David M Rasch

age ~65

from Cincinnati, OH

Also known as:
  • David Mark Rasch
  • Dave M Rasch
Phone and address:
4870 Orland Ave, Cincinnati, OH 45244
5135282145

David Rasch Phones & Addresses

  • 4870 Orland Ave, Cincinnati, OH 45244 • 5135282145 • 5135285561
  • 566 Forest Ridge Ct, Cincinnati, OH 45244 • 5135285561
  • Newark, OH
  • 4870 Orland Rd, Cincinnati, OH 45244 • 5135282145

Work

  • Position:
    Healthcare Support Occupations

Education

  • Degree:
    Bachelor's degree or higher

Us Patents

  • Process For Producing Deep-Nested Embossed Paper Products

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  • US Patent:
    7413629, Aug 19, 2008
  • Filed:
    Jun 8, 2005
  • Appl. No.:
    11/147698
  • Inventors:
    Wayne Robert Fisher - Cincinnati OH, US
    Donn Nathan Boatman - Union KY, US
    David Mark Rasch - Cincinnati OH, US
  • Assignee:
    The Procter & Gamble Company - Cincinnati OH
  • International Classification:
    D21F 11/00
    D21H 27/30
    B31F 1/07
  • US Classification:
    162117, 162204, 162205, 162207, 162123, 162132, 156209, 428156, 428172
  • Abstract:
    The present invention relates to processes for producing a deep-nested embossed paper products. The invention relates to a process for producing a deep-nested embossed paper products comprising one or more plies of paper where the resulting embossed ply or plies of paper comprise a plurality of embossments having an average embossment height of at least about 650 μm and have a high finished product wet burst strength relative to the unembossed wet strength. The present invention relates to a process for producing deep-nested embossed paper products comprising the steps of a) delivering one or more plies of paper to a deep-nested embossing process, b) conditioning the one or more plies of paper, wherein the conditioning step comprises heating the one or more plies of paper, adding moisture to the one or more plies of paper, or both heating and adding moisture to the one or more plies of paper, and c) embossing the one or more plies of the paper where the resulting embossed ply or plies of paper comprise a plurality of embossments having an average embossment height of at least about 650 μm.
  • Embossing Process Including Discrete And Linear Embossing Elements

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  • US Patent:
    7435316, Oct 14, 2008
  • Filed:
    Jun 8, 2005
  • Appl. No.:
    11/147903
  • Inventors:
    Donn Nathan Boatman - Union KY, US
    Kevin Benson McNeil - Loveland OH, US
    David Mark Rasch - Cincinnati OH, US
    Kevin Mitchell Wiwi - West Chester OH, US
    Wayne Robert Fisher - Cincinnati OH, US
  • Assignee:
    The Procter & Gamble Company - Cincinnati OH
  • International Classification:
    B31F 1/07
  • US Classification:
    162362, 162117
  • Abstract:
    An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0. 01 mm.
  • Embossing Process Including Discrete And Linear Embossing Elements

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  • US Patent:
    7524404, Apr 28, 2009
  • Filed:
    Jun 8, 2005
  • Appl. No.:
    11/147873
  • Inventors:
    Donn Nathan Boatman - Union KY, US
    Kevin Benson McNeil - Loveland OH, US
    David Mark Rasch - Cincinnati OH, US
    Wayne Robert Fisher - Cincinnati OH, US
  • Assignee:
    The Procter & Gamble Company - Cincinnati OH
  • International Classification:
    D21H 27/02
    D21H 27/40
    B31F 1/07
  • US Classification:
    162362, 162117, 162132, 162205, 101 23, 101 28, 101 32, 428174, 156209
  • Abstract:
    An apparatus for producing an embossed product including a first embossing member having a plurality of discrete embossing elements disposed in a first non-random pattern having at least one first single pattern unit. The total area of the distal ends of the discrete embossing elements in the first single pattern unit is less than about 5. 0 cm. The apparatus also includes a second embossing member having a plurality of linear embossing elements disposed in a second non-random pattern having at least one second single pattern unit. The total area of the second distal ends in the second single pattern unit is less than about 10 cm. The second non-random pattern is coordinated with the first non-random pattern such that when engaged with each other the first single pattern unit and the second single pattern unit make up an embossing pattern single pattern unit.
  • Embossing Process Including Discrete And Linear Embossing Elements

