Douglas Ruby

US Patent:

6750391, Jun 15, 2004

Filed:

Oct 25, 2002

Appl. No.:

10/280530

Inventors:

Ward Issac Bower - Albuquerque NM
Michael G. Thomas - Albuquerque NM
Douglas S. Ruby - Albuquerque NM

Assignee:

Sandia Corporation - Albuquerque NM

International Classification:

H01L 31048

US Classification:

136244, 136291, 136293, 136251, 323906, 363 60, 363178

Abstract:

A modular apparatus for and method of alternating current photovoltaic power generation comprising via a photovoltaic module, generating power in the form of direct current; and converting direct current to alternating current and exporting power via one or more power conversion and transfer units attached to the module, each unit comprising a unitary housing extending a length or width of the module, which housing comprises: contact means for receiving direct current from the module; one or more direct current-to-alternating current inverters; an alternating current bus; and contact means for receiving alternating current from the one or more inverters.

US Patent:

63292963, Dec 11, 2001

Filed:

Aug 9, 2000

Appl. No.:

9/634905

Inventors:

Douglas S. Ruby - Albuquerque NM
Saleem H. Zaidi - Albuquerque NM

Assignee:

Sandia Corporation

International Classification:

H01L 2100

US Classification:

438712

Abstract:

Textured silicon solar cells and techniques for their manufacture utilizing metal sources to catalyze formation of randomly distributed surface features such as nanoscale pyramidal and columnar structures. These structures include dimensions smaller than the wavelength of incident light, thereby resulting in a highly effective anti-reflective surface. According to the invention, metal sources present in a reactive ion etching chamber permit impurities (e. g. metal particles) to be introduced into a reactive ion etch plasma resulting in deposition of micro-masks on the surface of a substrate to be etched. Separate embodiments are disclosed including one in which the metal source includes one or more metal-coated substrates strategically positioned relative to the surface to be textured, and another in which the walls of the reaction chamber are pre-conditioned with a thin coating of metal catalyst material.

US Patent:

60910216, Jul 18, 2000

Filed:

Nov 13, 1998

Appl. No.:

9/191319

Inventors:

Douglas S. Ruby - Albuquerque NM
William K. Schubert - Albuquerque NM
James M. Gee - Albuquerque NM
Saleem H. Zaidi - Albuquerque NM

Assignee:

Sandia Corporation - Albuquerque NM

International Classification:

H01L 3100

US Classification:

136261

Abstract:

Photovoltaic cells and methods for making them are disclosed wherein the metallized grids of the cells are used to mask portions of cell emitter regions to allow selective etching of phosphorus-doped emitter regions. The preferred etchant is SF. sub. 6 or a combination of SF. sub. 6 and O. sub. 2. This self-aligned selective etching allows for enhanced blue response (versus cells with uniform heavy doping of the emitter) while preserving heavier doping in the region beneath the gridlines needed for low contact resistance. Embodiments are disclosed for making cells with or without textured surfaces. Optional steps include plasma hydrogenation and PECVD nitride deposition, each of which are suited to customized applications for requirements of given cells to be manufactured. The techniques disclosed could replace expensive and difficult alignment methodologies used to obtain selectively etched emitters, and they may be easily integrated with existing plasma processing methods and techniques of the invention may be accomplished in a single plasma-processing chamber.

US Patent:

57922802, Aug 11, 1998

Filed:

Dec 27, 1996

Appl. No.:

8/820969

Inventors:

Douglas S. Ruby - Albuquerque NM
Paul A. Basore - Albuquerque NM
W. Kent Schubert - Albuquerque NM

Assignee:

Sandia Corporation - Albuquerque NM

International Classification:

H01L 3100

US Classification:

136258

Abstract:

A process for making high-efficiency solar cells. This is accomplished by forming a diffusion junction and a passivating oxide layer in a single high-temperature process step. The invention includes the class of solar cells made using this process, including high-efficiency solar cells made using Czochralski-grown silicon.

US Patent:

58715916, Feb 16, 1999

Filed:

Nov 1, 1996

Appl. No.:

8/742378

Inventors:

Douglas S. Ruby - Albuquerque NM
William K. Schubert - Albuquerque NM
James M. Gee - Albuquerque NM

Assignee:

Sandia Corporation - Albuquerque NM

International Classification:

H01L 3100

US Classification:

136261

Abstract:

A potentially low-cost process for forming and passivating a selective emitter. The process uses a plasma etch of the heavily doped emitter to improve its performance. The grids of the solar cell are used to mask the plasma etch so that only the emitter in the region between the grids is etched, while the region beneath the grids remains heavily doped for low contact resistance. This process is potentially low-cost because it requires no alignment. After the emitter etch, a silicon nitride layer is deposited by plasma-enhanced, chemical vapor deposition, and the solar cell is annealed in a forming gas.