David Robert Schaefer

US Patent:

7475799, Jan 13, 2009

Filed:

May 24, 2005

Appl. No.:

11/135695

Inventors:

David R. Schaefer - Seneca SC, US

Assignee:

Lakeland Gear, Inc. - Candler NC

International Classification:

B60R 9/00

US Classification:

224493, 224488, 224494

Abstract:

A device to increase the stowage capacity of vehicles that comprises a fabric, box-like or cylindrical shaped receptacle and primary support straps and tie down straps to mount the receptacle on the rear or side of a vehicle and to minimize sway of the receptacle when the vehicle is in motion.

US Patent:

7622051, Nov 24, 2009

Filed:

Mar 27, 2003

Appl. No.:

10/401100

Inventors:

David M. Schaefer - Sunnyvale CA, US
Gowri P. Kota - Fremont CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

B44C 1/22
H01L 21/302

US Classification:

216 67, 216 74, 216 79, 438706, 438710

Abstract:

A method of etching a substrate in a plasma processing chamber is disclosed. The method includes introducing the substrate having thereon an underlying layer, an anti-reflective layer above the underlying layer, and a photo-resist layer above the anti-reflective layer into the chamber. The method also includes flowing a gas mixture into the chamber, the gas mixture includes a flow of a hydrofluorocarbon gas, a flow of fluorocarbon gas, a flow of a halogen-containing gas other than the hydrofluorocarbon gas, and a flow of oxygen gas. The method further includes striking a plasma from the gas mixture. The method additionally includes etching at least through the anti-reflective layer with the plasma.

US Patent:

20130052339, Feb 28, 2013

Filed:

Aug 26, 2011

Appl. No.:

13/219540

Inventors:

Hong Shih - Santa Clara CA, US
Tuochuan Huang - Saratoga CA, US
David Schaefer - Fremont CA, US
Ambarish Chhatre - San Ramon CA, US
John Daugherty - Fremont CA, US
MingHang Wu - Renton WA, US
Clifford La Croix - Livermore CA, US

International Classification:

B05D 5/12

US Classification:

4271264, 427 58

Abstract:

A method is provided for treating a bipolar ESC having a front surface and a back surface, the front surface including an anodized layer. The method includes eliminating the anodized layer, disposing a new anodized layer onto the front surface, and treating the new anodized layer with water to seal the new anodized layer.

US Patent:

20130098554, Apr 25, 2013

Filed:

Oct 25, 2011

Appl. No.:

13/280750

Inventors:

Rish Chhatre - San Jose CA, US
David Schaefer - Fremont CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

C23F 1/08

US Classification:

15634527, 15634533

Abstract:

An improved gas injection assembly for mounting in a central bore of a dielectric window of an inductively coupled plasma chamber includes a window having a central bore and cylindrical recess configured to receive an annular insert having a bayonet opening. The gas injector assembly includes a gas injector, an RF shield surrounding the gas injector, and a faceplate surrounding the RF shield, the faceplate including projections at the bottom thereof for engaging the bayonet opening in the annular insert. The window and gas injection assembly are designed to avoid chipping of the window which is typically made of quartz and in prior mounting arrangements the window has a bayonet opening machined therein. Due to the brittle nature of the quartz material, the machined bayonet opening was subject to chipping when the gas injector assembly was inserted into the bayonet opening.

US Patent:

20130117986, May 16, 2013

Filed:

Nov 10, 2011

Appl. No.:

13/293972

Inventors:

Rish Chhatre - San Jose CA, US
David Schaefer - Fremont CA, US
Sung Lee - Pleasanton CA, US
Dan Haber - Campbell CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

B23P 11/00
B23P 19/00

US Classification:

29428, 29700

Abstract:

A kit comprising an installation fixture, a plurality of mechanical fasteners and an embedding tool is provided which allows for an elastomer band to be disposed in a mounting groove around a semiconductor substrate support in a manner that relieves the internal stresses of the elastomer band, leading to an elastomer band with a longer operational lifetime. The installation fixture is secured to a substrate support with mechanical fasteners. An elastomer band is placed around an outer circumference of the installation fixture and rotated back and forth to relieve internal stresses of the elastomer band. The fixture is inverted and the elastomer band is slid vertically off the fixture and into the mounting groove. An embedding tool can be used to completely insert the elastomer band into the mounting groove.

US Patent:

62574701, Jul 10, 2001

Filed:

Mar 8, 2000

Appl. No.:

9/520480

Inventors:

David R. Schaefer - Scotts Valley CA

International Classification:

B60R 900

US Classification:

224318

Abstract:

A vehicle cargo carrying device, for transporting and protecting articles on the roof of a vehicle comprises a one piece cargo bag with an aperture with a plurality of pieces of hook and loop fastening material operably positioned in proximity thereto. The aperture has a plurality of pieces of hook and loop fastening material sewn into an outer surface of the bag in proximity to the aperture, and a pair of pieces of hook and loop fastening material sewn are along an inner edge of the interior of the aperture. A strapping system is provided for securing the one piece cargo bag to a roof of a vehicle. One or more handles may be attached to the outer surface of the device for carrying and transport of the device. An inner liner system may be provided for further waterproofing and protection of articles being transported.

US Patent:

61716871, Jan 9, 2001

Filed:

Oct 18, 1999

Appl. No.:

9/420042

Inventors:

Roger Leung - San Jose CA
David Schaefer - San Jose CA
John Sikonia - Morgan Hill CA

Assignee:

Honeywell International Inc. - Morristown NJ

International Classification:

B32B 326

US Classification:

4283044

Abstract:

In accordance with the present invention, a low dielectric constant structural layer is produced having increased mechanical strength and having a plurality of voids that comprises a substrate layer; a low dielectric structural layer juxtaposing the substrate layer; and an infiltrating layer comprising an infiltrating material having a volatile component and a reinforcing component juxtaposing the structural layer and coating at least some of the plurality of voids. Also, methods are provided in which the mechanical strength of a structural layer having a plurality of voids is increased by a) depositing the structural layer on a substrate layer; b) providing an infiltrating material having a volatile component and a reinforcing component; c) introducing the infiltrating material into at least some of the plurality of voids; and d) treating the infiltrating material such that the structural strength is increased by a substantial amount.

US Patent:

20160312351, Oct 27, 2016

Filed:

Apr 27, 2015

Appl. No.:

14/697454

Inventors:

- Fremont CA, US
Russell ORMOND - San Jose CA, US
Nash W. ANDERSON - Mountain View CA, US
David M. SCHAEFER - Fremont CA, US

International Classification:

C23C 4/134
C23C 4/06
C23C 4/11
H01L 21/66
H01L 21/67

Abstract:

In accordance with this disclosure, there are provided several inventions, including a substrate processing apparatus with multi-layer surfaces configured to face the plasma and resist against corrosion. These multi-layer surfaces may in one example include a base layer of aluminum, anodized aluminum, or quartz, a second layer of stabilized zirconia, and a second layer of a yttrium-aluminum composite such as yttrium aluminum garnet (YAG).