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  • US Patent:
    7887676, Feb 15, 2011
  • Filed:
    Jul 11, 2008
  • Appl. No.:
    12/171615
  • Inventors:
    Donn Nathan Boatman - Union KY, US
    Kevin Benson McNeil - Loveland OH, US
    David Mark Rasch - Cincinnati OH, US
    Kevin Mitchell Wiwi - West Chester OH, US
    Wayne Robert Fisher - Cincinnati OH, US
  • Assignee:
    The Procter & Gamble Company - Cincinnati OH
  • International Classification:
    D21H 27/30
    B31F 1/07
  • US Classification:
    162362, 101 23, 425408
  • Abstract:
    An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0. 01 mm.
  • Embossing Process Including Discrete And Linear Embossing Elements

    view source
  • US Patent:
    7918972, Apr 5, 2011
  • Filed:
    Jul 11, 2008
  • Appl. No.:
    12/171632
  • Inventors:
    Donn Nathan Boatman - Union KY, US
    Kevin Benson McNeil - Loveland OH, US
    David Mark Rasch - Cincinnati OH, US
    Kevin Mitchell Wiwi - West Chester OH, US
    Wayne Robert Fisher - Cincinnati OH, US
  • Assignee:
    The Procter & Gamble Company - Cincinnati OH
  • International Classification:
    B31F 1/07
  • US Classification:
    162362, 162117
  • Abstract:
    An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0. 01 mm.
  • Embossing Process Including Discrete And Linear Embossing Elements

    view source
  • US Patent:
    8007640, Aug 30, 2011
  • Filed:
    Jul 11, 2008
  • Appl. No.:
    12/171589
  • Inventors:
    Donn Nathan Boatman - Union KY, US
    Kevin Benson McNeil - Loveland OH, US
    David Mark Rasch - Cincinnati OH, US
    Kevin Mitchell Wiwi - West Chester OH, US
    Wayne Robert Fisher - Cincinnati OH, US
  • Assignee:
    The Procter & Gamble Company - Cincinnati OH
  • International Classification:
    B31F 1/07
  • US Classification:
    162362, 162117
  • Abstract:
    An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0. 01 mm.
  • Embossing Process Including Discrete And Linear Embossing Elements

    view source
  • US Patent:
    8083893, Dec 27, 2011
  • Filed:
    Jul 11, 2008
  • Appl. No.:
    12/171652
  • Inventors:
    Donn Nathan Boatman - Union KY, US
    Kevin Benson McNeil - Loveland OH, US
    David Mark Rasch - Cincinnati OH, US
    Kevin Mitchell Wiwi - West Chester OH, US
    Wayne Robert Fisher - Cincinnati OH, US
  • Assignee:
    The Procter & Gamble Company - Cincinnati OH
  • International Classification:
    D21H 27/02
    D21H 27/40
    B31F 1/07
  • US Classification:
    162117, 162362, 162132, 162205, 101 32, 101 23, 101 28
  • Abstract:
    A method for producing a deep-nested embossed product is disclosed. The method comprises the steps of: a) providing an embossing apparatus having mating first and second embossing members; b) providing the first embossing member with a plurality of discrete embossing elements in a non-random pattern; c) providing the second embossing member with at least one linear embossing element; d) coordinating the at least one linear embossing element with the non-random pattern of first embossing elements; e) aligning the first embossing member and the second embossing member so that the non-random pattern of first embossing elements nest with the at least one linear embossing element to an engagement depth of greater than about 0. 01 mm; f) providing one or more plies of material to the embossing apparatus; and, g) passing the one or more plies of the material between the first and second embossing members to produce the deep-nested embossed product.
  • Pseudo-Apertured Fibrous Structure

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  • US Patent:
    20030044573, Mar 6, 2003
  • Filed:
    Sep 4, 2001
  • Appl. No.:
    09/945996
  • Inventors:
    David Rasch - Cincinnati OH, US
    Ward Ostendorf - West Chester OH, US
  • International Classification:
    B32B003/10
    D04H001/00
    D04H003/00
  • US Classification:
    428/131000, 428/218000, 442/409000, 264/504000, 264/555000
  • Abstract:
    A multi-density fibrous structure comprising a plurality of discrete pseudo-apertures disposed therein. The pseudo-apertures have individual areas of at least about 3 square millimeters and a basis weight from about 0.1 to about 5 gram per square meter. The fibrous structure can have from about 9,000 to about 90,000 pseudo-apertures per square meter.

Resumes

David Rasch Photo 1

David Rasch

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Location:
United States

Flickr

Youtube

Oh Hey - @ Home rehearsal- Celine Farach, Ant...

  • Category:
    Entertainment
  • Uploaded:
    19 Mar, 2011
  • Duration:
    3m 50s

Atem Sax Quartet - F. Donatoni - Rasch (1990)

Franco Donatoni - RASCH (1990) for Saxophone Quartet Atem Saxophone Qu...

