David M Medeiros

US Patent:

6346362, Feb 12, 2002

Filed:

Jun 15, 2000

Appl. No.:

09/593704

Inventors:

Ari Aviram - Croton-on-Hudson NY
C. Richard Guarnieri - Somers NY
Ranee W. Kwong - Wappingers Falls NY
David R. Medeiros - Yorktown NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7039

US Classification:

4302701, 525274, 525100, 5253288, 525393

Abstract:

Compositions comprising a polymer having silicon, germanium and/or tin; and a protecting group grafted onto a polymeric backbone are useful as resists and are sensitive to imaging irradiation while exhibiting enhanced resistance to reactive ion etching.

US Patent:

6420084, Jul 16, 2002

Filed:

Jun 23, 2000

Appl. No.:

09/602136

Inventors:

Marie Angelopoulos - Cortlandt Manor NY
Ari Aviram - Croton-on-Hudson NY
C. Richard Guarnieri - Somers NY
Ranee Kwong - Wappingers Falls NY
Robert N. Lang - Pleasant Valley NY
Arpan P. Mahorowala - White Plains NY
David R. Medeiros - Ossining NY
Wayne M. Moreau - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7004

US Classification:

4302701, 430313, 430326, 4302771, 4302781

Abstract:

The invention provides improved resist compositions and lithographic methods using the resist compositions of the invention. The resist compositions of the invention are acid-catalyzed resists which are characterized by the presence of an SiO-containing polymer. The invention also encompasses methods of forming patterned material layers (especially conductive, semiconductive, or magnetic material structures) using the combination of the SiO-containing resist and a halogen compound-containing pattern transfer etchant where the halogen is Cl, Br or I.

US Patent:

6495825, Dec 17, 2002

Filed:

Dec 22, 1999

Appl. No.:

09/469373

Inventors:

Mark S. Chace - Beacon NY
John E. Darney - Pine Bush NY
David R. Medeiros - Ossining NY
Wayne M. Moreau - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01J 4900

US Classification:

250288

Abstract:

Real-time analysis of output volatiles upon UV exposure is achieved using a laboratory scale apparatus. The methods and apparatus use external or internal radiation sources, especially broad band external UV radiation. The apparatus and methods of the invention are especially useful in the analysis and screening of photoresist materials. The apparatus preferably uses FTIR or MS analysis.

US Patent:

6509136, Jan 21, 2003

Filed:

Jun 27, 2001

Appl. No.:

09/893267

Inventors:

Dario L. Goldfarb - Putnam Valley NY
Kenneth John McCullough - Fishkill NY
David R. Medeiros - Ossining NY
Wayne M. Moreau - Wappinger NY
John P. Simons - Wappingers Falls NY
Charles J. Taft - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk CA

International Classification:

G03F 7027

US Classification:

4302721, 4302701, 430327, 430331, 430935, 427336, 427341, 427352, 427541

Abstract:

A process of drying a cast film polymeric disposed upon a workpiece. In this process a cast polymeric film, which includes a volatile organic compound therein, disposed on a workpiece, is contacted with an extraction agent which may be liquid carbon dioxide or supercritical carbon dioxide.

US Patent:

6543617, Apr 8, 2003

Filed:

Mar 9, 2001

Appl. No.:

09/802471

Inventors:

Marie Angelopoulos - Cortlandt Manor NY
Ranee Wai-Ling Kwong - Wappingers Falls NY
David Robert Medeiros - Ossining NY
Wayne Martin Moreau - Wappingers Falls NY
Karen Elizabeth Petrillo - Mahopac NY
Herman Russell Wendt - San Jose CA
Christopher Karl Magg - Essex Junction VT

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B65D 8500

US Classification:

206701, 206710

Abstract:

The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitvity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.

US Patent:

6586156, Jul 1, 2003

Filed:

Jul 17, 2001

Appl. No.:

09/907392

Inventors:

Marie Angelopoulos - Cortlandt Manor NY
Dai Junyan - Ithaca NY
Ranee W. Kwong - Wappingers Falls NY
Robert N. Lang - Pleasant Valley NY
Arpan P. Mahorowala - Bronxville NY
David R. Medeiros - Ossining NY
Wayne M. Moreau - Wappingers Falls NY
Karen E. Petrillo - Mahopac NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7004

US Classification:

4302701, 430313, 430326, 430905, 526266, 526279, 526319

Abstract:

A chemically amplified (CA) photoresist system wherein a terpolymer containing ketal/phenolic/silicon based sidechains is provided. Among other things, the terpolymers provide for improved bake technologies. In another aspect a process for lithographic treatment of a substrate by means of ketal/phenolic/silicon based compositions and corresponding processes for the production of an object, particularly an electronic component are provided.

US Patent:

6641971, Nov 4, 2003

Filed:

Jun 15, 2001

Appl. No.:

09/882234

Inventors:

David R. Medeiros - Ossining NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7023

US Classification:

430189, 4302701, 430313, 430317, 430323, 430905

Abstract:

A chemically amplified resist composition comprises an aqueous base soluble polymer or copolymer having one or more polar functional groups, wherein at least one of the functional groups is protected with a cycloaliphatic silyl ketal group but may also include other protecting groups as well as unprotected acidic functionalities. A ratio of protected to unprotected acidic functionalities is preferably selected to most effectively modulate a solubility of the resist composition in an aqueous base or other developer. The resist composition further comprises an acid generator, preferably a photoacid generator (PAG), and a casting solvent, and may also include other components, such as, a base additive and/or surfactant.

US Patent:

6673521, Jan 6, 2004

Filed:

Dec 12, 2000

Appl. No.:

09/735404

Inventors:

Wayne M. Moreau - Wappingers Falls NY
Kenneth J. McCullough - Fishkill NY
David R. Medeiros - Ossining NY
John P. Simons - Wappingers Falls NY
Charles J. Taft - Wappingers Falls NY

Assignee:

lnternational Business Machines Corporation - Armonk NY

International Classification:

G03F 726

US Classification:

430315, 430311, 430313

Abstract:

A process of silylation of object surfaces using a mixture of a silylation agent in admixture with an inert liquified gas, such as carbon dioxide.