Earl Blake Samuels

US Patent:

20120145701, Jun 14, 2012

Filed:

Jul 30, 2011

Appl. No.:

13/194945

Inventors:

Ronald L. Colvin - Gilbert AZ, US
Jeff Mittendorf - Chandler AZ, US
Charles J. Moretti - Scottsdale AZ, US
John W. Rose - Cave Creek AZ, US
Earl Blake Samuels - Scottsdale AZ, US

International Classification:

H05B 3/12

US Classification:

219553

Abstract:

Electrical resistance heater and heater assemblies are described. According to one embodiment, the heater comprises a sinusoidal heating element that provides substantially constant heating. According to another embodiment, the heater comprises a heating element and one or more press-fit coupled electrical adapters. Methods and systems are also disclosed.

US Patent:

20120148744, Jun 14, 2012

Filed:

Jul 28, 2011

Appl. No.:

13/193498

Inventors:

Ronald L. Colvin - Gilbert AZ, US
Jeff Mittendorf - Chandler AZ, US
Charles J. Moretti - Scottsdale AZ, US
John W. Rose - Cave Creek AZ, US
Earl Blake Samuels - Scottsdale AZ, US

International Classification:

C23C 16/46
C23C 16/02

US Classification:

42725511, 118725

Abstract:

A system for processing substrates is described. In one embodiment, the system comprises a process chamber, at least one electrical resistance heater, and at least one Coanda effect gas injector.

US Patent:

20120149210, Jun 14, 2012

Filed:

Jul 30, 2011

Appl. No.:

13/194947

Inventors:

Ronald L. COLVIN - Gilbert AZ, US
Jeff MITTENDORF - Chandler AZ, US
Charles J. MORETTI - Scottsdale AZ, US
John W. ROSE - Cave Creek AZ, US
Earl Blake SAMUELS - Scottsdale AZ, US

International Classification:

H01L 21/31
B05D 5/12
C23C 16/00

US Classification:

438758, 118728, 427 58, 257E2124

Abstract:

A system for processing substrates is described. In one embodiment, the system comprises a process chamber and at least one Coanda effect gas injector. The at least one Coanda effect gas injector is disposed proximate a location for the peripheral edge of the substrate so as to provide a Coanda effect gas flow over the surface of the substrate. Apparatuses and methods are also described.

US Patent:

20080092812, Apr 24, 2008

Filed:

Jun 10, 2005

Appl. No.:

11/628925

Inventors:

James McDiarmid - Dana Point CA, US
Ronald Colvin - Gilbert AZ, US
John Rose - Cave Creek AZ, US
Earl Samuels - Scottsdale AZ, US

International Classification:

C23C 16/52
H01L 21/36

US Classification:

118695000, 118715000, 118724000, 118730000, 438478000, 257E21461

Abstract:

An apparatus including a process chamber and a gas flow control system for depositing layers having uniform properties on substrates.

US Patent:

20190062910, Feb 28, 2019

Filed:

Oct 15, 2018

Appl. No.:

16/160941

Inventors:

- Phoenix AZ, US
Jeff Mittendorf - Chandler AZ, US
Charles J. Moretti - Scottsdale AZ, US
John W. Rose - Cave Creek AZ, US
Earl Blake Samuels - Scottsdale AZ, US

Assignee:

GES Associates, L.L.C. - Phoenix AZ

International Classification:

C23C 16/455
C23C 16/46

Abstract:

A system for processing substrates is described. In one embodiment, the system comprises a process chamber, at least one electrical resistance heater, and at least one Coanda effect gas injector.