  • Category:
    Music
  • Uploaded:
    30 Aug, 2009
  • Duration:
    5m 53s

Phenix - War Games

Official Soundtrack to the Movie "Red Santa Down" (more info @ www.red...

  • Category:
    Music
  • Uploaded:
    27 Sep, 2008
  • Duration:
    3m 19s

Para Tommi Tus Ojos de David Carvazos

Otra de mis creaciones, Gracias a mi mejor amiga en el mundo entero: L...

  • Category:
    People & Blogs
  • Uploaded:
    02 Aug, 2009
  • Duration:
    4m 1s

Divine Secrets of the Ya - Ya Sisterhood (Par...

Mothers. Daughters. The never-ending story of good vs. evil. Download ...

  • Category:
    Entertainment
  • Uploaded:
    26 Apr, 2009
  • Duration:
    10m 2s

Divine Secrets of the Ya - Ya Sisterhood (Par...

Mothers. Daughters. The never-ending story of good vs. evil. THE USE O...

  • Category:
    Entertainment
  • Uploaded:
    26 Apr, 2009
  • Duration:
    10m

Divine Secrets of the Ya - Ya Sisterhood (Par...

Mothers. Daughters. The never-ending story of good vs. evil. Download ...

  • Category:
    Entertainment
  • Uploaded:
    26 Apr, 2009
  • Duration:
    10m

In the Loop Q&A - LA Film Fest

Part of the Q&A session after LA Film Festival screening of "In The Lo...

  • Category:
    Entertainment
  • Uploaded:
    21 Jun, 2009
  • Duration:
    9m 48s

Classmates

David Rasch Photo 10

David Rasch

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Schools:
Jewish Educational Center High School Elizabeth NJ 1980-1984
Community:
Stephanie Enis
David Rasch Photo 11

David Rasch

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Schools:
Colts Neck High School Colts Neck NJ 1998-2002
David Rasch Photo 12

David Rasch

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Schools:
Longfellow Elementary School Chicago IL 1955-1962
David Rasch Photo 13

David Rasch

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Schools:
Longfellow Elementary School Chicago IL 1955-1960, Everett Elementary School Chicago IL 1960-1964, Nathan Davis Elementary School Chicago IL 1962-1964, Gunsaulus Scholastic Academy Chicago IL 1964-1966
David Rasch Photo 14

Jewish Educational Center...

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Graduates:
Joshua Rahmani (1998-2002),
Jason Freudenberger (1992-1996),
Mark Breslow (1966-1971),
David Rasch (1980-1984)

Facebook

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David Rasch

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David Rasch Photo 16

David Rasch

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David Rasch Photo 17

David A Rasch

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David Rasch Photo 18

David Rasch

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David Rasch Photo 19

David Rasch

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David Rasch

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David Rasch

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David Rasch

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Googleplus

David Rasch Photo 23

David Rasch

Education:
Newport Harbor Highshool, Arizona State University - Biology, Creighton University - Biology/Literature
About:
An American making a life in Norway, a cook, a tech geek, with an overdeveloped sense of curiosity.
Tagline:
An American in Norway
David Rasch Photo 24

David Rasch

Work:
Esbjerg Kommune - Psykolog (2010)
Education:
University of Aarhus - Psykologi, University of New Brunswick - Psychology
David Rasch Photo 25

David Rasch

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David Rasch

David Rasch Photo 27

David Rasch

David Rasch Photo 28

David Rasch

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David Rasch

David Rasch Photo 30

David Rasch

Plaxo

David Rasch Photo 31

david Rasch

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Past: Facility Operations Supervisor at University of Minnesota housing, Facility Operations... I've been a professional executive housekeeper all my working life, excluding the three years I was a 13B in the army. I love it! I went so far as to the person... I've been a professional executive housekeeper all my working life, excluding the three years I was a 13B in the army. I love it! I went so far as to the person to create the first housekeeping department at Mall of America.
David Rasch Photo 32

David Rasch

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owner/partner at Strategies LLC

Myspace

David Rasch Photo 33

David Rasch

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Locality:
imperail, Missouri
Gender:
Male
Birthday:
1949
David Rasch Photo 34

David Rasch

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Locality:
Nordrhein-Westfalen, Germany
Gender:
Male
Birthday:
1949
David Rasch Photo 35

david rasch

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Locality:
WATERTOWN, Wisconsin
Gender:
Male
Birthday:
1938
David Rasch Photo 36

David Rasch

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Locality:
Lake Geneva, Wisconsin
Gender:
Male
Birthday:
1927

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