Dennis William Cobb

US Patent:

7838854, Nov 23, 2010

Filed:

Jul 25, 2008

Appl. No.:

12/220560

Inventors:

J. Martin Algots - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
Alexander I. Ershov - Escondido CA, US
William N. Partlo - Poway CA, US
Richard L. Sandstrom - Encinitas CA, US
Oscar Hemberg - Stockholm, SE
Alexander N. Bykanov - San Diego CA, US
Dennis W. Cobb - Lake Arrowhead CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01J 35/20

US Classification:

250504R

Abstract:

An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

US Patent:

20040160155, Aug 19, 2004

Filed:

Dec 18, 2003

Appl. No.:

10/742233

Inventors:

William Partlo - Poway CA, US
Gerry Blumenstock - San Diego CA, US
Norbert Bowering - San Diego CA, US
Kent Bruzzone - Cardiff by the Sea CA, US
Dennis Cobb - Lake Arrowhead CA, US
Timothy Dyer - Oceanside CA, US
John Dunlop - San Diego CA, US
Igor Fomenkov - San Diego CA, US
James Hysham - Oceanside CA, US
I. Oliver - San Diego CA, US
Frederick Palenschat - Lemon Grove CA, US
Xiaojiang Pan - San Diego CA, US
Curtis Rettig - Vista CA, US
Rodney Simmons - San Diego CA, US
John Walker - Escondido CA, US
R. Webb - Escondido CA, US
Thomas Hofmann - San Diego CA, US

International Classification:

H01J017/26
H01J061/28

US Classification:

313/231310

Abstract:

An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO. The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.

US Patent:

20060192154, Aug 31, 2006

Filed:

Feb 25, 2005

Appl. No.:

11/067124

Inventors:

J. Algots - San Diego CA, US
Igor Fomenkov - San Diego CA, US
Alexander Ershov - San Diego CA, US
William Partlo - Poway CA, US
Richard Sandstrom - Encinitas CA, US
Oscar Hemberg - La Jolla CA, US
Alexander Bykanov - San Diego CA, US
Dennis Cobb - Lake Arrowhead CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H05G 2/00

US Classification:

25050400R

Abstract:

An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.