David Matthew Stern

US Patent:

6480324, Nov 12, 2002

Filed:

Jun 14, 2001

Appl. No.:

09/880058

Inventors:

Calvin F. Quate - Stanford CA
David Stern - Mountain View CA

Assignee:

Affymetrix, Inc. - Santa Clara CA

International Classification:

G02B 2608

US Classification:

359298, 359291, 359223, 359224, 348203, 345 84

Abstract:

An improved optical photolithography system and method provides predetermined light patterns generated by a direct write system without the use of photomasks. The Direct Write System provides predetermined light patterns projected on the surface of a substrate (e. g. , a wafer) by using a computer controlled component for dynamically generating the predetermined light pattern, e. g. , a spatial light modulator. Image patterns are stored in a computer and through electronic control of the spatial light modulator directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask. Thus, in the Direct Write System each pixel is illuminated with an optical beam of suitable intensity and the imaging (printing) of an individual feature is determined by computer control of the spatial light modulator at each photolithographic step without the use of a photomask. The Direct Write System including a spatial light modulator is particularly useful in the synthesis of DNA arrays and provides an efficient element for polymer array synthesis by using spatial light modulators to generate a predetermined light pattern that defines the image patterns of a polymer array to be deprotected.

US Patent:

20030002130, Jan 2, 2003

Filed:

Aug 20, 2002

Appl. No.:

10/223719

Inventors:

Calvin Quate - Stanford CA, US
David Stern - Mountain View CA, US

Assignee:

Affymetrix, Inc. - Santa Clara CA

International Classification:

G02B026/00

US Classification:

359/290000

Abstract:

An improved optical photolithography system and method provides predetermined light patterns generated by a direct write system without the use of photomasks. The Direct Write System provides predetermined light patterns projected on the surface of a substrate (e.g., a wafer) by using a computer controlled means for dynamically generating the predetermined light pattern, e.g., a spatial light modulator. Image patterns are stored in a computer and through electronic control of the spatial light modulator directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask. Thus, in the Direct Write System each pixel is illuminated with an optical beam of suitable intensity and the imaging (printing) of an individual feature is determined by computer control of the spatial light modulator at each photolithographic step without the use of a photomask. The Direct Write System including a spatial light modulator is particularly useful in the synthesis of DNA arrays and provides an efficient means for polymer array synthesis by using spatial light modulators to generate a predetermined light pattern that defines the image patterns of a polymer array to be deprotected.

US Patent:

20050088722, Apr 28, 2005

Filed:

Jul 25, 2003

Appl. No.:

10/626627

Inventors:

Calvin Quate - Stanford CA, US
David Stern - Mountain View CA, US

Assignee:

Affymetrix, Inc. - Santa Clara CA

International Classification:

G02F001/29
G02B026/08

US Classification:

359298000

Abstract:

An improved optical photolithography system and method provides predetermined light patterns generated by a direct write system without the use of photomasks. The Direct Write System provides predetermined light patterns projected on the surface of a substrate (e.g., a wafer) by using a computer controlled means for dynamically generating the predetermined light pattern, e.g., a spatial light modulator. Image patterns are stored in a computer and through electronic control of the spatial light modulator directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask. Thus, in the Direct Write System each pixel is illuminated with an optical beam of suitable intensity and the imaging (printing) of an individual feature is determined by computer control of the spatial light modulator at each photolithographic step without the use of a photomask. The Direct Write System including a spatial light modulator is particularly useful in the synthesis of DNA arrays and provides an efficient means for polymer array synthesis by using spatial light modulators to generate a predetermined light pattern that defines the image patterns of a polymer array to be deprotected.

US Patent:

20050233256, Oct 20, 2005

Filed:

Jun 3, 2005

Appl. No.:

11/143476

Inventors:

Calvin Quate - Stanford CA, US
David Stern - Mountain View CA, US

Assignee:

Affymetrix, Inc., A California Corporation - Santa Clara CA

International Classification:

G03C001/492

US Classification:

430311000

Abstract:

An improved optical photolithography system and method provides predetermined light patterns generated by a direct write system without the use of photomasks. The Direct Write System provides predetermined light patterns projected on the surface of a substrate (e.g., a wafer) by using a computer controlled means for dynamically generating the predetermined light pattern, e.g., a spatial light modulator. Image patterns are stored in a computer and through electronic control of the spatial light modulator directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask. Thus, in the Direct Write System each pixel is illuminated with an optical beam of suitable intensity and the imaging (printing) of an individual feature is determined by computer control of the spatial light modulator at each photolithographic step without the use of a photomask. The Direct Write System including a spatial light modulator is particularly useful in the synthesis of DNA arrays and provides an efficient means for polymer array synthesis by using spatial light modulators to generate a predetermined light pattern that defines the image patterns of a polymer array to be deprotected.

