheng Wang - Union City CA, US
David Do - Milpitas CA, US
Satyanarayana Adamala - Fremont CA, US
Ronald Trahan - Beverton OR, US

Assignee:

QUANTUM GLOBAL TECHNOLOGIES, LLC - Dublin PA

International Classification:

B08B 3/04

US Classification:

134 56 R, 134115 R, 1341042, 134 941

Abstract:

Embodiments of the present invention generally relate to a method and apparatus for ex-situ cleaning of a chamber component part. In one embodiment, a system for cleaning component parts in a cleaning chemistry is provided. The system comprises a wet bench set-up comprising a cleaning vessel assembly for holding one or more component parts to be cleaned during a cleaning process and a detachable cleaning cart detachably coupled with the cleaning vessel assembly for supplying one or more cleaning chemistries to the cleaning vessel assembly during the cleaning process.