David M Stern

US Patent:

6480324, Nov 12, 2002

Filed:

Jun 14, 2001

Appl. No.:

09/880058

Inventors:

Calvin F. Quate - Stanford CA
David Stern - Mountain View CA

Assignee:

Affymetrix, Inc. - Santa Clara CA

International Classification:

G02B 2608

US Classification:

359298, 359291, 359223, 359224, 348203, 345 84

Abstract:

An improved optical photolithography system and method provides predetermined light patterns generated by a direct write system without the use of photomasks. The Direct Write System provides predetermined light patterns projected on the surface of a substrate (e. g. , a wafer) by using a computer controlled component for dynamically generating the predetermined light pattern, e. g. , a spatial light modulator. Image patterns are stored in a computer and through electronic control of the spatial light modulator directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask. Thus, in the Direct Write System each pixel is illuminated with an optical beam of suitable intensity and the imaging (printing) of an individual feature is determined by computer control of the spatial light modulator at each photolithographic step without the use of a photomask. The Direct Write System including a spatial light modulator is particularly useful in the synthesis of DNA arrays and provides an efficient element for polymer array synthesis by using spatial light modulators to generate a predetermined light pattern that defines the image patterns of a polymer array to be deprotected.

US Patent:

6545264, Apr 8, 2003

Filed:

Aug 26, 1999

Appl. No.:

09/383986

Inventors:

David Stern - Mountain View CA

Assignee:

Affymetrix, Inc. - Santa Clara CA

International Classification:

H01J 314

US Classification:

250234, 250216, 2504581, 359391

Abstract:

The present invention provides a scanning confocal microscope image detection system having a simple and inexpensive objective lens and a high acceleration/high speed voice coil driven translation system. The objective lens provides high light collection efficiency at low cost. The voice coil provides improved acceleration for fast scanning of at least one axis (scanning direction; fast scan axis) of a polymer array that can be used effectively with the inexpensive objective lens having high light collection efficiency. In one embodiment the translation stage includes a voice coil, a linear slide, and a light weight bracket connecting the voice coil to the linear slide. The bracket is rigid and designed to support a polymer array to be scanned or a turning prism and objective lens. Thus, the present invention provides systems and methods for high speed low cost scanning of, for example, polymer arrays, i. e. , high performance cost effective polymer array scanning using a voice coil driven translation stage.

US Patent:

6597000, Jul 22, 2003

Filed:

Jul 8, 2002

Appl. No.:

10/191420

Inventors:

David Stern - Mountain View CA

Assignee:

Affymetrix, Inc. - Santa Clara CA

International Classification:

G01N 2164

US Classification:

2504581, 2504612

Abstract:

Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U. S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing marked regions of sample to radiation from a source and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.

US Patent:

8233735, Jul 31, 2012

Filed:

Sep 17, 2008

Appl. No.:

12/212320

Inventors:

David Stern - Mountain View CA, US
Peter Fiekowsky - Los Altos CA, US

Assignee:

Affymetrix, Inc. - Santa Clara CA

International Classification:

G06K 9/40
G06K 9/62
G06K 9/00
G01N 21/00

US Classification:

382255, 382141, 382181, 382133, 382224, 356344

Abstract:

Fluorescently marked targets bind to a substrate synthesized with polymer sequences at known locations. The targets are detected by exposing selected regions of the substrate to light from a light source and detecting the photons from the light fluoresced therefrom, and repeating the steps of exposure and detection until the substrate is completely examined. The resulting data can be used to determine binding affinity of the targets to specific polymer sequences.

US Patent:

8351026, Jan 8, 2013

Filed:

Apr 21, 2006

Appl. No.:

11/379641

Inventors:

David Stern - Mountain View CA, US

Assignee:

Affymetrix, Inc. - Santa Clara CA

International Classification:

G01N 21/00

US Classification:

356 73

Abstract:

An embodiment of a system for acquiring images of a probe array is described that comprises a first light emitting diode that provides light comprising a first range of wavelengths outside of an excitation spectrum; a second light emitting diode that provides light comprising a second range of wavelengths inside of the excitation spectrum; and a detector that detects one or more wavelengths in the first range of wavelengths, wherein the first range of wavelengths comprise light wavelengths emitted from fluorescent molecules associated with one or more probes of the probe array in response to the second range of wavelengths and wavelengths reflected from one or more reflective elements associated with the probe array.

US Patent:

20010030290, Oct 18, 2001

Filed:

Mar 26, 2001

Appl. No.:

09/817632

Inventors:

David Stern - Mountain View CA, US

International Classification:

G01N021/64

US Classification:

250/458100

Abstract:

Labeled targets on a support synthesized with polymer sequences at known locations according to the methods disclosed in U.S. Pat. No. 5,143,854 and PCT WO 92/10092 or others, can be detected by exposing marked regions of sample to radiation from a source and detecting the emission therefrom, and repeating the steps of exposition and detection until the sample is completely examined.

US Patent:

20020055102, May 9, 2002

Filed:

Oct 23, 2001

Appl. No.:

09/682837

Inventors:

David Stern - Mountain View CA, US

International Classification:

C12Q001/68
G06K009/00
C12M001/34

US Classification:

435/006000, 435/287200, 382/129000

Abstract:

A multi-array scanning system is described for scanning arrays of microarrays disposed on a substrate. The system includes a scanner apparatus that detects emission signals from the microarrays. The scanner typically has an excitation radiation source, a focusing system, an emission detector, a data acquisition system, and a controller to move a translation stage. The microarrays may be focused upon and then scanned sequentially. The system also includes a convertible processing apparatus having a separating member and one or more containing members. The separating member is constructed and arranged so that, when it is disposed in a first position with respect to the containing members, the microarrays are fluidically separated from each other by the separating member, and, when the separating member is disposed in a second position with respect to the containing members, the microarrays are fluidically coupled with each other.

US Patent:

20030002130, Jan 2, 2003

Filed:

Aug 20, 2002

Appl. No.:

10/223719

Inventors:

Calvin Quate - Stanford CA, US
David Stern - Mountain View CA, US

Assignee:

Affymetrix, Inc. - Santa Clara CA

International Classification:

G02B026/00

US Classification:

359/290000

Abstract:

An improved optical photolithography system and method provides predetermined light patterns generated by a direct write system without the use of photomasks. The Direct Write System provides predetermined light patterns projected on the surface of a substrate (e.g., a wafer) by using a computer controlled means for dynamically generating the predetermined light pattern, e.g., a spatial light modulator. Image patterns are stored in a computer and through electronic control of the spatial light modulator directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask. Thus, in the Direct Write System each pixel is illuminated with an optical beam of suitable intensity and the imaging (printing) of an individual feature is determined by computer control of the spatial light modulator at each photolithographic step without the use of a photomask. The Direct Write System including a spatial light modulator is particularly useful in the synthesis of DNA arrays and provides an efficient means for polymer array synthesis by using spatial light modulators to generate a predetermined light pattern that defines the image patterns of a polymer array to be deprotected.