US Patent:

20060293860, Dec 28, 2006

Filed:

Jun 28, 2006

Appl. No.:

11/427103

Inventors:

Vincent Bressler - Menlo Park CA, US
Albert Bukys - Lexington MA, US
David Stern - Mountain View CA, US

International Classification:

G06F 19/00

US Classification:

702020000

Abstract:

In one embodiment, a method for correcting feature overlap in biological probe array data is described that comprises (a) receiving a first set of data comprising an intensity value for each of a plurality of features associated with a probe array; (b) calculating a crosstalk parameter for the first set of data using the intensity values of one or more test features and a plurality of features that neighbor each test feature; and (c) applying the crosstalk parameter to each intensity value in the first set of data to produce a second set of data.

US Patent:

20130018938, Jan 17, 2013

Filed:

Jul 11, 2011

Appl. No.:

13/180375

Inventors:

Anthony WOOD - Palo Alto CA, US
David Stern - Los Gatos CA, US
David Westerhoff - Fremont CA, US
Bill Ataras - Portland OR, US
Mark Goodwin - Mountain View CA, US
Aaron Graham - Santa Clara CA, US
Matt Emerson - New Orleans LA, US
Kevin Phillips - Los Gatos CA, US

Assignee:

Roku, Incorporated - Saratoga CA

International Classification:

G06F 15/16

US Classification:

709203, 709231

Abstract:

A method for a computer system includes receiving an identifier associated with a client streaming player, determining one or more attributes associated with the identifier from a data structure in response to the identifier, determining available channels from a plurality of channels that are to be made available to the client streaming player in response to the identifier, wherein available channels comprises a first channel, but not the second channel, determining a first graphical identifier associated with the first channel, providing the first graphical identifier to the client streaming player, receiving a user selection of the first graphical identifier indicating a user request to associate the first channel with the computer system, and providing an indicator of a server network address associated with the first channel to the client streaming player.

US Patent:

62719572, Aug 7, 2001

Filed:

May 26, 1999

Appl. No.:

9/318775

Inventors:

Calvin F. Quate - Stanford CA
David Stern - Mountain View CA

Assignee:

Affymetrix, Inc. - Santa Clara CA

International Classification:

G02B 2608

US Classification:

359298

Abstract:

An improved optical photolithography system and method provides predetemined light patterns generated by a direct write system without the use of photomasks. The Direct Write System provides predetermined light patterns projected on the surface of a substrate (e. g. , a wafer) by using a computer controlled component for dynamically generating the predetermined light pattern, e. g. , a spatial light modulator. Image patterns are store in computer and through electronic control of the spatial light modulator directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask. Thus, in the Direct Write System each pixel is illuminated with an optical beam of suitable intensity and the imaging (printing) of an individual feature is determined by computer control of the spatial light modulator at each photolithographic step without the use of a photomask. The Direct Write System including a spatial light modulator is particularly useful in the synthesis of DNA arrays and provides an efficient element for polymer array synthesis by using spatial light modulators to generate a predetermined light pattern that defines the image patterns of a polymer array to be deprotected.

US Patent:

20220214557, Jul 7, 2022

Filed:

Jan 13, 2022

Appl. No.:

17/575242

Inventors:

- Pleasanton CA, US
Bryan P. STAKER - San Ramon CA, US
Robert HARTLAGE - Sunnyvale CA, US
Edvinas ZIZMINSKAS - Dublin CA, US
David STERN - Mountain View CA, US
Paul HEILMAN - San Ramon CA, US

International Classification:

G02B 27/64
H04N 5/232
G01D 5/347
G02B 26/10
H04N 3/08

Abstract:

Disclosed herein is a high throughput optical scanning device and methods of use. The optical scanning device and methods of use provided herein can allow high throughput scanning of a continuously moving object with a high resolution despite fluctuations in stage velocity. This can aid in high throughput scanning of a substrate, such as a biological chip comprising fluorophores. Also provided herein are improved optical relay systems and scanning optics.