- Milpitas CA, US Christopher Sears - Fremont CA, US Harsh Sinha - Santa Clara CA, US David Trease - Milpitas CA, US David Kaz - Oakland CA, US Wei Ye - Milpitas CA, US
International Classification:
H01J 37/153
Abstract:
An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.
Method And System For Edge-Of-Wafer Inspection And Review
- Milpitas CA, US Christopher Sears - Fremont CA, US Harsh Sinha - Santa Clara CA, US David Trease - Milpitas CA, US David Kaz - Oakland CA, US Wei Ye - Milpitas CA, US
International Classification:
H01J 37/153 H01J 37/147 H01J 37/20 H01J 37/244
Abstract:
An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.
Method And System For Charged Particle Microscopy With Improved Image Beam Stabilization And Interrogation
- Milpitas CA, US Gabor Toth - San Jose CA, US David Trease - Milpitas CA, US Rohit Bothra - Milpitas CA, US Grace Hsiu-Ling Chen - Los Gatos CA, US Rainer Knippelmeyer - Milpitas CA, US
International Classification:
H01J 37/28 H01J 37/244 H01J 37/10
Abstract:
A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.
KLA-Tencor since Feb 2011
Senior Applications Development Engineer, eBeam Division
Lawrence Berkeley National Labs Jul 2010 - Feb 2011
Postdoctoral Research Fellow
Education:
University of California, Berkeley 2005 - 2010
PhD, Physical Chemistry
Imperial College London 2003 - 2004
MRes, Biomolecular Science
University of Oxford 1999 - 2003
MChem, Chemistry
Skills:
Spectroscopy Materials Science Chemistry Physical Chemistry Physics Semiconductors Characterization Design of Experiments R&D Nanotechnology Nmr Sensors Microfluidics Optics Failure Analysis Thin Films Matlab Surface Chemistry Experimentation Scanning Electron Microscopy Nanomaterials Labview Mathematica Semiconductor Process Xps Tem Photolithography Powder X Ray Diffraction Nmr Spectroscopy Research and Development Nuclear Magnetic Resonance Radiofrequency Electrical Engineering Mat Inorganic Chemical Synthesis
Languages:
English French
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