Donald E Perry

US Patent:

62621815, Jul 17, 2001

Filed:

Dec 22, 1999

Appl. No.:

9/469379

Inventors:

Nageshwer Rao Bantu - Barrington RI
Donald Frank Perry - North Providence RI
Jacqueline Marie Marshall - Tiverton RI
Timothy Michael Holt - Providence RI

Assignee:

Arch Specialty Chemicals, Inc. - Norwalk CT

International Classification:

C08F26102

US Classification:

525262

Abstract:

This invention relates to a process for generating a organically soluble partially cross-linked acid labile polymer according to the present invention comprises the steps of providing a polymer with one or more monomer units, wherein at least one of the monomer units contain one or more pendant COOH or hydroxyl groups; and reacting said polymer with a polyvinyl ether in the presence of a acid catalyst to form links between at least two polymer chains. The resulting polymer can be used as a component in a photoresist formulation.

US Patent:

60720069, Jun 6, 2000

Filed:

Nov 6, 1998

Appl. No.:

9/186916

Inventors:

Nageshwer Rao Bantu - Barrington RI
Donald Frank Perry - North Providence RI
Jacqueline Marie Marshall - Tiverton RI
Timothy Michael Holt - Providence RI

Assignee:

Arch Specialty Chemicals, Inc. - Norwalk CT

International Classification:

C08F26102

US Classification:

525262

Abstract:

This invention relates to a process for generating a organically soluble partially cross-linked acid labile polymer according to the present invention comprises the steps of providing a polymer with one or more monomer units, wherein at least one of the monomer units contain one or more pendant COOH or hydroxyl groups; and reacting said polymer with a polyvinyl ether in the presence of a acid catalyst to form links between at least two polymer chains. The resulting polymer can be used as a component in a photoresist formulation.

US Patent:

55976786, Jan 28, 1997

Filed:

Jul 7, 1995

Appl. No.:

8/499808

Inventors:

Kenji Honda - Barrington RI
Donald F. Perry - North Providence RI

Assignee:

OCG Microelectronic Materials, Inc. - West Paterson NJ

International Classification:

G03C 500
C11D 706

US Classification:

430331

Abstract:

A non-corrosive positive photoresist stripper composition comprising: (a) a solvent selected from N-methyl-2-pyrrolidone, N-hydroxyethyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone dimethylsulfoxide, and admixtures thereof; (b) a corrosion inhibitor selected form tricine, bicine, (2-benzothiozolythio)succinic acid, and admixtures thereof; (c) optionally, an alkanolamine selected from diethyleneglycolamine, monoethanolamine, diethanolamine, triethanolamine, and admixtures thereof; (d) optionally, water; and (e) optionally, a water-soluble surface active compound.

US Patent:

57599734, Jun 2, 1998

Filed:

Sep 6, 1996

Appl. No.:

8/709052

Inventors:

Kenji Honda - Barrington RI
Donald F. Perry - North Providence RI

Assignee:

Olin Microelectronic Chemicals, Inc. - Norwalk CT

International Classification:

C11D 712
C11D 726
C11D 750

US Classification:

510176

Abstract:

A stripping and cleaning composition comprising water, at least one amine compound, and at least one corrosion inhibitor selected from (a) quaternary ammonium silicate and (b) a catechol nucleus-containing oligomer having a molecular weight of about 220 to about 5,000, and optionally a polar organic solvent.

US Patent:

56656882, Sep 9, 1997

Filed:

Jan 23, 1996

Appl. No.:

8/590010

Inventors:

Kenji Honda - Barrington RI
Donald F. Perry - Providence RI

Assignee:

Olin Microelectronics Chemicals, Inc. - Norwalk CT

International Classification:

C11D 726
C11D 732
C11D 750

US Classification:

510178

Abstract:

A photoresist stripping composition containing: (a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3. 5; (b) 70-20% by weight of alkanolamine compounds; and (c) 0. 1-10% by weight of 6,6',6"-(1,3,5-triazine-2,4,6-triyltriimino) tris(hexanoic acid).

US Patent:

56483244, Jul 15, 1997

Filed:

Jan 23, 1996

Appl. No.:

8/590005

Inventors:

Kenji Honda - Barrington RI
Donald F. Perry - North Providence RI

Assignee:

OCG Microelectronic Materials, Inc. - Norwalk CT

International Classification:

C11D 732

US Classification:

510176

Abstract:

A photoresist stripping composition containing: (a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3. 5; (b) 70-20% by weight of alkanolamine compounds; and (c) 0. 1-10% by weight of 2,2'[[methyl-1H-benzothiazol-1-yl)methyl]imino]bis-ethanol.