David Todd Nagel

US Patent:

8051697, Nov 8, 2011

Filed:

Oct 16, 2008

Appl. No.:

12/252537

Inventors:

David J. Nagel - Falls Church VA, US
R. Andrew McGill - Lorton VA, US
Patrick M. Mills - Arlington VA, US
Rekha Pai - Alexandria VA, US

Assignee:

The George Washington University - Washington DC
The United States of America as represented by the Secretary of the Navy - Washington DC

International Classification:

G01N 37/00

US Classification:

73 103, 73 102, 73 107

Abstract:

The present invention relates to chemical and bioanalytical sensors and sensor systems, particularly to systems incorporating a calibration device for sensors where the calibration device is comprised of an array of micromachined MEMS structures and materials for trapping and retaining calibrant or interferant materials until they are needed and released quantitatively using structure operatively associated with the array.

US Patent:

8138913, Mar 20, 2012

Filed:

Jan 22, 2008

Appl. No.:

12/017588

Inventors:

David J. Nagel - Falls Church VA, US
Justin C. Whiton - Falls Church VA, US

Assignee:

System Planning Corporation - Arlington VA

International Classification:

G08B 1/08
G08B 23/00
B65D 73/00

US Classification:

34053913, 3406935, 206461

Abstract:

A system and method for a panel system containing embedded electronic elements providing both housing for the electronics and structural support. A preferred embodiment of the system is for a container security system, which is constructed into or conforming onto the roof, walls, door, or base of a cargo container is provided. The panel system may consist of a variety of electronic elements, batteries or power elements, sensors, a processing element to collect the sensor data, and a communications element to transmit outside of the container.

US Patent:

20120261256, Oct 18, 2012

Filed:

Feb 22, 2012

Appl. No.:

13/402592

Inventors:

Chia-Pin CHANG - Singapore, SG
David J. Nagel - Falls Church VA, US

International Classification:

B01L 3/00
G01N 21/59
G01N 27/26
G01N 21/76
G01N 27/00
G01N 21/75
G01N 21/64

US Classification:

204400, 422547, 422 8205, 422 8209, 422 8208, 422 52, 422 8201, 422 8202

Abstract:

This invention has two synergistic elements for simultaneous use in point-of-care or field analyses of diverse substances important to clinical medicine and other applications. The first element is a sample holder in which are stored the several reagents need for quantification of target molecules. The onboard storage of reagents in a water soluble plastic obviates the need for purchase, storage, measuring and mixing of the required reagents prior to analyses. The second part of the invention is a compact hand-held analyzer made of modern miniature optical components, into which the holder is inserted right after it is loaded with a sample by capillary action. The combination of the holder and analyzer permits analyses that are ten times faster than those done with current analyzers, and equally accurate. Analyses can be performed by diverse people, who require only a few minutes of training in the use of the entire invention.

US Patent:

41840780, Jan 15, 1980

Filed:

Aug 15, 1978

Appl. No.:

5/933928

Inventors:

David J. Nagel - Falls Church VA
Martin C. Peckerar - Bowie MD

Assignee:

The United States of America as represented by the Secretary of the Navy - Washington DC

International Classification:

G03B 4116

US Classification:

250492A

Abstract:

A method and means for x-ray lithography which utilizes means for producing n a vacuum system a high-temperature plasma from which soft x-rays are emitted. The x-rays pass through a mask exposing an x-ray resist on a substrate to produce the desired pattern on the substrate. The x-ray spectrum has a significant energy in the 1-5 keV range. These x-rays pass through the support layer of the mask, stop in the pattern material (gold) of the mask or, where the pattern material is lacking, are absorbed adequately by the x-ray resist. Since there is very little energy above 5 keV, there is little if any substrate damage due to the x-rays.

US Patent:

RE339920, Jul 14, 1992

Filed:

May 9, 1990

Appl. No.:

7/520946

Inventors:

David J. Nagel - Falls Church VA
Martin C. Peckerar - Silver Spring MD

Assignee:

The United States of America as represented by the Secretary of the Navy - Washington DC

International Classification:

G21K 504

US Classification:

378 34

Abstract:

A method and means for x-ray lithography which utilizes means for producing in a vacuum system a high-temperature plasma from which soft x-rays are emitted. The x-rays pass through a mask exposing an x-ray resist on a substrate to produce the desired pattern on the substrate. The x-ray spectrum has a significant energy in the 1-5 keV range. These x-rays pass through the support layer of the mask, stop in the pattern material (gold) of the mask or, where the pattern material is lacking, are absorbed adequately by the x-ray resist. Since there is very little energy above 5 keV, there is little if any substrate damage due to the x-rays.